Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 2014.02a
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- Pages.381.2-381.2
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- 2014
Change the Properties of Amorphous Carbon Hardmask Film Prepared with the Variation of Process Parameters in Plasma Enhanced Chemical Vapor Depostion Systems
- Kim, Seok Hwan (Research and development laboratory, TES Co., Ltd.) ;
- Yeo, Sanghak (Research and development laboratory, TES Co., Ltd.) ;
- Yang, Jaeyoung (Research and development laboratory, TES Co., Ltd.) ;
- Park, Keunoh (Research and development laboratory, TES Co., Ltd.) ;
- Hur, Gieung (Research and development laboratory, TES Co., Ltd.) ;
- Lee, Jaeho (Research and development laboratory, TES Co., Ltd.) ;
- Lee, Jaichan (Department of Material Science and Engineering, Sungkyunkwan University)
- Published : 2014.02.10
Abstract
In this study the amorphous carbon films were deposited by PECVD at the substrate temperature range of 250 to