• Applied Science and Convergence Technology
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• v.25 no.4
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• pp.81-84
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• 2016

InP/InGaP quantum structures (QSs) grown on GaAs substrates by a migration-enhanced molecular beam epitaxy method were studied as a function of growth temperature (T) using photoluminescence (PL) and emission-wavelength-dependent time-resolved PL (TRPL). The growth T were varied from $440^{\circ}C$ to $520^{\circ}C$ for the formation of InP/InGaP QSs. As growth T increases from $440^{\circ}C$ to $520^{\circ}C$, the PL peak position is blue-shifted, the PL intensity increases except for the sample grown at $520^{\circ}C$, and the PL decay becomes fast at 10 K. Emission-wavelength-dependent TRPL results of all QS samples show that the decay times at 10 K are slightly changed, exhibiting the longest time around at the PL peak, while at high T, the decay times increase rapidly with increasing wavelength, indicating carrier relaxation from smaller QSs to larger QSs via wetting layer/barrier. InP/InGaP QS sample grown at $460^{\circ}C$ shows the strongest PL intensity at 300 K and the longest decay time at 10 K, signifying the optimum growth T of $460^{\circ}C$.

• Journal of the Semiconductor & Display Technology
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• v.15 no.2
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• pp.49-54
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• 2016

$SrAl_{12}O_{19}:Ce_x{^{3+}}$,$Eu_{0.01}{^{2+}}$ phosphors were synthesized through a combustion process and their optical properties were investigated using time-resolved photoluminescence. A PL spectrum showed two dominant peaks which appeared at 300 and 410 nm. It is seen that, as the $Ce^{3+}$ concentration increases, the intensity of 300 nm decreases and the intensity of 410 nm increases. This behavior has been explained by two independent energy transfer mechanism. The first energy transfer occurs from $Ce^{3+}$ ion to $Eu^{3+}$ ion. The second energy transfer takes place from $Ce^{3+}$ ion to $Ce^{3+}-O_{ME}$ complex created in the magnetoplumbite structural host materials. The blue emitting 410 nm peak has been explained by both energy transfer mechanisms.

• Korean Journal of Materials Research
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• v.21 no.6
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• pp.295-298
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• 2011

ZnS:Mn, Dy yellow phosphors for White Light Emitting Diode were synthesized by a solid state reaction method using ZnS, $MnSO_4{\cdot}5H_2O$, S and $DyCl_3{\cdot}6H_2O$ powders as starting materials. The mixed powder was sintered at $1000^{\circ}C$ for 4 h in an air atmosphere. The photoluminescence of the ZnS:Mn, Dy phosphors showed spectra extending from 480 to 700 nm, peaking at 580 nm. The photoluminescence of 580 nm in the ZnS:Mn, Dy phosphors was associated with $^4T_1{\rightarrow}^6A_1$ transition of $Mn^{2+}$ ions. The highest photoluminescence intensity of the ZnS:Mn, Dy phosphors under 450 nm excitation was observed at 4 mol% Dy doping. The enhanced photoluminescence intensity of the ZnS:Mn, Dy phosphors was explained by energy transfer from $Dy^{3+}$ to $Mn^{2+}$. The CIE coordinate of the 4 mol% Dy doped ZnS:Mn, Dy was X = 0.5221, Y = 0.4763. The optimum mixing conditions for White Light Emitting Diode was obtained at the ratio of epoxy : yellow phosphor = 1:2 form CIE coordinate.

• Bulletin of the Korean Chemical Society
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• v.25 no.4
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• pp.525-528
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• 2004

The photoluminescence (PL) emission of Si nanocrystals synthesized by 400 keV Si ion implanted in $SiO_2$ is studied as a function of ion dose and annealing time. The formation of nanocrystals at around 600 nm from the surface was confirmed by RBS and HRTEM, and the Si nanocrystals showed a wide and very intense PL emission at 700-900 nm. The intensity of this emission showed a typical behaviour with a fast transitory increase to reach a saturation with the annealing time, however, the red shift increased continuously because of the Ostwald ripening. The oversaturation of dose derived a decrease of PL intensity because of the diminishment of quantum confinement. A strong enhancement of PL intensity by H passivation was confirmed also, and the possible mechanism is discussed.

• Proceedings of the Korean Vacuum Society Conference
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• 1999.07a
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• pp.102-102
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• 1999

Visible photoluminescence(PL) in si-implanted SiO2 films on crystaline silicon were observed. Thermal oxide films of 1 ${\mu}{\textrm}{m}$ thickness on P-type crystal silicon were made and si+ ions were implanted with 200keV acceleration voltage on ti. Argon laser (wavelength 488nm) and PM tube were used for PL measurements. As annealing time increased at low temperature, the visible PL intensity are increased and the peak positions are changed. On the other hand, with increasing annealing time at high temperature, the visible PL intensity are disappeared. From the PL peaks and intensity changes, XRD results, and TEM observations, we will discuss the origin of PL in Si+-implanted SiO2 films with oxygen righ defects and silicon rich defects.

• Bulletin of the Korean Chemical Society
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• v.18 no.6
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• pp.608-612
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• 1997

The preparation and photoluminescence properties of $ZnGa_2O_4$ : Mn phosphor are presented. Under 254 nm excitation $Zn_1-_xMn_xGa_2O_4$ exhibits the green emission band at 506 nm wavelength and maximum intensity where x=0.005. The manganese activated $ZnGa_2O_4$ phosphor prepared by the polymerized complex method shows a remarkable increase in the emission intensity and is smaller particle size than that prepared by conventional method. Also, electron paramagnetic resonance study on $ZnGa_2O_4$ : Mn powders indicates that the increase in emission intensity after firing treatment in mild hydrogen reducing atmosphere is due to the conversion of the higher valent manganese to $Mn^{2+}$.

• Korean Journal of Materials Research
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• v.5 no.8
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• pp.936-944
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• 1995

The effects of Spinodal decomposition induced phase separated microstructure of InGaAsP/InP heterostructure on photoluminescence(PL) intensity and FWHM(full-width at half maximum) were investigated in this study. Lattice mismatches were measured by double crystal x-ray diffractometer, and the microstructures of phase separated InGaAsP were observed by transmission electron microscopy. It was found that the misfit stress calculated from lattice mismatch was related to the periodicity of Spinodal modulation. Strong dependence of PL intensity and FWHM on the modulation periodicity was also found. For systematic understanding of these observations, the interaction elastic strain energy function induced by misfit stress was proposed. The calculation illustrated that the microstructure of the epilayer such as Spinodal decomposition played an important role in determining the optoelectronic properties such as PL intensity and PL FWHM.

• Journal of the Korean Vacuum Society
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• v.10 no.2
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• pp.247-251
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• 2001

Photoluminescence(PL) were observed from room temperature to 8K on $Si^+$-implanted silicon-oxide films. The PL intensities are increased from room temperature to 50~80K and decreased below 50K. The blue-shift occurs during the increasing of PL intensity. Also, temperature-dependent PL were measured at peak wavelengths. The first peak is the most sensitive to the measuring temperature. The experimental results are explained by quantum size effect of O rich defects or(and) Si rich defects rather than nanocrystal silicon.

• Journal of Integrative Natural Science
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• v.3 no.4
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• pp.197-201
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• 2010

Dihydrotetraphenylgermole has been synthesized from the reduction of dichlorotetraphenylgermole with lithiumaluminiumhydride. UV-Vis absorption and photoluminescence was measured by using UV-Vis and fluorescence spectroscopy. Nanoparticles of dihydrotetraphenylsilole were synthesized from the mixture solution of water and THF. Photoluminescence behavior of organogermanium nanoparticle was investigated at various water fractions. Critical fraction of water to form organogermanium nanoparticles was 60%. Photoluminescence intensity of organogermanium nanoparticle was increased as the concentration of organogermanium nanocolloids increased. Photoluminescence efficiency of organogermanium nanoparticle at 90% water fraction increased about 100 times compared to that of molecular state.

• Korean Journal of Materials Research
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• v.13 no.3
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• pp.195-199
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• 2003

The $p-CdIn_2$$Te_4$single crystal was grown in the three-stage vertical electric furnace by using Bridgman method. The quality of the grown crystal has been investigated by the x-ray diffraction and the photoluminescence measurements. From the photoluminescence spectra of the as-grown $CdIn_2$$Te_4$crystal and the various heat-treated crystals, the ($D^{\circ}$, X) emission was found to be the dominant intensity in the photoluminescence spectrum of the $CdIn_2$T $e_4$:Cd, while the ($A^{\circ}$, X) emission completely disappeared in the $CdIn_2$T $e_4$:Cd. However, the ($A^{\circ}$, X) emission in the photoluminescence spectrum of the $CdIn_2$T $e_4$:Te was the dominant intensity like an as-grown $CdIn_2$T $e_4$crystal. These results indicated that the ($D^{\circ}$, X) is associated with $V_{Te}$ acted as donor and that the ($A^{\circ}$, X) emission is related to $V_{cd}$ acted as acceptor, respectively. The $p-CdIn_2$T $e_4$crystal was found to be obviously converted into the n-type after annealing in the Cd atmosphere. The origin of ( $D^{\circ}$, $A^{\circ}$) emission and its TO phonon replicas is related to the interaction between donors such as $V_{Te}$ or $Cd_{int}$, and accepters such as $V_{cd}$ or T $e_{int}$. Also, the In in the $CdIn_2$X$CdIn_4$was confirmed not to form the native defects because it existed in the stable form of bonds.