• 제목/요약/키워드: Optical pattern

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홀로그램 연상기억을 이용한 광학적 영상인식에 관한 연구 (Optical Pattern Recognition Based on Holographic Associative Memory)

  • 서호형;김병윤;이상수
    • 한국광학회:학술대회논문집
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    • 한국광학회 1991년도 광학 및 양자전자학 워크샵
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    • pp.33-39
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    • 1991
  • We have developed a new holographic associative memory(HAN) based on an adaptive learning which uses learning pattern method (LPM). The LPM utilizes the simple optical implementation of outer-product learning, performance of adapitive learning. simulation are represented.

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Optical Pattern Switching in Semiconductor Microresonators as All-Optical Switch

  • Kheradmand, Reza;Dastmalchi, Babak
    • ETRI Journal
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    • 제31권5호
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    • pp.593-597
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    • 2009
  • In this paper, we present a spatial perturbation method to control the optical patterns in semiconductor microresonators in the far-field configuration. We propose a fast all-optical switch which operates at a low light level. The switching beam controls the behavior of output beams with strong intensities. The method has been applied successfully to different optical patterns such as rolls, squares, and hexagons.

사출성형 특성을 고려한 2인치 도광판의 광효율 향상에 관한 연구 (A Study on the Improvement of Optical Efficiency for The 2 inch LGP Considering Injection Molding Characteristics)

  • 도영수;황철진;윤경환
    • 소성∙가공
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    • 제17권5호
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    • pp.322-327
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    • 2008
  • LGP is a key component of LCD back light unit because it determines brightness and sharpness of the display image. Usually, it has optical patterns fabricated on the bottom surface. These optical patterns convert point or line sources placed in the side of LGP to plane source at the top surface by changing the propagating direction of the incident light. In the present paper the LiGA-reflow method was applied to fabricate the LGP mold. Furthermore, the optical simulation considering the replication ratio of pattern height was applied to the pattern design. The optical simulation through systematic correction scheme was adopted to find the optimum distribution of pattern density. Finally, the stamper fabricated by this method was installed in the mold and LGP was produced by injection molding. As a result of luminance measurement for the final product, the average luminance and luminance uniformity was measured 3,180 nit and 84%, respectively. Consequently, the mold fabrication method using the LiGA-reflow and optical simulation(CAE) can save the expense and time compared with the existing fabrication methods(laser ablation and chemical etching).

근접장 광기록 헤드의 광학적 성능 평가와 정렬 오차에 대한 간섭 무늬 패턴 분석에 대한 연구 (A Study on the Evaluation of the Optical Head of a Near-field Optical Recording System and Interference Pattern Analysis)

  • 윤형길;권대갑;이준희;정재화;오형렬
    • 한국정밀공학회지
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    • 제22권5호
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    • pp.80-86
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    • 2005
  • Optical performance evaluation results and an interference fringe pattern analysis of alignment errors for an optical head of a near-field receding (NFR) system are presented. The focusing unit is an optical head of a NFR system and is composed of a solid immersion lens (SIL) and an objective lens (OL). Generally, the size of the focusing unit is smaller than that of the conventional optical recording head. Hence there are difficulties to assemble the small focusing unit precisely. We composed an evaluation system with an interferometer and evaluated some focusing unit samples aligned and assembled by manual and present the obtained results. Using the conventional optical tool, Code V, a tolerance analysis of the alignment error between the SIL and the objective lens and an interference pattern analysis for the assembly error are executed. Then, through an analysis of the simulation results, the conceptual auto-alignment methodology using a neural network approach is considered.

Optical Stepper의 이중노광에 의한 미세한 포토레지스트 패턴의 형성 (Very Fine Photoresist Pattern Formation using Double Exposure of Optical Wafer Stepper)

  • 양전욱;김봉렬;박철순;박형무
    • 전자공학회논문지A
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    • 제31A권7호
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    • pp.69-75
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    • 1994
  • A very fine pattern formation process using double exposure is investigated, which can overcome the resolution limit of optical wafer stepper. The very fine pattern can be obtained by moving the edge profile of large pattern by means of moving the stepper stage. The simulation results show that the light transmittance decrease bellow 9%, and the contrast increase to 16.6% for the 0.3$\mu$m photoresist pattern exposeed by the double exposure using i-line wafer stepper. And the experimental results show that fine photoresist pattern as short as 0.2$\mu$m can be obtained without a loss of photoresist thickness. Also, it proves that the depth of focus for 0.3$\mu$m pattern is longer than $1.5\mu$m. And, the very fine negative photoresist pattern was formmed by using the double exposure technique and the image reversal process.

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레이저 반사광을 이용한 표면 거칠기 측정 시스템에서 스크린의 영향에 관한 연구 (Study on the influence of a screen in the surface roughness measure sstem based on parametric optical analysis)

  • 서영호;김화영;안중환;최이존
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2003년도 춘계학술대회
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    • pp.845-850
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    • 2003
  • The scattered light pattern from a machined surface generally contains much information concerning the surface roughness. The light pattern can be acquired by optical system and analyzed by statistical method. This kind of surface roughness measurement system can be easily adopted on the machine measurement. But the fully assembled system is too complex to implement on small systems using micro-controller. This study proposes the idea of reducing the number of optical components by removing screen and examines image processing of a light pattern to minimize the negative result of incomplete optical system. And the Gaussian blur filtering is concluded to be the best method of proposed measurement system. Furthermore light intensity variation of image pattern can be treated as a signal, therefore FIR filtering gives the similar result of Gaussian blur effect.

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전자 스페클 패턴 간섭계를 이용한 형상 측정 (Surface contouring using Electronic Speckle Pattern Interferometry)

  • 김계성;유원재;강영준
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 1995년도 추계학술대회 논문집
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    • pp.397-401
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    • 1995
  • ESPI(Electronic Speckle Pattern Interfermetry) is an optical technique to measure surface deforamtion of engineering components and materials in industrial ares. This optical method is capable of providing full-field results with high spatial resolution, high speed and is the non-contact technique. One of important application aspects using electronic speckle pattern interferometry is to generate contours of a diffuse object in order to provide data for 3-D shape analysis and topography measurement. The contouring method by modified dual-beam speckle pattern interferometry is proposed. We introduce a shift of the illumination beams through optical fiber in order to obtain the contour fringe patterns. The speckle pattern correlation technique is suitable for providing measurement range from millimeters to several centimeters. The complete geometric analysis of the contoretical and experimental results are obtained.

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광모듈 패키지용 Window 의 Metallization Pattern 제작 및 특성 평가 (Fabrication and Characterization of Window Metallization Pattern for Optical Module Package)

  • 조현민;단성백;류헌위;강남기
    • 한국마이크로전자및패키징학회:학술대회논문집
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    • 한국마이크로전자및패키징학회 2003년도 기술심포지움 논문집
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    • pp.239-242
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    • 2003
  • Optical module package is a hermetic metal-ceramic package for carrying optical IC. In case of LD(laser diode) module, window is used for both the path of optical signal and hermetic sealing of package. So, window has the metallization pattern on the surface for brazing process with package wall. In this study, several method were investigated for metallization. Thin film, thick film and mixed method were used for fabrication of metallization pattern. After brazing process, hermeticity and adhesion strength were tested for characterization of metallization pattern.

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LCD 백라이트 도광판의 광학 특성에 대한 연구 (Analysis on Optical Characteristics of LCD Backlight LGP)

  • 사종엽;박종렬
    • 대한기계학회논문집A
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    • 제28권4호
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    • pp.362-369
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    • 2004
  • LGP(Light-Guide Panel) of LCD backlight is one of the major componets which affect on the product quality of LCD. The optical relation between brightness and pattern has been investigated for LGP with the uniform distribution of brightness. When given the brightness distribution as target, the solutions of pattern distribution is not unique. Each solution of pattern designs shows the different brightness intensity even though they have the same brightness distribution with target's one. The manufacturing condition of pattern has an influence on the possibly-maximum-brightness intensity among the solutions of pattern design. The present study has examined the effects of LGP thickness, pattern shape errors, and reflection film on the optical characteristics of LGP.

감성에 소구(訴求)하는 가구조형의 패턴 연구 (A Study on Furniture Patterns Appealing to Emotions)

  • 김두영;김명태
    • 한국가구학회지
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    • 제25권4호
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    • pp.338-344
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    • 2014
  • Modern furniture design is advancing by putting value on individual sensitivity. Accordingly, this study will focus on optical art, which can give various changes in people's sensitivity. Optical art was actively applied in various fields of image, photograph, fashion, textile, accessory and interior from the 1950s till the 1960s. Optical art realized by Victor Vasarely (1908~) opened a new trend in art by accurately realizing concise and precise expressions. This study analyzed the impact of pattern expression on sensitivity in optical art and suggested a method, which can spatiotemporally maximize the emotional change by combining optical art with the form of furniture. Modern furniture design is changing toward the direction of fitting to the propensity and emotional taste of an individual. Accordingly, this study analyzed the emotional expression felt in the furniture modeling works featured by concise, straight and standardized rectangular shape. Based on the result of analysis, this study would like to suggest a method to utilize optical pattern as a means for emotional design, with which people are able to perform various emotional expressions while keeping the function and form of furniture.

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