Proceedings of the Materials Research Society of Korea Conference (한국재료학회:학술대회논문집)
- 2009.11a
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- Pages.33.2-33.2
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- 2009
Surface modification for block copolymer nanolithographyon gold surface
- Published : 2009.11.05
Abstract
Block copolymer lithography has attracted great attention for emerging nanolithography since nanoscaleperiodic patterns can be easily obtained through self-assembly process without conventional top-down patterning process. Since the morphologies of self-assembled block copolymer patterns are strongly dependent on surface energy of a substrate, suitable surface modification is required. Until now, the surface modification has been studied by using random copolymer or self-assembled mono layers (SAMs). However, the research on surface modifications has been limited within several substrates such as Si-based materials. In present study, we investigated the formation of block copolymer on Au substrate by