0.25um T-gate MESFET fabrication by using the size reduction of pattern in image reversal process (형상반전공정의 패턴형성시 선폭감소를 이용한 0.25um T-gate MESFET의 제작)
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- Journal of the Korean Institute of Telematics and Electronics A
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- v.32A no.1
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- pp.185-192
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- 1995