• Journal of the Korean Institute of Telematics and Electronics D
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• v.35D no.11
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• pp.91-99
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• 1998

A 5Gbps LiNbO$_3$ optical phase modulator was designed, packaged and it's properties were characterized for optical communications. The APE(annealed proton exchange) method was employed for the optical waveguide and the electrode of ACPS (asymmetric coplanar strip) type was formed by electro-plating on LiNbO$_3$ for applying microwave signal with a dimension of width 18${\mu}{\textrm}{m}$, gap 9${\mu}{\textrm}{m}$ and length 50mm. The fabricated single-moded modulator operated at a 1550nm wavelength exhibits its modulation bandwidth, insertion loss and driving voltage of 7㎓, 3.0dB and 6V, respectively.

• Journal of the Korean Institute of Telematics and Electronics D
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• v.34D no.11
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• pp.76-82
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• 1997

The characteristics of optical waeguides and IDT electrodes fabricated for acousto-optic tunable filters (AOTE) used for optical communications were analyzed. A $Ti:LiNbO_3$ in-diffusion method was employed for the formation of the optical waveguide with a dimension of width $8\mu\textrm{m}$, length $30000\mu\textrm{m}$, and thickness $1150{\AA}$. The diffusion was carried at $1050^{\circ}C$ for 8 houss to pattern the optical waveguide with Ti. The resulted waveguide exhibited a single mode at a 1550nm wavelength range and its propagation loss was less than 0.5dB/cm. The width of IDT, with 10 SAW periods, was $5000\mu\textrm{m}$, S11 reflection characteristics and impedances of th eelectrodes deposited with Au were analyzed using a network analyzer; $48.1\Omega$ at th ecenter frquency of 193MHz for Au deposition thickness of $1500{\AA}$ and $50.7\Omega$ at the center frequency of 192MHz for au deposition thickness of $1600{\AA}$.

• Transactions on Electrical and Electronic Materials
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• v.9 no.1
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• pp.16-19
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• 2008

In this study, it was investigated about optical simulation in direct-type backlight design. Direct-type backlight has been used high-brightness backlight such as medical LCD application. The key parameter in designing direct-type backlight was consists of three geometrical dimension such as the distance of two lamps, the gap of lamp and reflection plate and the number of lamps. It has many of variations in optical design and it causes the different properties in backlight system. It shows the best values of above parameters; 26 mm of the distance of two lamps, 4.5 mm of the gap of lamp and reflection plate and 16 lamps. And we produced the specimen as above condition, and acquired good result in backlight such as the value of the brightness is 6423 nit in center of emission area and less than 5 % in brightness uniformity. It shows the effective ways of designing backlight system using optical simulation method for medical LCD application.

• Journal of the Korean Society of Clothing and Textiles
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• v.19 no.2
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• pp.190-202
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• 1995

The Optical Art is based on the principle of visual perception of the illusionary effects which induce psychological responses. It has influenced greatly on the Texile Design in that unique iJlusionary creativity of pattern simulates the visual sense of special movement; the dynamic psylosophy of vitalism. The Optical pattern has become a highly valued item due to its innovative effect in aesthetic direction. According to Vitor Vasarely the pioneer in this area, the integration and the inseparability of form and color which he calls 'Plastic Unity' provides the basis for the composition of infinite variety. The composition of infinite variety. The composition reveals the complex interaction between the space and form relating to order, repetition, combination and permutation. It is not simple to create optical patterns due to the extreme complexity composed by the multi-dimension and the infusion of form and color giving immensely varied movement. The purposes of this study are as follows; 1) to classify the complex processes of optical pattern on the basis of formative method. 2) to develop creative ideas for progressive contemporary textile design In this study, the analysis of applied methods is concentrated, which is based 1) on the gradual modification and on the transformation of the basic plastic elements which depend on thle direction of visual points involVing contradictory perspectives 2) on the composition varied special situations by repeating, overlapping and converging a series of idetUical units or by means of irrdiation, radiation and etc.

• Publications of The Korean Astronomical Society
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• v.27 no.3
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• pp.87-93
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• 2012

A low-dispersion fiber feed Littrow-mounted grating spectrometer for education was designed and fabricated. The dispersion element is a reflective type blazed grating Edmundoptics NT 46-075 (spatial frequency 600 lines/mm, dimension $30mm{\times}30mm$, blazed angle 8.6 degree). The optical fiber coupler module for optical guiding from telescope to spectrometer is composed of a multi-mode FC connector - FC connector optical fiber patch cord (core/cladding diameter $50{\mu}m/125{\mu}m$) and two 1.25" throw-tube couplers. The lens for collimating and imaging is a general purpose focal length 50 mm camera lens (f/1.8). The device for optical path control is a rectangular prism (size $25mm{\times}25mm$). The imaging camera sensor is a Meade DSI Pro 2 CCD sensor (black and white, $752{\times}582$ pixels and pixel size $8.3{\mu}m{\times}8.6{\mu}m$). Softwares for data logging and analysis consist of Meade Autostar Suite, NIH imagej and Vernier Logger Pro 3. The wavelength coverage range of the spectrometer is 205 nm at central wavelength 550 nm. The wavelength resolution is 1.7 nm.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.06a
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• pp.415-415
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• 2007

In this study. it was investigated about optical simulation in direct-type backlight design. Direct-type backlight has been used high-brightness backlight such as LCD television application. The key parameter in designing direct-type backlight was consists of three geometrical dimension such as the distance of two lamps. the gap of lamp and reflection plate and the number of lamps. It has many variation in optical design and it causes the different properties in backlight system. It shows the best values of above parameters; 26mm of the distance of two lamps. 4.5mm of the gap of lamp and reflection plate and 16 lamps. And we produced the specimen as above condition. and acquired good result in backlight such as the value of the brightness is 6436 nit in center of emission area and less than 5% in brightness uniformity. It shows the effective ways of designing backlight system using optical simulation method.

• Korean Journal of Optics and Photonics
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• v.15 no.1
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• pp.79-85
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• 2004

We report on a transmittance controlled photomask with phase patterns on the back quartz surface. Theoretical analysis for changes in illumination pupil shape with respect to the variation of size and density of backside phase patterns and experimental results for improvement of critical dimension uniformity on a wafer by using the transmittance controlled photomask are presented. As phase patterns for controlling transmittance of the photomask we used etched contact-hole type patterns with 180" rotative phase with respect to the unetched region. It is shown that pattern size on the backside of the photomask must be made as small as possible in order to keep the illumination pupil shape as close as possible to the original pupil shape and to achieve as large an illumination intensity drop as possible at a same pattern density. The distribution of illumination intensity drop suitable for correcting critical dimension error was realized by controlling pattern density of the contact-hole type phase patterns. We applied this transmittance controlled photomask to a critical layer of DRAM (Dynamic Random Access Memory) having a 140nm design rule and could achieve improvement of the critical dimension uniformity value from 24.0 nm to 10.7 nm in 3$\sigma$.TEX>.

• ETRI Journal
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• v.27 no.2
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• pp.188-194
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• 2005

We report on the improvement of critical dimension (CD) linearity on a photomask by applying the concept of process proximity correction to a laser lithographic process used for the fabrication of photomasks. Rule-based laser process proximity correction (LPC) was performed using an automated optical proximity correction tool and we obtained dramatic improvement of CD linearity on a photomask. A study on model-based LPC was executed using a two-Gaussian kernel function and we extracted model parameters for the laser lithographic process by fitting the model-predicted CD linearity data with measured ones. Model-predicted bias values of isolated space (I/S), arrayed contact (A/C) and isolated contact (I/C) were in good agreement with those obtained by the nonlinear curve-fitting method used for the rule-based LPC.

• Publications of The Korean Astronomical Society
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• v.28 no.3
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• pp.75-82
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• 2013

An optical grism for education is fabricated and tested. It is composed of a transmission grating as dispersion element and a prism as diffraction angle compensation device. The transmission grating is Edmundoptics #49-584(spatial frequency 600 lines/mm, dimension $50mm{\times}50mm$). The prism is the fused silica type with angles ($41.3^{\circ}$, $-48.7^{\circ}$, $-90^{\circ}$). The grism device is fabricated by bonding the transmission grating and the prism with an optical adhesive. The zig for assembling the grism, telescope and camera is composed of an aluminum tube, an aluminum disk ring and a T-ring camera adaptor. The fabricated optical grism spectrograph is tested in laboratory using Halogen lamp and Neon lamp with DSLR camera. And the grism assembled with reflector telescope is tested in a field using stellar light. The results show good agreements with design parameters. The wavelength coverage range of the grism is 250 nm at the un-deviated wavelength of 506 nm. The wavelength resolution is 0.11 nm/pixel.

• Proceedings of the KSME Conference
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• 2007.05a
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• pp.1288-1293
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• 2007

The present study covers the design and analysis of a thermionic scanning electron microscope (SEM) column. The SEM column contains an electron optical system in which electrons are emitted and moved to form a focused beam, and this generates secondary electrons from the specimen surfaces, eventually making an image. The electron optical system mainly consists of a thermionic electron gun as the beam source, the lens system, the electron control unit, and the vacuum unit. In the design process, the dimension and capacity of the SEM components need to be optimally determined with the aid of finite element analyses. Considering the geometry of the filament, a three-dimensional (3D) finite element analysis is utilized. Through the analysis, the beam emission characteristics and relevant trajectories are predicted from which a systematic design of the electron optical system is enabled. The validity of the proposed 3D analysis is also discussed by comparing the directional beam spot radius. As a result, a prototype of a thermionic SEM is successfully developed with a relatively short time and low investment costs, which proves the adoptability of the proposed 3D analysis.