Journal of the Korean Society for Precision Engineering (한국정밀공학회지)

Korean Society for Precision Engineering (한국정밀공학회)
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Mechanical Property Measurement in Nano Imprint Process

나노 임프린트 공정에서의 기계적 물성 측정

  • 김재현 (한국기계연구원 구조연구부 마이크로응용역학그룹) ;
  • 이학주 (한국기계연구원 구조연구부 마이크로응용역학그) ;
  • 최병익 (한국기계연구원 구조연구부 마이크로응용역학그) ;
  • 강재윤 (한국기계연구원 구조연구부 마이크로응용역학그) ;
  • 오충석 (금오공과대학 기계공학부)
  • Published : 2004.06.01
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Abstract

나노 임프린트 기술은 기존의 광학적 리소그라피 (optical lithography) 기술보다 저렴한 비용으로 나노 구조물을 대량으로 제조할 수 있을 것으로 기대되고 있는 기술이다. 현재까지 반도체 공정기술의 주류를 이루고 있는 광학적인 리소그라피 기술은, 100nm이상의 CD(Critical Dimension)를 가지는 구조물들을 정밀하게 제조하여, 미소전자공학 (microelectronics) 소자, MEMS/MEMS, 광학소자 등의 제품들을 대량으로 생산하는 데에 널리 활용되고 있다. 반도체 소자의 고집적화 경향에 따라 100 nm 이하의 CD를 가지는 나노 구조물들을 제조할 필요성이 높아지고 있지만, 광학적인 방법으로는 광원의 파장보다 작은 구조물들을 제조하기가 어렵다. 보다 짧은 파장을 가지는 광원을 이용하는 리소그라피 장비가 계속적으로 개발되고 있으나, 그에 따른 장비 비용 및 제조 단가가 기하급수적으로 증가하고 있다.(중략)

Keywords

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