• 제목/요약/키워드: Ohmic

검색결과 614건 처리시간 0.024초

금속에 따른 p-GaAsSb 오믹접촉의 전기적 특성에 관한 비교 연구 (Comparative studies of ohmic metallization on p-GaAsSb)

  • 조승우;장재형
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 추계학술대회 논문집 Vol.17
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    • pp.33-36
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    • 2004
  • 탄소 도핑$(5{\times}10^{19}\;cm^{-3})$된 p-type GaAsSb 에피층 위에, Ti/Pt/Au, Pd/Au, Pd/Ir/Au를 이용한 다층 오믹 접촉을 제작하였다. MOCVD(metal-organic chemical vapor deposition)를 이용하여 성장시킨 이 p-GaAsSb의 정공 이동도는 탄소의 도핑 농도가 매우 높음에도 불구하고, $50\;cm^2/Vs$로 측정되었다. 오믹 접촉의 전기적 특성을 측정하기 위하여 TLM(Transfer length method)를 이용하였다. Pd/Ir/Au을 이용한 오믹접촉의 specific contact resistivity는 $10^{-8}\;ohm-cm^2$ 보다 작은 수치를, transfer length는 100 nm보다 작은 수치를 보였으며, Ti/Pt/Au을 이용한 ohmic contact의 specific contact resistivity는 $10^{-7|\;ohm-cm^2$ 보다 작은 수치를, transfer length는 400 nm보다 작은 수치를 나타내었다.

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InP/AnGaAs HPT's 제작을 위한 $ITO/n^+$-InP Ohmic contact 특성 연구 (Formation of ITO ohmic contact to $n^{+}$-InP for InP/lnGaAs HPT's fabrication)

  • 황용한;한교용
    • 대한전자공학회:학술대회논문집
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    • 대한전자공학회 2001년도 하계종합학술대회 논문집(2)
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    • pp.213-216
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    • 2001
  • The use of a thin film of indium between the ITO and the $n^{+}$-InP contact layers for InP/InGaAs HPTs was studied without degrading its excellent optical transmittance properties. ITO/$n^{+}$-InP ohmic contact was successfully achieved by the deposition of Indium and thermal annealing. The specific contact resistance of about 6.6$\times$$10^{-4}$$\Omega\textrm{cm}^2$ was measured by use of the transmission line method (TLM). However, as the thermal annealing was just performed to ITO/$n^{+}$-InP contact without the deposition of Indium between ITO and $n^{+}$-InP, it exhibited schottky characteristics. In the applications, the DC characteristics of InP/InGaAs HPTs with ITO emitter contacts was compared with that of InP/InGaAs HBTs with the opaque emitter contacts.

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Effect of Frequency Intensity on the Ohmic Thawing Process in Frozen Gelatin Matrix

  • Kim, Jee-Yeon;Park, Seong-Hee;Hong, Geun-Pyo;Min, Sang-Gi
    • 한국축산식품학회:학술대회논문집
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    • 한국축산식품학회 2005년도 정기총회 및 제35차 춘계 학술 발표대회
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    • pp.363-366
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    • 2005
  • This study was designed to investigate effects of AC frequency on the thawing process, using laboratory scale ohmic thawing system. The ohmic thawing property of 30% gelatin matrix was examined by using low frequency alternating current (20 Hz-110 Hz, sine wave). When the voltage was fixed to 50V, thawing time was negligible influenced as the frequency decreased. Total thawing time of the gelatin matrix decreased sharply at the frequency of 50 Hz. The current flow was first observed during the thawing process in the temperature ranges of $-\;5^{\circ}\;C{\sim}\;-\;3^{\circ}\;C$.

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SiOC 절연박막 특성에 의존하는 ITO 투명박막의 전기적인 특성과 오믹접합의 효과 (Ohmic Contact Effect and Electrical Characteristics of ITO Thin Film Depending on SiOC Insulator)

  • 오데레사
    • 한국재료학회지
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    • 제25권7호
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    • pp.352-357
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    • 2015
  • To research the characteristics of ITO film depending on a polarity of SiOC, specimens of ITO/SiOC/glass with metal-insulator-substrates (MIS) were prepared using a sputtering system. SiOC film with 17 sccm of oxygen flow rate became a non-polarity with low surface energy. The PL spectra of the ITO films deposited with various argon flow rates on SiOC film as non-polarity were found to lead to similar formations. However, the PL spectra of ITO deposited with various argon flow rates on SiOC with polarity were seen to have various features owing to the chemical reaction between ITO and the polar sites of SiOC. Most ITO/SiOC films non-linearly showed the Schottky contacts and current increased. But the ITO/SiOC film with a low current demonstrated an Ohmic contact.

쇼키컨텍에 의한 박막형 트랜지스터의 전기적 특성 (Electrical Characteristics of Thin Film Transistor According to the Schottky Contacts)

  • 오데레사
    • 한국재료학회지
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    • 제24권3호
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    • pp.135-139
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    • 2014
  • To obtain the transistor with ambipolar transfer characteristics, IGZO/SiOC thin film transistor was prepared on SiOC with various polarities as a gate insulator. The interface between a channel and insulator showed the Ohmic and Schottky contacts in the bias field of -5V ~ +5V. These contact characteristics depended on the polarities of SiOC gate insulators. The transfer characteristics of TFTs were observed the Ohmic contact on SiOC with polarity, but Schottky contact on SiOC with low polarity. The IGZO/SiOC thin film transistor with a Schottky contact in a short range bias electric field exhibited ambipolar transfer characteristics, but that with Ohmic contact in a short range electric field showed unipolar characteristics by the trapping phenomenon due to the trapped ionized defect formation.

Non Darcy Mixed Convection Flow of Magnetic Fluid over a Permeable Stretching Sheet with Ohmic Dissipation

  • Zeeshan, A.;Majeed, A.
    • Journal of Magnetics
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    • 제21권1호
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    • pp.153-158
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    • 2016
  • This paper aims to discuss the Non Darcy boundary layer flow of non-conducting viscous fluid with magnetic ferroparticles over a permeable linearly stretching surface with ohmic dissipation and mixed convective heat transfer. A magnetic dipole is applied "a" distance below the surface of stretching sheet. The governing equations are modeled. Similarity transformation is used to convert the system of partial differential equations to a system of non-linear but ordinary differential equations. The ODEs are solved numerically. The effects of sundry parameters on the flow properties like velocity, pressure, skin-friction coefficient and Nusselt number are presented. It is deduced the frictional resistance of Lorentz force decreases with stronger electric field and the trend reverses for temperature. Skin friction coefficient increase with increase in ferromagnetic interaction parameter. Whereas, Nusselt number decrease.

도체 손실을 고려한 매우 짧은 쌍극자 안테나의 특성 해석 (Analysis of electrically-short dipole in consideration of conductor loss)

  • 김영국;이해영
    • 전자공학회논문지A
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    • 제32A권7호
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    • pp.16-22
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    • 1995
  • Electrically-short wire antennas, widely used for mobile communications and EMI measurements, have low rediation efficiency and gain due to the ohmic loss predominant over the radiation power. A very short dipole antenna for wideband EMI measurements has been analyzed using the Method of Moments with the incorporatio of the ohmic loss calculated by the Phenomenological Loss Equivalennce Method(PEM). The calculated results show the rediation gain and efficiency very with the ohmic loss in a wide range of frequencies. Thses results can be effectively used for optimum design of very small antennas and probes for mobile communications and non-disturbing EMI measurements.

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반도체-반도체 사이의 거리 변화에 따른 전압-전류 특성 연구 (A Study on V-I characteristics depend on a distance between semiconductor-semiconductor)

  • 김혜정;김정호;천민우;박용필
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 제6회 학술대회 논문집 일렉트렛트 및 응용기술연구회
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    • pp.52-56
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    • 2004
  • The movement of electron in the semiconductor-gap-semiconductor was observed by the variation of V-I characteristic as a distance two ZnO(1010) single crystals. When the resistance between two crystals was $10^2{\sim}10^4{\Omega}$, V-I characteristics had the pattern of the field emission or ohmic contact. On the other hand, when the resistance was larger than $10^7{\Omega}$ by increasing the distance between two crystals, the effect of surface barrier was prominent. This result leads to the conclusion that both the field emission (or ohmic contact) and the surface barrier effect including the tunneling have the influence on V-I characteristics of mechanically contacted crystals.

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다결정 3C-SiC/TiW Ohmic Contact에 관한 연구 (Study for ohmic contact of polycrystalline 3C-SiC/TiW)

  • 온창민;정귀상
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2006년도 제37회 하계학술대회 논문집 C
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    • pp.1311-1312
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    • 2006
  • This paper describes the ohmic contact formation between a TiW film as a contact material deposied by RF magnetron sputter and polycrystalline 3C-SiC films deposied on thermally grown Si wafers. The specific contact resistance (${\rho}_c$) of the TiW contact was measured by using 4he C-TLM. The contact phase and interfacial reaction between TiW and 3C-SiC at high-temperature were also analyzed by XRD and SEM. All of the samples didn't show cracks of the TiW film and any interfacial reaction after annealing. Especially, when the sample was annealed at $800^{\circ}$ for 30min., the lowest contact resistivity of $2.90{\times}10^{-5}{\Omega}{\cdot}cm^2$ of was obtained due to the improved interfacial adhesion.

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다결정 NiO박막의 전극물질이 resistance switching 현상에 미치는 영향

  • 노영수;김영은;박동희;김태환;최원국
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2009년도 제38회 동계학술대회 초록집
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    • pp.224-224
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    • 2010
  • Pt와 ITO 상부전극의 top-electode/NiO/Pt 구조에서 resistance switching현상을 연구하였다. 하부전극물질이 resistance switching현상에 미치는 영향은 이미 연구되었다. Ohmic 이나 low Schottky contact은 NiO 박막의 resistance switching 현상은 높은 전기장의 인가에 의해 것이 나타나는 것은 알 수 있었다. Ohmic contact에서는 유도전기장에 의한 resistance switching 현상들을 관찰할 수 있다. low Schottky barrier를 가지는 ITO/NiO/Pt 구조에서 resistances switching현상은 관찰되지 않고 Pt/ITO구조로 Ohmic 접촉은 유도전기장에 의한 resistance switching 현상이 나타나지 않음을 알 수 있었다.

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