• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.06a
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• pp.439-440
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• 2007

To enhance the electron injection from the cathode of organic light-emitting diodes (OLEDs), We have studied characteristics of device that electron injection layer(EIL) is inserted between emissive layer and cathode. We fabricated bi-layer cathode $Li_2O$(x nm)/Al(100nm) and LiF(x nm)/Al(100nm) using LiF and $Li_2O$ as an electron injection layer. We analyzed the current efficiency, luminance efficiency, and external quantum efficiency of the device by varying the thickness of $Li_2O$ and LiF to be 0.5nm, 1nm, or 3nm. Using the EIL, we have obtained the efficiency of 7cd/A and the luminance of $20,000cd/m^2$. There is an improvement of efficiency by more than 3 times than the device without the $Li_2O$ layer.

• Journal of the Semiconductor & Display Technology
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• v.20 no.3
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• pp.22-26
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• 2021

Thin-film encapsulation (TFE) technology is most effective in preventing water vapor and oxygen permeation in the organic light emitting diodes (OLED). Of those, a laminated structure of Al₂O₃ and MgO were applied to provide efficient barrier performance for increasing the stability of devices in air. Atomic layer deposition (ALD) method is known as the most promising technology for making the laminated Al₂O₃/MgO and is used to realize a thin film encapsulation technology in organic light-emitting diodes. Atomic layer deposited inorganic films have superior barrier performance and have advantages of excellent uniformity over large scales at relatively low deposition temperatures. In this study, the control system of the MgCP₂ precursor for the atomic layer deposition of MgO was established in order to deposit the MgO layer stably by the injection time of second level and the stable heating temperature. The deposition rate was obtained stably to be from 4 to 10 Å/cycle using the injection pulse times ranging from 3 to 12 sec and a substrate temperature ranging from 80 to 150 ℃.

• Korean Journal of Materials Research
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• v.33 no.12
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• pp.511-516
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• 2023

Amorphous In-Ga-Zn-O (a-IGZO) thin film transistors (TFTs) with a coplanar structure were fabricated to investigate the feasibility of their potential application in large size organic light emitting diodes (OLEDs). Drain currents, used as functions of the gate voltages for the TFTs, showed the output currents had slight differences in the saturation region, just as the output currents of the etch stopper TFTs did. The maximum difference in the threshold voltages of the In-Ga-Zn-O (a-IGZO) TFTs was as small as approximately 0.57 V. After the application of a positive bias voltage stress for 50,000 s, the values of the threshold voltage of the coplanar structure TFTs were only slightly shifted, by 0.18 V, indicative of their stability. The coplanar structure TFTs were embedded in OLEDs and exhibited a maximum luminance as large as 500 nits, and their color gamut satisfied 99 % of the digital cinema initiatives, confirming their suitability for large size and high resolution OLEDs. Further, the image density of large-size OLEDs embedded with the coplanar structure TFTs was significantly enhanced compared with OLEDs embedded with conventional TFTs.

• 한국정보디스플레이학회:학술대회논문집
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• 2004.08a
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• pp.688-691
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• 2004

In this study, we synthesized a new red emitting material of a Red225 doped into $Alq_3$ (tris(8-quinolinolato)aluminum (III)) and fabricated white organic light-emitting diodes (OLEDs) with a simple device structure. With a blue emitting material of DPVBi (4,4'-bis(2,2'-diphenylvinyl)1,1'-biphenyl) that can transfer effectively both a hole and an electron, OLEDs with a narrow emission layer could be possible without a hole-blocking layer. Consequently, the driving voltage and stability of devices have been improved. The devices show the Commission Internationale d'Eclairage (CIE) chromaticity coordinates of (0.36, 0.35) at luminance of 2000 cd/$m^2$. The luminous efficiency is about 3.5 cd/A, luminance is about 12000 cd/$m^2$ and current density is about 350 mA/$cm^2$ at 12 V, respectively.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.12 no.10
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• pp.4590-4599
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• 2011

The Color shift phenomenon is becoming a major degradation factor of the emitting color purity in the organic emitting diodes which is generating a plurality of colors. In this study, the basic structure of organic light emitting diode device is comprised of ITO/${\alpha}$-NPD/$Alq_3$:DCJTB[wt%]/$Alq_3$/Mg:Ag, we have carry out numerical simulation of the electric-optical characteristics in organic light emitting diode device to estimate the mechanism of color shift phenomenon. We have investigated the causes of the color shift through the change of DCJTB doping concentration ratio. As the result, we have confirmed that the changes of the recombination rate which generated by trapped electrons and holes is one of the major factors for the color shift phenomenon.

• Bulletin of the Korean Chemical Society
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• v.26 no.9
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• pp.1344-1346
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• 2005

We report microcavity effect of top emission organic light-emitting diodes (OLEDs) by using Al cathode and anode, which are feasible for not only top emission EL and angle dependant effects but facile evaporation process without ion sputtering. The device in case of $Alq_3$ green emission showed largely shifted EL maximum wavelength as 650 nm maximum emission. It was also observed that detection angle causes different EL maximum wavelength and different CIE values in R, G, B color emission. As a result, the green device using $Alq_3$ emission showed 650 nm emission ($0^{\circ}$) to 576 nm emission ($90^{\circ}$) as detection angle changed. We believe that these phenomena can be also explained with microcavity effect which depends on the different length of light path caused by detection angle.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.07b
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• pp.1007-1010
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• 2003

We made use of $Alq_3$ which is the representative light-emitting material. Electric conduction mechanism and luminance characteristics were analyzed in this paper. We have also measured current density-thickness-voltage characteristics with thickness variation from 60 to 400nm. we analyzed the low electric and the high electric field in theoretically. Also, maximum luminous efficiency is the thickness 200 nm of $Alq_3$ in luminous-thickness characteristics.

• 한국정보디스플레이학회:학술대회논문집
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• 2008.10a
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• pp.499-502
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• 2008

Effects of a dielectric capping layer on the luminous characteristics of top emitting organic light emitting diodes (TOLEDs) have been analyzed using a classical electromagnetic theory. Special attention was given to the influence of the cavity length on the effectiveness of the capping layer. The luminance characteristics of the TOLEDs influenced by the combined effects of the cavity length and the capping layer thickness. Furthermore, these combined effects also modify the emission spectrum and pattern of the TOLEDs, which result in the improvement of total luminance of the device, but no significant change in the device out-coupling efficiency.

• 한국정보디스플레이학회:학술대회논문집
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• 2009.10a
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• pp.354-355
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• 2009

In the fabrication of inverted top-emitting organic light emitting diodes (ITOLEDs), the sputtering process is needed for deposition of transparent conducting oxide (TCO) as top anode. Energetic particle bombardment, however, changes the physical properties of underlying layers. In this study, we examined plasma process effects on tungsten oxide ($WO_3$) hole injection layer (HIL). From our results, we suggest the theoretical mechanism to explain the correlation between the physical property changes caused by plasma process on $WO_3$ HIL and degradation of device performances.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2005.07a
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• pp.477-478
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• 2005

The devices with a structure of ITO/$Alq_3$/Al were fabricated and their impedance properties were analyzed. It is obtained that an effect of resistance $R_p$ of the device was dominant at the low frequency and the high voltage region, emitting region, and it is ignored at the high frequency region. Capacitance $C_p$ appears intensely in a range of all frequencies of non-emitting region, below turn on voltage.