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Electronics and Telecommunications Research Institute (한국전자통신연구원)
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Gold Stripe Optical Waveguides Fabricated by a Novel Double-Layered Liftoff Process

  • Kim, Jin-Tae (Convergence Components & Materials Research Laboratory, ETRI, School of Electrical Engineering & Computer Science, KAIST) ;
  • Park, Sun-Tak (Convergence Components & Materials Research Laboratory, ETRI) ;
  • Park, Seung-Koo (Convergence Components & Materials Research Laboratory, ETRI) ;
  • Kim, Min-Su (Convergence Components & Materials Research Laboratory, ETRI) ;
  • Lee, Myung-Hyun (School of Information and Communication Engineering, Sungkyunkwan University) ;
  • Ju, Jung-Jin (Convergence Components & Materials Research Laboratory, ETRI)
  • Received : 2009.05.15
  • Accepted : 2009.10.19
  • Published : 2009.12.31
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Abstract

To fabricate uniform and reliable thin gold stripes that provide low-loss optical waveguides, we developed a novel liftoff process placing an additional $SiN_x$ layer under conventional photoresists. By patterning a photoresist and over-etching the $SiN_x$, the photoresist patterns become free-standing structures on a lower-cladding. This leads to uniform metal stripes with good reproducibility and effectively removes parasitic structures on the edge of the metal stripe in the image reversal photolithography process. By applying the newly developed process to polymer-based gold stripe waveguide fabrication, we improved the propagation losses about two times compared with that incurred by the conventional image-reversal process.

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References

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