• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2011년도 춘계학술대회 논문집
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• pp.589-590
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• 2011

• Journal of Magnetics
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• 제14권4호
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• pp.172-174
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• 2009

Nanolithography by atomic force microscope local oxidation was applied to the fabrication of planar-type Ni/Ni oxide/Ni junctions from 10 nm-thick Ni films. The junction characteristics were sensitive to the lithography conditions such as the bias voltage. Successful oxidation produced junctions of nonlinear current-voltage characteristics, implying the formation of oxide barriers. Magnetoresistance (MR) at low temperatures resembled that of spin valves.

• 폴리머
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• 제30권3호
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• pp.187-195
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• 2006

원자힘 현미경 양극산화 패터닝 기술에 관한 연구를 유기 저항막의 종류 및 그들의 특성을 토대로 다루었다. 본 연구실에서 수행한 자기조립막, 랑뮈어-블라짓막, 고분자막 위에서의 원자힘 현미경 양극산화 패터닝에 대한 연구결과를 중심으로, 유기 저항막 위에서의 원자힘 현미경 양극산화 패터닝 기술에 대한 이해를 돕고자 하였다. 현실적인 공정 속도에서 높은 종횡비의 패턴을 형성하기 위해 원자힘 현미경 양극산화 패터닝에 유기 저항막의 전기-기계적 특성, 젖음 특성, 에칭 저항 특성 등이 중요한 인자들임을 제안하였다.

• JSTS:Journal of Semiconductor Technology and Science
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• 제7권4호
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• pp.254-259
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• 2007

In this report, several fabrication techniques for the formation of various nanochannels (with $SiO_2$, Si, or Quartz) are introduced. Moreover, simple fabrication technique for generating $SiO_2$ nanochannels without nanolithography is presented. By using different nanochannels, the degree of stretching DNA molecule will be evaluated. Finally, we introduce a nanometer scale fluidic channel with electrodes on the sidewall of it, to detect and analyze single DNA molecule. The cross sectional shape of the nanotrench is V-groove, which was implemented by thermal oxidation. Electrodes were deposited through both sidewalls of nanotrench and the sealing of channel was done by covering thin poly-dimethiysiloxane (PDMS) polymer sheet.

• 한국재료학회:학술대회논문집
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• 한국재료학회 2009년도 추계학술발표대회
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• pp.33.2-33.2
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• 2009

Block copolymer lithography has attracted great attention for emerging nanolithography since nanoscaleperiodic patterns can be easily obtained through self-assembly process without conventional top-down patterning process. Since the morphologies of self-assembled block copolymer patterns are strongly dependent on surface energy of a substrate, suitable surface modification is required. Until now, the surface modification has been studied by using random copolymer or self-assembled mono layers (SAMs). However, the research on surface modifications has been limited within several substrates such as Si-based materials. In present study, we investigated the formation of block copolymer on Au substrate by $O_2$ plasma treatment with the SAM of 3-(p-methoxy-phenyl)propyltrichloro-silane [MPTS, $CH_3OPh(CH_2)_3SiCl_3$]. After $O_2$ plasma treatment, the chemical bonding states of the surface were analyzed by X-ray photoelectron spectroscopy (XPS). The static contact angle measurement was performed to study the effects of $O_2$ plasma treatment on the formation of MPTS monolayer. The block copolymer nanotemplates formed on Au surface were analyzed by scanning electron microscopy. The results showed that the ordering of self-assembled block copolymer pattern and the formation of cylindrical nano hole arrays were enhanced dramatically by oxygen plasma treatment. Thus, the oxidation of gold surface by $O_2$ plasma treatment enables the MPTS to form the monolayer assembly leading to surface neutralization of gold substrates.