• Title/Summary/Keyword: Optical MEMS

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Characteristics of Tunable Filter Using the Thermo-optic Effect (열광학 효과를 이용한 파장 가변 필터의 특성)

  • 박헌용;황병철;이승걸;오범환;이일항;박세근;최두선
    • Proceedings of the Optical Society of Korea Conference
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    • 2003.07a
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    • pp.114-115
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    • 2003
  • 최근 급속히 성장하고 있는 Wavelength-division-multiplexing (WDM) 시스템에 파장가변 필터는 핵심적인 소자로 적용될 수 있으며, 높은 가격 경쟁력과 광학 필터로서 좋은 특성과 높은 가변 특성을 구현할 수 있다. 이러한 파장가변 필터는 multi-beam 간섭을 이용하고, Micro electro mechanical systems (MEMS) 공정 기술인 벌크 마이크로 머시닝 기술을 이용하여 구현되어지고 있다. 또한 파장 가변 필터는 Optical-performance monitoring, Spectrometer, Optical noise filter, Sensor 등 여러 분야에 응용될 수 있다. (중략)

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Fabrication of Large Area Si Mirror for Integrated Optical Pickup by using Magnetorheological Finishing (MRF 공정을 이용한 집적형 광 픽업용 대면적 실리콘 미러 제작)

  • Park S.J.;Lee S.J.;Choi S.M.;Min B.K.;Lee S.J.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2005.06a
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    • pp.1522-1526
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    • 2005
  • In this study, the fabrication of large area silicon mirror is accomplished by anisotropic etching using MEMS for implementation of integrated optical pickup and the process condition is also established for improving the mirror surface roughness. Until now, few results have been reported about the production of highly stepped $9.74^{\circ}$ off-axis-cut silicon wafer using wet etching. In addition rough surface of the mirror is achieved in case of long etching time. Hence a novel method called magnetorheolocal finishing is introduced to enhancing the surface quality of the mirror plane. Finally, areal peak to valley surface roughness of mirror plane is reduced about 100nm in large area of $mm^2$ and it is applicable to optical pickup using infrared wavelength.

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The Parameter Identification for Localization Scheme of the Optics-Based Micro Sensor Node (광신호 기반의 마이크로 센서 노드 위치 인식 시스템을 위한 파라미터 식별)

  • Jeon, Ji-Hun;Lee, Min-Su;Park, Chan-Gook
    • Journal of Institute of Control, Robotics and Systems
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    • v.19 no.2
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    • pp.81-86
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    • 2013
  • In this paper, the parameter identification for localization scheme for the optics-based micro sensor node is conducted. We analyzed short measurement range problem which can be occurred in optical based micro sensor node localization method using a time of flight. And we set up the theory for distance and maximum reflected laser power to overcome the problem by identifying hardware parameters like laser power, effective area of MEMS CCR, sensitivity of photodetector, and so on. Experimental results of measurement of maximum reflected laser power were compared with results of the theory. By using the theory, we can identify hardware parameters of localization scheme to measure particular position of the optics-based micro sensor node.

Fabrication and Characterization of Electrostatically Actuated Microcantilever Mass Sensors (정전기력으로 구동되는 마이크로 캔틸레버 질량 센서의 제작과 특성)

  • Lee, Jung-Chul;Choi, Bum-Kyoo
    • Journal of Sensor Science and Technology
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    • v.20 no.1
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    • pp.40-45
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    • 2011
  • Microcantilevers have been actively used in probe-based microscopy and gravimetric sensing for biological or chemical analytes. To integrate actuation or detection schemes in the structure, typical fabrication processes include several photolithographic steps along with conventional MEMS fabrication. In this paper, a simple and straightforward way to fabricate and operate silicon microcantilever mass sensors is presented. The fabricated microcantilever sensors which can be electrostatically actuated require only two photolithographic steps. Resonant characteristics of fabricated microcantilevers are measured with a custom optical-lever and results show size-dependent quality factors. Using a $40\;{\mu}m$ long, $7\;{\mu}m$ wide, and $3\;{\mu}m$ thick cantilever, we achieved subfemtogram mass resolution in a 1 Hz bandwidth.

Effects of Form Errors of a Micromirror Surface on the Optical System of the TMATM(Thin-film Micromirror ArrayTM) Projector

  • Jo, Yong-Shik;Kim, Byoung-Chang;Kim, Seung-Woo;Hwang, Kyu-Ho
    • International Journal of Precision Engineering and Manufacturing
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    • v.1 no.1
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    • pp.98-105
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    • 2000
  • The projectors using liquid crystal display(LCD) have faults such as low optical efficiency, low brightness and even heat generation. To solve these problems reflective-type spatial light modulators based on MEMS (Microelectromechanical Systems) technology have emerged. Digital Micromirror DeviceTM(DMDTM), which was already developed by Texas Instruments Inc., and Thin-film Micromirror ArrayTM(TMATM), which has been recently developed by Daewoo Electronics Co., are the representative examples. The display using TMATM has particularly much higher optical efficiency than other projectors. But the micromirrors manufactured by semiconductor processes have inevitable distortion because of the limitations of the manufacturing processes, so that the distortions of their surfaces have great influence on the optical efficiency of the projector. This study investigated the effects of mirror flatness on the optical performance, including the optical efficiency, of the TMATM projector. That is to say, as a part of the efforts to enhance the performance of the TMATM projector, how much influence the form errors of a micromirror surface exert on the optical efficiency and the modulation of gray scale of the projector were analyzed through a pertinent modeling and simulations.

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Micro-Mirror Actuator for Optical Disk Drives (광 저장장치용 마이크로 미러 엑츄에이터)

  • 김종완;서화일;이우영;임경화;김영철
    • Proceedings of the International Microelectronics And Packaging Society Conference
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    • 2001.11a
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    • pp.222-225
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    • 2001
  • Optical disk drives read information by replacing a laser beam on the disk track. As information has become larger, the more accurate position control of a laser beam is necessary. In this paper, we report the analysis and fabrication of the micro mirror for optical disk drivers. The mirror was fabricated by using MEMS technology and it's characteristics investigated. Also, electrode structure for reducing squeeze effect was discussed.

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The End of Optical Lithography\ulcorner (광 리소그래피의 최후\ulcorner)

  • 오혜근
    • Proceedings of the Optical Society of Korea Conference
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    • 2003.02a
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    • pp.276-277
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    • 2003
  • 전체 반도체 소자 제조 공정의 40 %를 차지하고 있는 리소그래피 기술은 기억 소자뿐만 아니라 마이크로 프로세서, ASIC 등의 실리콘 소자와 군사 및 통신에 많이 사용되고 있는 화합물 반도체를 만드는 데도 쓰이고 있고, 요즈음은 DRAM 의 리소그래피 기술들을 LCD 등의 평판 표시 장치, 디스크 헤드, 프린터 헤드 및 MEMS(Micro-Electro-Mechanical System), 나노 바이오 칩 등의 제작에 응용하여 쓰고 있다. 리소그래피 기술은 생산 원가 면에서 제일 큰 비중을 차지하고 있을 뿐만 아니라 집적소자의 초고집적화 및 초미세화를 선도하는 기술이다. (중략)

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MEMS/Nano-technologies for Smart Air Environmental Monitoring Sensors

  • Park, Inkyu;Yang, Daejong;Kang, Kyungnam
    • Journal of Sensor Science and Technology
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    • v.24 no.5
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    • pp.281-286
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    • 2015
  • The importance of air quality monitoring is rapidly increasing. Even though state-of-the-art air quality monitoring technologies such as mass spectrometry, gas chromatography, and optical measurement enable high-fidelity measurement of air pollutants, they cannot be widely used for portable or personalized platforms because of their high cost and complexity. Recently, personalized and localized environmental monitoring, rather than global and averaged environmental monitoring, has drawn greater attention with the advancement of mobile telecommunication technologies. Here, micro- and nano-technologies enable highly integrated and ultra-compact sensors to meet the needs of personalized environmental monitoring. In this paper, several examples of MEMS-based gas sensors for compact and personalized air quality monitoring are explained. Additionally, the principles and usage of functional nanomaterials are discussed for highly sensitive and selective gas sensors.

Mechanical Property Measurement in Nano Imprint Process (나노 임프린트 공정에서의 기계적 물성 측정)

  • 김재현;이학주;최병익;강재윤;오충석
    • Journal of the Korean Society for Precision Engineering
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    • v.21 no.6
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    • pp.7-14
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    • 2004
  • 나노 임프린트 기술은 기존의 광학적 리소그라피 (optical lithography) 기술보다 저렴한 비용으로 나노 구조물을 대량으로 제조할 수 있을 것으로 기대되고 있는 기술이다. 현재까지 반도체 공정기술의 주류를 이루고 있는 광학적인 리소그라피 기술은, 100nm이상의 CD(Critical Dimension)를 가지는 구조물들을 정밀하게 제조하여, 미소전자공학 (microelectronics) 소자, MEMS/MEMS, 광학소자 등의 제품들을 대량으로 생산하는 데에 널리 활용되고 있다. 반도체 소자의 고집적화 경향에 따라 100 nm 이하의 CD를 가지는 나노 구조물들을 제조할 필요성이 높아지고 있지만, 광학적인 방법으로는 광원의 파장보다 작은 구조물들을 제조하기가 어렵다. 보다 짧은 파장을 가지는 광원을 이용하는 리소그라피 장비가 계속적으로 개발되고 있으나, 그에 따른 장비 비용 및 제조 단가가 기하급수적으로 증가하고 있다.(중략)