• Transactions on Electrical and Electronic Materials
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• v.5 no.3
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• pp.104-108
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• 2004

Problems of overlap errors and side-lobe printing by the design rule reduction in the lithography process using attenuated phase-shifting masks(attPSM) have been serious. Overlap errors and side-lobes can be simultaneously solved by the rule-based correction using scattering bars with the rules extracted from test patterns. Process parameters affecting the attPSM lithography simulation have been determined by the fitting method to the process data. Overlap errors have been solved applying the correction rules to the metal patterns overlapped with contact/via. Moreover, the optimal insertion rule of the scattering bars has made it possible to suppress the side-lobes and to get additional pattern fidelity at the same time.

• Proceedings of the IEEK Conference
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• 2004.08c
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• pp.784-786
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• 2004

Overlap errors and side-lobes can be simultaneously solved by the rule-based correction using scattering bars with the rules extracted from test patterns. Process parameters affecting the attPSM lithography simulation have been determined by the fitting method to the process data. Overlap errors have been solved applying the correction rules to the metal patterns overlapped with contact/via. Moreover, the optimal insertion rule of the scattering bars has made it possible to suppress the side-lobes and to get additional pattern fidelity at the same time.

• Proceedings of the Korean Society Of Semiconductor Equipment Technology
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• 2004.05a
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• pp.159-162
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• 2004

Problems of overlap errors and sidelobe printing by the design rule reduction in the lithography process using attenuated phase-shifting masks(attPSM) have been serious. Overlap errors and sidelobes can be simultaneously solved by the rule-based correction using scattering bars with the rules extracted from test patterns. Process parameters affecting the attPSM lithography simulation have been determined by the fitting method to the process data. Overlap errors have been solved applying the correction rules to the metal patterns overlapped with contact/via. Moreover, the optimal insertion rule of the scattering bars has made it possible to suppress the sidelobes and to get additional pattern fidelity at the same time.

• Journal of Drive and Control
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• v.13 no.1
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• pp.34-42
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• 2016

This study studied how the clearance, overlap and mismatch errors of spool-sleeve affect the static pressure characteristics of a servo valve. A computer simulation model was established as a direct acting servo valve and a series of simulations was conducted for various values of clearance, overlap and mismatch errors. Pressure gain decreased as the clearance increased. The overlap also affects the pressure gain and was similar to the effect of clearance. Asymmetry of the pressure plot got worse and worse as the mismatch error increased.

• Journal of Korean Society for Atmospheric Environment
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• v.25 no.5
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• pp.450-458
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• 2009

The range-dependent overlap factor of a lidar system can be determined experimentally if a Raman backscatter signal by molecule is measured in addition to the usually observed elastic backscatter signal, which consists of a molecular component and a particle component. The direct determination of the overlap profile is presented and applied to a lidar measurement according to variation of telescope field-of-view and distance between telescope and transmitting laser. The retrieval of extinction coefficient by Raman method can generate high errors for heights below planetary boundary layer if the overlap effect is ignored. The overlap correction method presented here has been successfully applied to experimental data obtained in Gwangju, Korea.

• Economic and Environmental Geology
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• v.41 no.2
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• pp.219-223
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• 2008

Many cross-over errors due to position errors, meter errors, observation errors, sea conditions and so on occur when marine geophysical data collected by own and other agencies are merged, and these errors can create artificial anomalies which cause an improper interpretation. Many methods have been introduced to reduce cross-over errors. However, most methods are designed to compare each point or segment data to find cross-over points, and require a long processing time. Therefore, FORTRAN program (FastXcorr) is presented to fast determine cross-over points using an overlap-sector, and to adjust cross-over errors using a weighted linear interpolation algorithm.

• Proceedings of the Korean Society for Bioinformatics Conference
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• 2001.08a
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• pp.11-35
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• 2001

For the last twenty years fragment assembly in DNA sequencing followed the "overlap - layout - consensus"paradigm that is used in all currently available assembly tools. Although this approach proved to be useful in assembling clones, it faces difficulties in genomic shotgun assembly: the existing algorithms make assembly errors and are often unable to resolve repeats even in prokaryotic genomes. Biologists are well-aware of these errors and are forced to carry additional experiments to verify the assembled contigs. We abandon the classical “overlap - layout - consensus”approach in favor of a new Eulerian Superpath approach that, for the first time, resolves the problem of repeats in fragment assembly. Our main result is the reduction of the fragment assembly to a variation of the classical Eulerian path problem. This reduction opens new possibilities for repeat resolution and allows one to generate error-free solutions of the large-scale fragment assemble problems. The major improvement of EULER over other algorithms is that it resolves all repeats except long perfect repeats that are theoretically impossible to resolve without additional experiments.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.4 no.1
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• pp.22-26
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• 2003

Overlap Errors and side-lobes have been simultaneously solved by the rule-based correction using the rules extracted from test patterns. Lithography process parameters affecting attPSM lithography process have been determined by the fitting method to the real process data. The correction using scattering bars has been compared to the Cr shield method. The optimal insertion rule of the scattering bal's has made it possible to suppress the side-lobes and to enhance DOF at the same time. Therefore, in this paper, the solution to both side-lobe and overlap Error has been proposed using rule-based confection. Compared to the existing Cr shield method, the proposed rule-based correction with scattering bars can reduce the process complexity and time for mask production.

• Bulletin of the Korean Space Science Society
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• 2004.10b
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• pp.278-280
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• 2004

GPS Navigation Solutions are used for operational orbit determination for the KOMPSAT-1 spacecraft. GPS point position data are definitely affected by systematic errors as well as noise. Indeed, the systematic error effects tend to be longer term since the GPS spacecrafts have periods of 12 hours. And then, the overlap method of determining orbit accuracy is always optimistic because of the presence of systematic errors with longer term effects. In this paper, we investigated the measurement noise and the system error for the KOMPSAT-l GPS Navigation Solutions. To assess orbit accuracy with this type of data, we use longer data arcs such as 5-7 days instead of 30 hour data arc. For this assessment, we should require much more attention to drag and solar radiation drag parameters or even general acceleration parameters in order to assess orbit accuracy with longer data arcs. Thus, the effects of the consideration of the drag, solar radiation drag, and general acceleration parameters were also investigated.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 1995.04b
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• pp.400-407
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• 1995

The straightness property is one of fundamental geometric tolerances to be strictly controlled for guideways of machine tools and measuring machines. The staightness measurement for long guideways was usually difficult to perform, and it needed additional equipments or special treatment with limited application. In this paper, a new approach is proposed using the profile matching technique for the long guideways, which can be applicable to most of straghtness measurements. An edge of relativelly sthort length is located along a divided section of a long guideway, and the local straightness measurement is performed. The edge is then moved to the next section with several positions overlap. After thelocal straightness profile is measured for every section along the long guideway with overlap, the global straightness profile is constructed using the profile matching technique based on theleast squares method. The proposed techinique is numerically tested for two cases of known global straightness profile arc profile and irregular profile and those profiles with and without random error intervention, respectively. When norandom errors are involved, the constructed golval profile is identical to the original profile. When the random errors are involved, the effect of the number of overlap points are investigated, and it is also found that the difference between the difference between the constructed and original profiles is very close to the limit of random uncertainty with juist few overlap points. The developed technique has been practically applied to a vertical milling machine of moving table type, and showed good performance. Thus the accuracy and efficiency of the proposed method are demonstrated, and shows great potential for variety of application for most of straightness measuirement cases using straight edges, laser optics, and angular measurement equipments.