• Title/Summary/Keyword: Optical and electronic properties

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The Carrier Diffusion Modeling of CSP-DH Semiconductor Laser Structures (CSP-DH 구조 반도체 레이저의 캐리어 확산 방정식을 위한 모델링)

  • Lee, S.T.;Jeon, H.S.;Lee, C.Y.;Um, K.Y.;Yoon, J.W.;Yoon, S.B.;Oh, H.S.
    • Proceedings of the KIEE Conference
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    • 1988.07a
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    • pp.469-471
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    • 1988
  • The basic modeling is analyzed on the optoelectronic properties of CSP-DH laser structure using self-consistent calculation of optical field and the electron-hole distribution in the active region. Laser properties is modelled include gain profile, threshold, near field and far field pattern. This new characterization is allowed for consideration such as carrier spatial hole burning due to strong optical fields which stimulate recombination.

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The Study on Optical Properties by Adding $La_2O_3$ in Multicomponent Glass Fiber (다성분계 Glass Fiber의 $La_2O_3$ 첨가에 따른 광학적 특성에 관한 연구)

  • 김용호;강원호
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1994.11a
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    • pp.21-23
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    • 1994
  • By adding La₂O₃ to optical multicomponent glass composition, after making mother glass and core fiber that enable to enlarge the infrared transmittance region, then surveyed the optical properties. Through thermal analysis of the glass abstained by melt-quenching after selecting stable basic composition on devitrification and replace SiO₂ by 4-12wt% La₂O₃. As La₂O₃ increases up to l2wt% transition temperature, refractive index, density, deformation temperature increased, whereas thermal expansion coefficient decreased. As a result of inspectig transmittance in UV/VIS/IR region, visable region indicated the decrease of transmittance by increasing the La₂O₃ and transmittance region was enlarged by increasing the La₂O₃ in IR region. Also, fabricate core fiber at 820℃ and severy the optical loss we could fact that La₂O₃ composition added 12wt% showed the minimum optical loss.

Effects of ZrO2 Addition on Optical and Electrical Properties of MgO Films as a Protective Layer for AC PDPs (ZrO2 첨가에 따른 AC PDP 보호막용 MgO 박막의 광학적 전기적 특성)

  • Kim, Chang-Il;Jung, Young-Hun;Lee, Young-Jin;Paik, Jong-Hoo;Choi, Eun-Ha;Jung, Seok;Kim, Jeong-Seok
    • Korean Journal of Materials Research
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    • v.18 no.8
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    • pp.422-426
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    • 2008
  • The effects of an addition of $ZrO_2$ on the microstructure and electrical properties of MgO films as a protective layer for AC plasma display panels were investigated. MgO + a 200 ppm $ZrO_2$ protective layer prepared by e-beam evaporation exhibited a secondary electron emission coefficient ($\gamma$) that was improved by 21% compared to that of a pure MgO protective layer. The relative density and Vickers hardness increased with a further addition of $ZrO_2$. These results suggest that the discharge properties and optical properties of MgO protective layers are closely related to the relative density and Vickers hardness. The good optical and electrical properties of $\gamma$, at 0.080, a grain size of $19\;{\mu}m$ and an optical transmittance of 91.93 % were obtained for the MgO + 200 ppm $ZrO_2$ protective layer sintered at $1700^{\circ}C$ for 5 hrs.

Characteristics of ITO Films Grown on an Oxygen Plasma Treated Glass Substrate (유리기판에 O2 플라즈마 표면처리 후 제작된 ITO 박막의 특성)

  • Chae, Hong-Chol;Hong, Joo-Wha
    • Korean Journal of Metals and Materials
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    • v.50 no.7
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    • pp.545-548
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    • 2012
  • The optical and electronic properties of Indium Tin Oxide (ITO) thin films deposited on a RF-plasma treated glass substrate were investigated by X-Ray Photoelectron Spectroscopy (XPS), Ultra-violet Photoelectron Spectroscopy (UPS), Reflected Electron Energy Loss Spectroscopy (REELS). The modification of glass substrates was carried out by varying the time of the plasma surface treatment in an oxygen atmosphere. The focus of this research was to examine how the optical and electronic properties of ITO thin films change with the plasma treatment time. The surface energy increased since the carbon bonds were removed from the surface after the glass substrate received the surface treatment. The ITO thin films produced on the glass substrate with surface treatment showed that the high optical transmittance was approximately 85%. The measured band gap energy was as high as 3.23 eV when the plasma treatment time was 60 s and the work function after the treatment was increased by 0.5 eV in comparison to that before the treatment of 60 s. The ITO thin film exhibited an excellent sheet resistance of $2.79{\Omega}/{\Box}$. We found that the optical and electronic properties of ITO thin films can be improved by RF-plasma surface treatment.

Optical characteristics on driving method of ballast and shapes of Arc-Tube in the ceramic metal halide lamp (세라믹 메탈 할라이드 램프의 아크 튜브의 구조와 안정기 구동방법에 따른 광학적 특성)

  • Jang, Hyeok-Jin;Kim, Nam-Goon;Lee, Joo-Ho;Yang, Jong-Kyung;Park, Dae-Hee
    • Proceedings of the KIEE Conference
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    • 2008.07a
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    • pp.1495-1496
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    • 2008
  • The Ceramic Metal Halide lamp is different from optical characteristic on shapes of arc-tube and driving method of ballast. In this paper, we measured optical characteristics of the Ceramic Metal Halide lamp that uses arc tubes which are spherical and cylindrical shapes, and analyzed the Ceramic Metal Halide lamp connecting ballast that is electronic and magnetic types through the lamp measurement system that is given for stabilization period of fifteen minutes. In result, the arc-tube of spherical shape is more improvement in the optical properties than the arc tube of cylindrical shape, moreover, the electronic ballast is more efficient than the optical properties of the magnetic ballast.

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Properties of Ti:$LiNbO_3$ Optical Waveguide by Diffusion in Air Atmosphere and Proposal of a Polishing Method (Air 분위기로 제작한 Ti:$LiNbO_3$ 도파로 특성 및 폴리싱 방법제안)

  • 김성구;윤형도;윤대원;한상필;박계춘;유용택
    • Electrical & Electronic Materials
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    • v.10 no.7
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    • pp.682-691
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    • 1997
  • We have investigated the guided optical properties of a Ti:LiNbO$_3$optical waveguide which was fabricated by Ti-diffusion in an air atmosphere and proposed an effective polishing method of waveguide endfaces. And the results of guided optical mode and fabrication condition were obtained as follows; \circled1 propagation loss : 0.53 dB/cm \circled2 mode size : horizontal/vertical=12.5${\mu}{\textrm}{m}$ \circled3 mode mismatch : 1.7 dB \circled4 diffusion temperature : 105$0^{\circ}C$, time : 8 hours \circled5 atmosphere : air

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Effects of oxygen and hydrogen additives on electrical, optical, and structural properties of ZnO films (수소 및 산소 첨가에 따른 산화아연막의 전기적, 광학적, 구조적 물성)

  • Bang, Jung-Hwan;Kim, Won;Uhm, Hyun-Seok;Park, Jin-Seok
    • Proceedings of the KIEE Conference
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    • 2009.07a
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    • pp.1246_1247
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    • 2009
  • Effects of hydrogen and oxygen additives on structural, optical, and electrical properties of ZnO films were extensively examined. ZnO films were deposited using RF sputtering by varying the gas mixing ratio of $H_2$ and $O_2$. Optical transmittances at visible region, electrical resistivities, and micro-structures of ZnO films were characterized in terms of the kind and amount of additive gases. It was observed that the material properties of ZnO films required for their use in transparent thin film transistors, such as approximately $10^3{\Omega}cm$ in resistivity and higher than 85% in transmittance, can be achieved by controlling the gas mixing ratio of $O_2/H_2$ (sccm) in the range of 2/2~2/8.

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Electrical and Optical Properties of ITO Thin Film by CMP Process Parameter (CMP 공정이 ITO 박막의 전기적.광학적 특성에 미치는 영향)

  • Choi, Gwon-Woo;Seo, Yong-Jin;Lee, Woo-Sun
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.11a
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    • pp.354-355
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    • 2005
  • Indium tin oxide (ITO) thin film was polished by chemical mechanical polishing (CMP) by the change of process parameters for the improvement of electrical and optical properties of ITO thin film. Light transparent efficiency of ITO thin film was improved after CMP process at the optimized process parameters compared to that before CMP process.

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Properties of ITO thin films deposited by RF magnetron sputtering with process pressure (RF 마그네트론 스퍼터링법으로 제작된 ITO 박막의 공정압력 변화에 따른 특성)

  • Jeong, Seong-Jin;Kim, Deok-Kyu;Kim, Hong-Bae
    • Journal of the Semiconductor & Display Technology
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    • v.9 no.4
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    • pp.83-86
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    • 2010
  • The transparent electrode properties of ITO films deposited by RF magnetron sputtering with process pressure were investigated. The ITO thin films was deposited on a glass substrate using a target with 3in diameter sintered at a ratio of $In_2O_3$ : $SnO_2$ (9 : 1). 200-nm-thick ITO thin films were manufactured by various process pressures ($2.0{\times}10^{-2}$, $7.0{\times}10^{-3}$ and $2.0{\times}10^{-3}$ Torr). The optical transmittance and resistivity of the deposited ITO thin films showed a relatively satisfactory result under $10^{-2}$ Torr. For high process pressure, the optical transmittance was below 80%, while for low process pressure, the optical transmittance was above 85%. As a result of of mobility, resistivity and carrier concentration by Hall measurement, we obtained satisfactory properties to apply into a transparent conducting thin film.