• 제목/요약/키워드: Phonon band

검색결과 58건 처리시간 0.029초

혼합물반도체에서 단위격자 크기 설정에 따른 비극성 Optical 포논산란에 대한 연구 (Study of the Non-polar Optical Phonon Scattering According to the Size of Unit Cell in an Alloy Semiconductor)

  • 천대명;김태현;전상국
    • 한국전기전자재료학회논문지
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    • 제24권10호
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    • pp.784-789
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    • 2011
  • A linear spring model, where the interactions among atoms are assumed to be isotropic and elastic, is employed for the study of non-polar optical phonon scattering in the valence band of alloy semiconductors. The force equations of n atoms are used in the spring model for the consideration of the random distribution of constituent atoms in an alloy semiconductor. When the number of atoms in a unit cell is assumed to be two based on the experimental result, the optical deformation potent is valid for compound semiconductors as well as alloy semiconductors.

Comparative study of photoluminescences for Zn-polar and O-polar faces of single-crystalline ZnO bulks

  • 오동철;김동진;배창환;구경완;박승환;야오다까후미
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2010년도 하계학술대회 논문집
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    • pp.39-39
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    • 2010
  • The authors have an extensive study of photoluminescences for Zn-polar and O-polar faces of single-crystalline ZnO bulks. In the photoluminescence (PL) spectra at 10 K, Zn-polar and O-polar faces show a common emission feature: neutral donor-bound excitons and their longitudinal-optical (LO) phonon replicas are strong, and free excitons are very weak. However, in the PL spectra at room temperature (RT), Zn-polar and O-polar faces show extremely different emission characteristics: the emission intensity of Zn-polar face is 30 times larger than that of O-polar face, and the band edge of Zn-polar face is 33 meV red-shifted from that of O-polar face. The temperature dependence of photoluminescence indicates that the PL spectra at RT are closely associated with free excitons and their phonon-assisted annihilation processes. As a result, it is found that the RT PL spectra of Zn-polar face is dominated by the first-order LO phonon replica of A free excitons, while that of O-polar face is determined by A free excitons. This is ascribed that Zn-polar face has larger exciton-phonon coupling strength than O-polar face.

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Monte Carlo Method에 의한 GaAs의 Hydrodynamic Model Parameter의 추출 (Extraction of Hydrodynamic Model Parameters for GaAs Using the Monte Carlo Method)

  • 박성호;한백형
    • 대한전자공학회논문지
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    • 제27권3호
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    • pp.63-71
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    • 1990
  • Hydrodynamic model에 의해서 submicron GaAs device를 simulation 할 때 필요한 hydrodynamic model parameter 들을 Monte Carlo code를 개발하여 추출하였다. GaAs 전도대의 밴드구조로 $\Gamma$, L, X세개의 valley를 고려하였고, 산란기구로는 polar optic phonon, acoustic phonon, equivalent intervalley, non-equivalent intervalley, ionized impurity 및 piezoelectric scattering을 고려하였다. 계산으로부터 얻은 속도 - 전계 곡선은 실험결과와 잘 일치하였고, 다른 연구자들이 소자 시뮬레이션에 사용할 수 있도록 모델 파라메터들을 표로 제시하였다.

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MOCVD로 성장한 Zn-doped InGaN의 광특성 연구 (Optical properties of Zn-doped InGaN grown by MOCVD)

  • 이창명;이주인;임재영;신은주;김선운;서준호;박근섭;이동한
    • 한국진공학회지
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    • 제10권1호
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    • pp.67-71
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    • 2001
  • MOCVD법으로 성장한 Zn-doped InGaN의 광학적 특성을 photoluminescence를 사용하여 연구하였다. 상온에서 Zn와 관련한 acceptor-like conte들에 대한 넓은 스펙트럼들은 2.81 eV와 2.60 eV에서 관측되었다. 특히, 2.81 eV영역에서는 포논과의 상호작용에 의한 스펙트럼이 나타났으며, 포논 에너지가 $\omega$=92.5 meV의 값을 가짐을 확인하였다. InGaN 시료의 온도 변화에 대한 스펙트럼에서, 온도가 증가함에 따라 청색 발광을 기준으로 낮은 쪽의 에너지에 비해 높은 에너지 쪽의 발광이 빠른 감소를 가져왔으며 아울러 2.81eV 영역에 해당하는 스펙트럼은 18meV만큼 높은 에너지 쪽으로 이동함을 관측하였다. 그러므로 청색 영역에서의 발광은 Zn와 관련된 complex conte체서의 국소화된 천이에 따른 결과이다.

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γ -valley에서 산란의 종류에 따른 전자의 홀 인수 (Hall Factor of Electrons in γ -valley due to Various Scatterings)

  • 서헌교;박일수;전상국
    • 한국전기전자재료학회논문지
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    • 제15권8호
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    • pp.658-663
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    • 2002
  • Hall factor of electrons in $\Gamma$-valley is calculated as functions of temperature, impurity concentration, and nonparabolicity of conduction valleys by taking into account the current density obtained from the Boltzmann transport equation. The dependence of the Hall factor on the temperature is clearly shown in the case of the optical phonon scattering and that on the impurity concentration is obvious in the case of the ionized impurity scattering. As the nonparabolicity of the conduction band increases, the Hall factor due to the acoustic or optic phonon scattering increases, whereas that due to the ionized impurity scattering decreases. The change of the Hall factor can be analysed in terms of the dispersion of relaxation time.

결함제어를 통한 열전 반도체 연구 동향 (Defect Engineering for High-Performance Thermoelectric Semiconductors)

  • 민유호
    • 한국전기전자재료학회논문지
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    • 제35권5호
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    • pp.419-430
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    • 2022
  • Defects in solids play a vital role on thermoelectric properties through the direct impacts of electronic band structure and electron/phonon transports, which can improve the electronic and thermal properties of a given thermoelectric semiconductor. Defects in semiconductors can be divided into four different types depending on their geometric dimensions, and thus understanding the effects on thermoelectric properties of each type is of a vital importance. This paper reviews the recent advances in the various thermoelectric semiconductors through defect engineering focusing on the charge carrier and phonon behaviors. First, we clarify and summarize each type of defects in thermoelectric semiconductors. Then, we review the recent achievements in thermoelectric properties by applying defect engineering when introducing defects into semiconductor lattices. This paper ends with a brief discussion on the challenges and future directions of defect engineering in the thermoelectric field.

Analysis of Transport Parameters in an Interacting Two-Band Model with Application to $p^{+}$-GaAs

  • Kim, B.W.;Majerfeld, A.
    • ETRI Journal
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    • 제17권3호
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    • pp.17-43
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    • 1995
  • We present a comprehensive derivation of the transport of holes involving an interacting two-valence-band system in terms of a generalized relaxation time approach. We sole a pair of semiclassical Boltzmann equations in a general way first, and then employ the conventional relaxation time concept to simplify the results. For polar optical phonon scattering, we develop a simple method th compensate for the inherent deficiencies in the relaxation time concept and apply it to calculate effective relaxation times separately for each band. Also, formulas for scattering rates and momentum relaxation times for the two-band model are presented for all the major scattering mechanisms for p-type GaAs for simple, practical mobility calculations. Finally, in the newly proposed theoretical frame-work, first-principles calculations for the Hall mobility and Hall factor of p-type GaAs at room temperature are carried out with no adjustable parameters in order to obtain a direct comparison between the theory and recent available experimental results, which would stimulate further analysis toward better understanding of the complex transport properties of the valence band. The calculated Hall mobilities show a general agreement with our experimental data for carbon doped p-GaAs samples in a range of degenerate hole densities. The calculated Hall factors show $r_H$=1.25~1.75 over all hole densities($2{\times}10^{17}{\sim}1{\times}10^{20}cm^{-3}$ considered in the calculations.

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Optical Gap Bowing and Phonon Modes of Amorphous Ge1-x-ySexAsy Thin Films

  • 소현섭;박준우;정대호;이호선;신혜영;윤석현;안형우;김수동;이수연;정두석;정병기
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.288.1-288.1
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    • 2014
  • We investigated the optical properties of Ge1-xSex and Ge1-x-ySexAsy amorphous semiconductor films using spectroscopic ellipsometry and Raman spectroscopy. The dielectric functions and absorption coefficients of the amorphous films were determined from the measured ellipsometric angles. We obtained the optical gap energies and Urbach energies from the absorption coefficients, and found a strong bowing effect in the optical gap energy of Ge1-x-ySexAsy where the endpoint binaries were Ge0.50Se0.50 and Ge0.31As0.69. Based on the correlation between optical gap energies and Urbach energies, the large bowing parameter was attributed to the electronic disorder. We found the composition dependence of several phonon modes using Raman spectroscopy. For Ge1-x-ySexAsy, the D mode (232-267 cm-1) changed from As-As (or As3 pyramid), to As(Se1/2)3 pyramid, and finally to Se clusters, as the Se composition increased. Resonant Raman phenomenon was observed in Ge0.38Se0.62 at a laser excitation of 514 nm (2.41 eV). We verified that this laser energy corresponds to the transition energy of Ge0.38Se0.62 using the second derivative of the dielectric function of Ge0.38Se0.62.

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입자모델을 이용한 서브마이크론 게이트 GaAs MESFET 특성의 해석 (Analysis of Submicron Gate GaAs MESFET's Characteristics Using Particle Model)

  • 문승환;정학기;김봉렬
    • 대한전자공학회논문지
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    • 제27권4호
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    • pp.534-540
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    • 1990
  • In this paper the characteristics of submicron gate GaAs MESFET's have been studied using a particle model which takes into account the hot-electron transport phenomena, i.e., the velocity overshoot. \ulcornervalley(<000> direction), L valley (<111>direction), X valley (<100>direction) as the GaAs conduction energy band and optical phonon, acoustic phonon, equivalent intervalley, nonequivalent intervalley scattering as the scattering models, have been considered in this simulation. And the GaAs material and the device simulation have been done by determination of the free flight time, scattering mechanism and scattering angle according to Monte-Carlo algorithm which makes use of a particle model. As a result of the particle simulation, firstly the electron distribution, the potential energy distribution and the situation of electron displacement in 0.6 \ulcorner gate length device have been obtained. Secondly, the cutoff frequency, obtained by this method, is k47GHz which is in good agreement with the calculated result of theory. And the current-voltage characteristics curve which takes account of the buffer layer effect has been obtained. Lastly it has been verified that parasitic current at the buffer layer can be analyzed using channel depth modulation.

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고주파 때려내기법에 의한 질화알루미늄 박막의 제작과 특성 (Preparation and characterization of AiN Thin Films by RF sputtering method)

  • 정성훈;김영호;문동찬;김선태
    • E2M - 전기 전자와 첨단 소재
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    • 제10권7호
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    • pp.706-712
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    • 1997
  • AlN(Aluminium Nitride) thin films were prepared using by RF sputtering method on the Si(100) and Si(111) substrates as the parameters of the substrate temperature, RF power, sputtering duration and the $N_2$/Ar ratio and investigated by X-ray diffraction, IR spectrometry, n&k analyzer. For the Si(100) substrate, the AlN thin films of (101) orientation were obtained under the conditions of room temperature and the nitrogen of 60 vol.%. For the Si(111) substrate, the (002) AlN thin films were obtained under the nitrogen of 100 vol.%. In case of the thin film prepared in the condition of above 60 vol.% of the nitrogen, the average value of the surface roughness of the film was 151$\AA$. From the changes of the half widths of E$_1$[TO] phonon bands at the wavenumber of 680$cm^{-1}$ /, it were compared of the crystallinities of the films which were grown under the different conditions. The thicknesses of AlN films were decreased dramatically in the region of the nitrogen of 40~60 vol.%. Its due to the nitridation of the Al target surface and getting low of the sputtering yield by the $N_2$/Ar ratio being increased.

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