• 제목/요약/키워드: Optical dimension

검색결과 180건 처리시간 0.027초

광섬유 마이켈슨 간섭계형 교류 전류센서 (Fiber-Optic Michelson Interferometric AC Current Sensor)

  • 김창원;박동수;김명규;이정희;강신원;손병기
    • 센서학회지
    • /
    • 제4권2호
    • /
    • pp.22-28
    • /
    • 1995
  • 인가 전압에 의해 수축 팽창하는 원통형 PZT tube와 단일모드 광섬유를 이용하여 마이켈슨 간섭계형 교류 전류센서를 제작하였다. 본 연구에 사용된 신호처리장치는 측정전류의 주파수에 무관하게 전류의 크기를 측정할 수 있었다. 전류의 크기는 교류 전류의 반주기 내에 생기는 간섭무늬의 개수로 측정하였다. 간섭무늬의 개수는 전류의 크기에 따라 선형적으로 변화하였으며, 온도변화($-20^{\circ}C{\sim}\;80^{\circ}C$)에 따른 오차는 5% 이내였다.

  • PDF

Sagnac형 광섬유 센서를 이용한 중공 원통형 맨드릴의 재료 및 설치 방향에 따른 음압 감지 변화 연구 (Sound Pressure Sensitivity Variation of the Hollow Cylinder Type Sagnac Fiber Optic Sensor According to the Mandrel Install Direction and Its Material)

  • 이종길
    • 한국소음진동공학회논문집
    • /
    • 제22권7호
    • /
    • pp.626-633
    • /
    • 2012
  • In this paper, sound pressure sensitivity of the fiber optic acoustic sensor according to sensor direction and mandrel material were investigated experimentally. Three different directions were selected as stand, lay, and hole. Hollow cylinder type mandrel dimension is 30 mm in outer diameter, 45 mm in length, and 2 mm in thickness, and about 50 m optical fibers were wounded on the surface of the mandrel. Non-directional sound speaker was used as a sound source. Sagnac interferometer and single mode fiber, a laser with 1,550 nm in wavelength, $2{\times}2$ coupler were used. Based on the experimental results, lay direction's sensitivity is the highest in the frequency range of 2 kHz~4 kHz. 'PTFE+carbon' material is more sensitive than PTFE in the frequency range of 5 kHz~20 kHz. Sound pressure detection sensitivity depends on the mandrel direction and material under certain frequency.

복사열전달을 동반하는 다공성 매질내의 예혼합 화염 (The Premixed Flame in a Radiatively Active Porous Medium)

  • 김정수;백승욱
    • 대한기계학회논문집
    • /
    • 제13권2호
    • /
    • pp.265-270
    • /
    • 1989
  • 본 연구에서는 복사강도를 반구에 대하여 적분하여 비정상 미분방정식의 형태로 로 얻어지는 2-유속 회매질복사모델을 사용하여 복사전달방정식을 구성하고, 전술한 Yoshizawa 등의 가정을 배제하면서, 다공매질의 물리적 길이, 흡수계수 및 혼합기체의 당량비(equivalenceratio) 등을 변화시킴으로써 매질 내의 열적 구조를 분석하여 그들의 의 연구를 확장, 해석한다.

Application of Three-Dimensional Light Microscopy for Thick Specimen Studies

  • Rhyu, Yeon Seung;Lee, Se Jeong;Kim, Dong Heui;Uhm, Chang-Sub
    • Applied Microscopy
    • /
    • 제46권2호
    • /
    • pp.93-99
    • /
    • 2016
  • The thickness of specimen is an important factor in microscopic researches. Thicker specimen contains more information, but it is difficult to obtain well focused image with precise details due to optical limit of conventional microscope. Recently, a microscope unit that combines improved illumination system, which allows real time three-dimensional (3D) image and automatic z-stack merging software. In this research, we evaluated the usefulness of this unit in observing thick samples; Golgi stained nervous tissue and ground prepared bone, tooth, and non-transparent small sample; zebra fish teeth. Well focused image in thick samples was obtained by processing z-stack images with Panfocal software. A clear feature of neuronal dendrite branching pattern could be taken. 3D features were clearly observed by oblique illumination. Furthermore, 3D array and shape of zebra fish teeth was clearly distinguished. A novel combination of two channel oblique illumination and z-stack imaging process increased depth of field and optimized contrast, which has a potential to be further applied in the field of neuroscience, hard tissue biology, and analysis of small organic structures such as ear ossicles and zebra fish teeth.

3차원 대면적 연속 마이크로 레이저 패터닝을 위한 연구 (Study of 3 dimensional wide area continuous laser micro patterning)

  • 김경한;손현기;이제훈
    • 한국레이저가공학회지
    • /
    • 제18권4호
    • /
    • pp.1-5
    • /
    • 2015
  • For continuous laser micro patterning on three-dimensional free form surface, innovative laser system is developed. The two axis galvanometer is combined with the dynamic focusing unit to increase optical distance. Also, it is synchronized with the 3 axis mechanical system. To determine laser machining sequence, laser CAM system is developed. It can make possible of 3D surface micro patterning under $25{\mu}m$ pattern width. The uniformity of pattern width is about 2.8% and it is validated that focal plane is well conserved by the dynamic focusing unit. Velocity and positional information of 1 axis is stage is fed to the scanner control board by the encoder signal and it makes possible real time synchronization. With this system, possible patterning volume is enlarged from $40{\times}40mm^2$ to $40{\times}120{\times}30mm^3$.

3차원 FDTD 방법에 의한 ITO/Ag/ITO 다층 투명전극막의 투과도 시뮬레이션 (Simulations of Transmittance for the ITO/Ag/ITO Multiple Transparent Electrode Layers by 3 Dimensional FDTD Method)

  • 김기락;조의식;권상직
    • 반도체디스플레이기술학회지
    • /
    • 제19권3호
    • /
    • pp.88-92
    • /
    • 2020
  • As a highly conductive and transparent electrode, the optical transmittances of ITO/Ag/ITO were simulated and compared with the experimental results. The simulations are based on the finite-difference time-domain (FDTD) method in solving linear Maxwell equations. In our simulations, the computation domain is set in the XZ-plane with 3D dimension, and a plane wave with variable wavelengths ranging from 250 nm to 850 nm is incident in the z-direction at normal incidence to the ITO/Ag/ITO film surrounded by free-air space. As the results through both simulations and experiments, it was shown that the thickness combinations by the ITO layers of about 40 nm and the Ag layer of about 10 nm could be most suitable conditions as a high conductive transparent electrode having the transmittance similar to that of a single ITO layer.

위상변위 극자외선 마스크의 흡수체 패턴의 기울기에 대한 오차허용도 향상 (Improved Margin of Absorber Pattern Sidewall Angle Using Phase Shifting Extreme Ultraviolet Mask)

  • 장용주;김정식;홍성철;안진호
    • 반도체디스플레이기술학회지
    • /
    • 제15권2호
    • /
    • pp.32-37
    • /
    • 2016
  • Sidewall angle (SWA) of an absorber stack in extreme ultraviolet lithography mask is considered to be $90^{\circ}$ ideally, however, it is difficult to obtain $90^{\circ}$ SWA because absorber profile is changed by complicated etching process. As the imaging performance of the mask can be varied with this SWA of the absorber stack, more complicated optical proximity correction is required to compensate for the variation of imaging performance. In this study, phase shift mask (PSM) is suggested to reduce the variation of imaging performance due to SWA change by modifying mask material and structure. Variations of imaging performance and lithography process margin depending on SWA were evaluated through aerial image and developed resist simulations to confirm the advantages of PSM over the binary intensity mask (BIM). The results show that the variations of normalized image log slope and critical dimension bias depending on SWA are reduced with PSM compared to BIM. Process margin for exposure dose and focus was also improved with PSM.

Low-Temperature Plasma Enhanced Chemical Vapor Deposition Process for Growth of Graphene on Copper

  • ;장해규;채희엽
    • 한국진공학회:학술대회논문집
    • /
    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
    • /
    • pp.433-433
    • /
    • 2013
  • Graphene, $sp^2$-hybridized 2-Dimension carbon material, has drawn enormous attention due to its desirable performance of excellent properties. Graphene can be applied for many electronic devices such as field-effect transistors (FETs), touch screen, solar cells. Furthermore, indium tin oxide (ITO) is commercially used and sets the standard for transparent electrode. However, ITO has certain limitations, such as increasing cost due to indium scarcity, instability in acid and basic environments, high surface roughness and brittle. Due to those reasons, graphene will be a perfect substitute as a transparent electrode. We report the graphene synthesized by inductive coupled plasma enhanced chemical vapor deposition (ICP-PECVD) process on Cu substrate. The growth was carried out using low temperature at $400^{\circ}C$ rather than typical chemical vapor deposition (CVD) process at $1,000^{\circ}C$ The low-temperature process has advantage of low cost and also low melting point materials will be available to synthesize graphene as substrate, but the drawback is low quality. To improve the quality, the factor affect the quality of graphene was be investigated by changing the plasma power, the flow rate of precursors, the scenario of precursors. Then, graphene film's quality was investigated with Raman spectroscopy and sheet resistance and optical emission spectroscopy.

  • PDF

플립칩 본딩 구조의 표면방출레이저 어레이에 대한 열 해석 (Thermal analysis of a VCSEL array with flip-chip bond design)

  • 김선훈;김태언;김상택;기현철;양명학;김효진;고항주;김회종
    • 한국전기전자재료학회:학술대회논문집
    • /
    • 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
    • /
    • pp.415-416
    • /
    • 2008
  • The finite element model was used to simulate the temperature distribution of a arrayed vertical-cavity surface-emitting laser (VCSEL). In this work, the dimension of AlGaAs/GaAs based VCSEL array was $50{\mu}m$ active diameter and $250{\mu}m$ pitch, and AuSn solder of 80wt%Au-20wt%Sn was included to flip-chip bond. The results of the thermal simulation will be applied to predict the thermal cross-talk in high speed parallel optical interconnects.

  • PDF

사진식각공정과 물방울 형틀을 이용한 PDMS 렌즈 제작 (Fabrication of PDMS Lens Using Photolithography and Water Droplet Mold)

  • 김진영;성중우;조성진;김철홍;임근배
    • 센서학회지
    • /
    • 제22권5호
    • /
    • pp.352-356
    • /
    • 2013
  • We developed a novel fabrication method of polydimethylsioxane (PDMS) lens, which can easily control the shapes of the lens using soft lithography with common photolithography and water droplet molding. A mold for PDMS lens was prepared by patterning of hydrophobic photoresist on the hydrophilic substrate and dispensing small water droplets onto the predefined hydrophilic patterns. The size of patterns determined the dimension of the lens and the dispensed volume of the water droplet decided the radius of curvature of the PDMS lens independently. The water droplet with photoresist pattern played a robustly fixed mold for lens due to difference in wettability. The radius of curvature could be calculated theoretically because the water droplets could approximate spherical cap on the substrate. Finally, concave and convex PDMS lenses which could reduce or magnify optically were fabricated by curing of PDMS on the prepared mold. The measured radii of the fabricated PDMS lenses were well matched with the estimated values. We believe that our simple and efficient fabrication method can be adopted to PDMS microlens and extended to micro optical device, lab on a chip, and sensor technology.