• Title/Summary/Keyword: Optical transmittance spectra

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Properties of MgMoO4:Eu3+ Phosphor Thin Films Grown by Radio-frequency Magnetron Sputtering Subjected to Thermal Annealing Temperature (열처리 온도 변화에 따른 라디오파 마그네트론 스퍼터링으로 성장된 MgMoO4:Eu3+ 형광체 박막의 특성)

  • Cho, Shinho
    • Current Photovoltaic Research
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    • v.4 no.1
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    • pp.25-29
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    • 2016
  • $Eu^{3+}$-activated $MgMoO_4$ phosphor thin films were grown at $400^{\circ}C$ on quartz substrates by radio-frequency magnetron sputter deposition from a 15 mol% Eu-doped $MgMoO_4$ target. After the deposition, the phosphor thin films were annealed at several temperatures for 30 min in air. The influence of thermal annealing temperature on the structural and optical properties of $MgMoO_4:Eu^{3+}$ phosphor thin films was investigated by using X-ray diffraction (XRD), photoluminescence (PL), and ultraviolet-visible spectrophotometry. The transmittance, optical band gap, and intensities of the luminescence and excitation spectra of the thin films were found to depend on the thermal annealing temperature. The XRD patterns indicated that all the thin films had a monoclinic structure with a main (220) diffraction peak. The highest average transmittance of 91.3% in the wavelength range of 320~1100 nm was obtained for the phosphor thin film annealed at $800^{\circ}C$. At this annealing temperature the optical band gap energy was estimated as 4.83 eV. The emission and excitation spectra exhibited that the $MgMoO_4:Eu^{3+}$ phosphor thin films could be effectively excited by near ultraviolet (281 nm) light, and emitted the dominant 614 nm red light. The results show that increasing RTA temperature can enhance $Eu^{3+}$ emission and excitation intensity.

Effect of Pulse Frequency on the Properties of ZnO:Al Thin Films Prepared by Pulsed DC Magnetron Sputtering (펄스 DC 마그네트론 스퍼터링법에 의한 ZnO:Al 박막 증착시 펄스 주파수의 영향)

  • 고형덕;이충선;태원필;서수정;김용성
    • Journal of the Korean Ceramic Society
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    • v.41 no.6
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    • pp.476-480
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    • 2004
  • AZO (Al-doped ZnO) thin films were deposited on glass by pulsed magnetron sputtering method, and their structural, electrical and optical properties were investigated. XRD patterns showed that a highly c-axis preferred AZO film was grown in perpendicular to the substrate when pulse frequency of 30 ㎑ was applied to the target. Microstructure of thin films showed that the fibrous grain of tight dome shape was grown. The deposition rate decreased linearly with increase of pulse frequency, and the lowest resistivity was 8.67${\times}$10$\^$-4/ $\Omega$-cm for the film prepared at pulse frequency of 30 ㎑. The optical transmittance spectra of the films showed a very high transmittance of 85∼90%, within visible wavelength region and exhibited the absorption edge of about 350 nm. The characteristics of the low electrical resistivity and high optical transmittance of AXO films suggested a possibility for the application to transparent conducting oxides.

EVALUATION OF NON-INVASIVE BLOOD GLUCOSE MEASUREMENT USING THREE TYPES OF NEAR INFRARED SPECTROMETER

  • Baek, Ju-Hyun;Kang, Na-Roo;Woo, Young-Ah;Kim, Hyo-Jin
    • Proceedings of the PSK Conference
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    • 2003.04a
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    • pp.289.1-289.1
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    • 2003
  • Three types of near infrared spectrometer, a photo diode array type, a dispersive type and a FT type, were evaluated and compared the systematic difference in blood glucose measurement. The fundamental study was performed by adding glucose to buffer solution and bovine blood as the preceding study of non-invasive blood glucose. Spectra were collected using a 1.0 mm optical pathlength quartz cell by transmittance method. (omitted)

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Characterization of Al:ZnO thin films deposited at different substrate temperatures (기판 온도변화에 따른 Al-ZnO 박막의 특성)

  • No, I.J.;Shin, P.K.;Lee, C.;Kim, Y.H.;Ji, S.H.;Lim, Y.C.;Chung, M.Y.
    • Proceedings of the KIEE Conference
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    • 2007.07a
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    • pp.242-243
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    • 2007
  • Highly transparent conducting aluminum-doped zinc oxide (AZO) thin films were deposited on Corning glass substrate using an Nd:YAG pulsed laser deposition technology. AZO thin films deposited with 650nm thickness showed the best electrical properties of the electrical resistivity of $4.6{\times}10^{-4}[{\Omega}{\cdot}cm]$, a carrier concentration of $9.3{\times}10^{20}[cm^{-3}]$, and a carrier mobility of $31[cm^2/V{\cdot}s]$. Besides, the optical transmittance spectra in visible region (200-800nm) of AZO thin films show an high average transmittance over 90%.

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DIAMOND-LIKE CARBON FILMS FOR ANTIREFLECTION COATINGS OF GERMANIUM INFRATED OPTICAL LENSES

  • Kim, Seong-Young;Lee, Sang-Hyun;Lee, Jai-Sung
    • Journal of the Korean institute of surface engineering
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    • v.32 no.3
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    • pp.461-466
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    • 1999
  • Diamond-like carbon(DLC) films were directly deposited onto germanium(Ge) witness pieces and lenses by a capacitively coupled 13.56 MHz RF glow discharge plasma with $CH_4$ gas. The characterizations of DLC films were measured using a Raman and FTIR spectrometer. The configuration of Raman and FTIR spectra had a traditional shape. The IR transmittance was measured using an IR spectrophotometer. The maximum values of the IR transmission of Ge with the DLC/Ge/DLC, DLC/Ge/BBAR (broad band antireflection), DLC/Ge, and BBAR/Ge structures are 98%, 93%, 64%, and 63.5%, respectively, which come up to the theoretical values. The uniform DLC films were obtained by a rotation of the cathode at certain conditions.

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Design and characterization of conductive transparent filter using [TiO2|Ti|Ag|TiO2] multilayer ([TiO2|Ti|Ag|TiO2] 다층구조를 이용한 전도성 투과필터의 설계 및 특성분석)

  • Lee, Seung-Hyu;Lee, Jang-Hoon;Hwangbo, Chang-Kwon
    • Korean Journal of Optics and Photonics
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    • v.13 no.4
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    • pp.363-369
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    • 2002
  • We have designed conductive transparent filters using a low-emissivity coating such as [dielectric|Ag|dielectric] for display applications. The design is the repetition of [$TiO_{2}$|Ti|Ag |$TiO_{2}$] to increase the transmittance in the visible and decrease the transmittance in the near IR. The conductive transparent filters are deposited by a radio frequency(RF) magnetron sputtering system. The optical, structural and electrical properties of the filters were investigated and the optical spectra are compared with simulated spectra. The thickness of the deposited Ag films is above 13 ㎚ to increase the conductivity and that of $TiO_{2}$ films is 24 ㎚ to increase the transmittance in the visible range. Ti blockers are employed to prevent the Ag films from being oxidized by an oxygen gas during the reactive sputtering process. Also, it is shown that the thicker Ti film is necessary as the period increases. Finally, a filter with repetition of the basic structure three times shows the better cut-off near infrared(NIR) and the sheet resistance as low as 2Ω/□ which is enough to shield an unnecessary electromagnetic waves for a display panel.

Structure, Optical and Electrical Properties of AI-doped ZnO Thin Film Grown in Hydrogen-Incorporated Sputtering Gas

  • Kim, Kyoo-Ho;Wibowo, Rachmat Adhi;Munir, Badrul
    • 한국신재생에너지학회:학술대회논문집
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    • 2005.06a
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    • pp.154-159
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    • 2005
  • Low RF power density was used for preparing transparent conducting AI-doped ZnO (AZO) thin films by RF Magnetron Sputtering on Corning 1737 glass. The dependence of films' structural, optical and electrical properties on sputtering gas, film's thickness and substrate temperature were investigated. Low percent of incorporated H2 in Ar sputtering gas has proven to reduce film's resistivity and sheet resistance as low as $4.1\times10^{-3}{\Omega}.cm$. It also formed new preferred peaks orientation of (101) and (100) which indicated that the c-axis of AZO films was parallel to the substrate. From UN-VIS-NIR Spectrophotometer analysis, it further showed high optical transmittance at about $\~ 90\%$ at visible light spectra (400-700nm).

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Optical properties of amorphous $Si_xC_yN_z$ ternary thin films prepared by plasma enhanced chemical vapor deposition

  • Zhang, Z.H.;Fan, X.J.;Guo, H.X.;Zhang, W.;Zhang, C.Y.;Luo, F.Y.
    • Journal of the Korean Vacuum Society
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    • v.7 no.s1
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    • pp.190-196
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    • 1998
  • Amorphous ternary $Si_xC_yN-z$ thin films were obtained by plasma enhanced chemical vapor deposition(PECVD) using $N_2, SiH_4 \;and \;C_2H_4$ as the reaction sources. The chemical state were characterized by x-ray photoelectron spectroscopy (XPS) and Fourier transform infrared spectroscopy(FTIR). The optical properties of the thin films were investigated by UV-visible spectrophotometer and ellipsometer, and the optical band gaps of thin films were determined from corresponding transmittance spectra following Tauc equation.

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Electrical and Optical Properties of CdS Thin Film with Different Substrate Temperatures (CdS 박막의 기판온도 변화에 따른 전기 및 광학적 특성)

  • Park, Jung-Cheul;Lee, Woo-Sik;Chu, Soon-Nam;Cho, Yong-Joon;Jeon, Yong-Woo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.22 no.9
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    • pp.792-797
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    • 2009
  • In this paper, CdS thin films for the use of window layer in solar cell were fabricated by vacuum evaporation method to improve the reproducibility, The electrical and optical properties of thin films with the variations of substrates temperature and the variations of the film thickness were investigated. As increasing the substrates temperature the resistivities of films were increased. The samples transmissivity were shown over 70% when the wavelength were above 500 nm. In the films with 280 nm thickness, its transmissivity were reached 100%. The resistivities of the samples were decreased as increasing its thickness.

Optical and Structural Properties of Multi-period Low-emissivity Filters by RE Magnetron Sputtering

  • Lee, J.-H.;Lee, S.-H.;Yoo, K.-L.;Lee, K.-S.;Hwangbo, C.K.
    • Journal of Korean Vacuum Science & Technology
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    • v.6 no.2
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    • pp.67-70
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    • 2002
  • Multi-period low-emissivity (low-e) filters based on [TiO$_2$|Ti|Ag|TiO$_2$] layer structure were designed and fabricated by a RF magnetron sputtering method. Optical, structural, chemical, and electrical properties were investigated with various analytical tools. Interface layers consisting of Ag, Ti, and O were observed next to Ag layers by Rutherford backscattering spectrometry (RBS) analysis. The results show that Ti layers of ~ 1.8 nm protect the Ag layers from oxidation better than those of ~ 1 nm and the optical spectra of the filter with thicker Ti layers are in agreement with the simulated one. The average transmittance of a low-e filter with thicker Ti layers is reduced and the sheet resistance is slightly increased due to the increased Ti thickness.

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