• Korean Journal of Materials Research
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• v.21 no.3
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• pp.149-155
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• 2011

We investigated tribological characteristics of diamond-like carbon (DLC) in a condition with carbon nanotube (CNT) content of 1wt% in aqueous solution. Si-DLC films were deposited by radio frequency plasma enhanced chemical vapor deposition (RF-PECVD) process on Al6061 aluminum alloy. In this study, the deposition of DLC films was carried out in vacuum with a chamber pressure of 10-5 to 10-3 Torr achieved by mechanical pump followed by turbo molecular pump. The surface adsorbed oxygen on the Aluminum substrates was removed by passing Ar gas for 10 minutes. The RF power was maintained at 500W throughout the experiment. A buffer layer of HMDSO was deposited on the substrate to improve the adhesion of DLC coating. At this point CH4 gas was introduced in the chamber using gas flow controller and DLC coating was deposited on the buffer layer along with HMDSO for 50 min. The thickness of 1 ${\mu}m$ was obtained for DLC films on aluminum substrates The tribological properties of as synthesized DLC films were analyzed by wear test in the presence of dry air, water and lubricant such as CNT ink.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.08a
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• pp.236-236
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• 2012

In this study, we present the salt repellent behavior of superhydrophobic filtration membrane. Bio-fouling or mineral-fouling is the main factor of decreasing the performance of filtration membrane. The superhydrophobic modification of filtration membrane using PECVD (Plasma enhanced chemical vapor deposition) is introduced. The oxygen plasma was introduced for developing nano hairy structures and subsequent HMDSO (Hexamethyldisiloxane) coating was used for enhancing low surface energy. Saline water evaporation test was carried out to evaluate the difference of contamination of salt on superhydrophobic and moderately hydrophobic filtration membrane. EDS and EPMA were used for visualizing the residue of salt crystal.

• Proceedings of the Korea Society for Industrial Systems Conference
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• 2001.05a
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• pp.224-231
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• 2001

Hydrogenated amorphous carbon films were deposited by ERC-PECVD with deposition conditions, such as ECR power, gas composition of methane and hydrogen, deposition time, and substrate bias voltage. The characteristics of the film were analyzed using the AES, ERDA, FTIR. Raman spectroscopy and micro hardness tester. From the results of AES and ERDA, the elements in the deposited film were confirmed as carbon and hydrogen atoms. FTIR spectroscopy analysis shows that the atomic bonding structure of a-C:H film consisted of sp³and sp²bonding, most of which is composed of sp³bonding. The structure of the a-C:H films changed from CH₃bonding to CH₂or CH bonding as deposition time increased. We also found that the amount of dehydrogenation in a-C:H films was increased as the bias voltage increased. Raman scattering analysis shows that integrated intensity ratio (I/sub D//I/sub G/) of the D and G peak was increased as the substrate bias voltage increased, and films hardness was increased.

• KSTLE International Journal
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• v.9 no.1_2
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• pp.22-25
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• 2008

This paper investigated the wetting and adhesion property of undulated DLC film with surface morphology controlled for a reduced real area of contact. The undulated DLC Films were prepared by 13.56 MHZ radio frequency plasma enhanced chemical vapor deposition (r.f. PECVD) by using nanoscale Cu dots surface on a Si (100) substrate. FE-SEM, AFM analysis showed that the after repeated deposition and plasma induced damage with Ar ions, the surface was nanoscale undulated. This phenomenon changed the surface morphology of DLC surface. Raman spectra of film with changed morphology revealed that the plasma induced damage with Ar ions significantly suppressed the graphitization of DLC structure. Also, it was observed that while the untreated flat DLC surfaces had wetting angle starting ranged from $72^{\circ}$ and adhesion force of 333ni. Had wetting angle the undulated DLC surfaces, which resemble the surface morphology of a cylindrical shape, increased up to $104^{\circ}$ and adhesion force decreased down to 11 nN. The measurements agree with Hertz and JKR models. The surface undulation was affected mainly by several factors: the surface morphology affinity to cylindrical shape, reduction of the real area of contact and air pockets trapped in cylindrical asperities of the surface.

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.12 no.4
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• pp.123-130
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• 2013

Zirconia is well known in industrial applications for its mechanical characteristics. DLC (diamond-like carbon) have high elastic modulus, high electric resistivity, high dielectric constant, high wear resistance, low friction coefficient, bio compatibility, chemically inert and thermally stable. Because of all these physical and chemical properties these types of coatings have become key procedure for thin coating. Friction coefficient of DLC films is already evaluated and the current work is a further advancement by calculating the fracture toughness and wear resistance of these coatings. In the present study DLC thin film coatings are developed on $ZrO_2$ alloy surface using Plasma Enhanced Chemical Vapor Deposition (PECVD) method. Vicker hardness test is employed and it was concluded that, DLC coatings increase the Vickers hardness of ceramics.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.381.2-381.2
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• 2014

In this study the amorphous carbon films were deposited by PECVD at the substrate temperature range of 250 to $600^{\circ}C$, and the process conditions of higher and lower precursor flow rate, respectively. The temperature was a main parameter to control the density and mirco-structures of carbon films, and their's properties depended with the process temperatrue are changed by controlling precursor flow rate. The precursor feeding rate affect on the plasma ion density and a deposition reactivity. This change of film properties was obtained the instrinsic stress, FT-IR & Raman analysis, refractive index (RI) and ext. coef. (k) measured by ellipsometer. In the process conditions of lower and higher flow rate of precursor it had a different intrinsic stress as a function of the substrate temperature.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.30 no.3
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• pp.175-179
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• 2017

In this study, we investigate the $SiO_2$ current blocking layer (CBL) to improve light output power efficiency in nonpolar a-plane (11-20) GaN LEDs on a r-plane sapphire substrate. The $SiO_2$ CBL was produced under the p-pad layer using plasma enhanced chemical vapor deposition (PECVD). The results show that nonpolar GaN LED light output power with the $SiO_2$ CBL is considerably enhanced compared without the $SiO_2$ CBL. This can be attributed to reduced light absorption at the p-pad due to current blocking to the active layer by the $SiO_2$ CBL.

• Journal of the Korean institute of surface engineering
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• v.38 no.3
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• pp.106-111
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• 2005

Ternary Ti-B-C coatings were synthesized on WC-Co and Si wafers substrates by a PECVD technique using a gaseous mixture of $TiCl_4,\;BCl_3,\;CH_4,\;Ar,\;and\; H_2$. The effects of deposition variables such as substrate temperature, gas ratio, $R_x=[BCl_3/(CH_4+BCl_3)]$ on the microstructure and mechanical properties of Ti-B-C coatings were investigated. From our instrumental analyses, the synthesized Ti-B-C coatings was confirmed to be composites consisting of nanocrystallites TiC, quasi-amorphous TiB2, and amorphous carbon at low boron content, on the contrary, nanocrystallites $TiB_2$, quasi-amorphous TiC, and amorphous carbon at relatively high boron content. The microhardness of the Ti-B-C coatings increased from $\~23 GPa$ of TiC to $\~38 GPa$ of $Ti_{0.33}B_{0.55}C_{0.11}$ coatings with increasing the boron content. The $Ti_{0.33}B_{0.55}C_{0.11}$ coatings showed lower average friction coefficient of 0.45, in addition, it showed relatively better wear behavior compared to other binary coatings of $TiB_2$ and TiC. The microstruture and microhardness value of Ti-B-C coatings were largely depend on the deposition temperature.

• Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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• v.20 no.8
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• pp.6-14
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• 2006

This paper is a study about a proper method of plasma generation to cleaning method and a high frequency power equipment circuit to generation of plasma that used cleaning of chamber for TFT-LCD PECVD. The high density plasma required for cleaning causes a possibility of high density plasma more than $1{\times}10^{11}[EA/cm^3]$. It apply a ferrite core of ferromagnetic body to a existing ICP form. In case of power transfer equipment on 400[kHz] high frequency to generation of plasma it makes certain a stable switching operation in condition of plasma through using a inverter form for general purpose HB. And it demonstrates the performance of power transfer equipment using methods of measurement which use a transformer of series combination the density of plasma and the rate of dissolution of $NF_3$ in condition of $A_r\;and\;NF_3$.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.233-233
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• 2012

나노입자가 가지는 고유한 특성이 부각되면서 이를 소자 특성 향상에 응용하고자 하는 연구가 집중적으로 이루어지고 있다. 박막에 포함된 나노입자는 메모리, 고효율 박막형 태양전지 등에 이용될 수 있는 가능성을 보여주었으며, 나노입자에 기반 하는 소자 제조에 관한 연구가 이루어지면서 플라즈마 내 발생하는 나노입자를 이용하여 패터닝 등에 적용하고자 하는 연구가 국내외에서 활발히 이루어지고 있다. 특히 플라즈마에서 발생하는 나노입자는 플라즈마 내 전기적 및 화학적 특징으로 인해 다른 입자 제조 공정과 달리 응집이 없는 균일한 입자를 제조할 수 있다. 이러한 플라즈마 내 발생 입자를 응용하기 위해서는 각각의 응용 분야에 적합한 입경 분포 제어가 요구된다. 하지만 입자 합성 시 크기분포 특성에 관한 연구는 기존의 포집 및 전자현미경을 이용한 방법으로 실시간으로 분석하기에는 한계가 있다. 따라서 본 연구에서는 저압에서 실시간으로 나노입자 분포를 측정할 수 있는 PBMS (particle beam mass spectrometer)를 이용하여, PECVD (plasma enhanced chemical vapor deposition)의 입자 생성 조건에 따라 continuous, pulse, dual pulse로 분류되는 공정 조건에서 생성되는 입자의 크기 분포를 측정하였다. 또한 그 결과를 기존의 동일한 조건에서 포집 후 SMPS (scanning mobility particle sizer)와 전자 현미경을 이용하여 분석한 결과와 비교하였다. 실리콘 나노 입자의 측정은 PBMS 장비의 전단 부분을 PECVD 장치 내부에 연결하여 진행하였다. PECVD를 이용한 실리콘 나노입자 형성의 주요 변수는 RF pulse, 가스(Ar, SiH4, H2)의 유량, Plasma power, 공정 압력 등이 있으며 각 변수를 조절하여 공정 환경을 구성하였다. 결론적으로 본 연구를 통하여 PECVD를 이용해 각각의 공정 환경에서 생성되는 실리콘 나노입자의 실시간 입경 분포 분석을 PBMS로 수행하는 것에 신뢰성이 있음을 알 수 있었으며, 그 경향을 확인할 수 있었다. 추후 지속적 연구에 의해 변수에 따른 나노입자 생성을 데이터베이스화 하여 요구되는 응용분야에 적합한 특성을 가지는 나노입자를 형성하는 조건을 정립 하는데 중요한 역할을 할 것을 기대할 수 있다.