• 한국신재생에너지학회:학술대회논문집
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• 한국신재생에너지학회 2007년도 춘계학술대회
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• pp.309-312
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• 2007

Sputter deposition followed by surface treatment was studied using reactive RF plasma as a method for preparing titanium oxide($TiO_{2}$) films on indium tin oxide(ITO) coated glass substrate for dye-sensitized solar cells(DSSCs). Anatase structure $TiO_{2}$ films deposited by reactive RF magnetron sputtering under the conditions of $Ar/O_{2}$(5%) mixtures, RF power of 600W and substrate temperature of $400^{\circ}C$ were surface-treated by inductive coupled plasma(ICP) with $Ar/O_{2}$ mixtures at substrate temperature of $400^{\circ}C$, and thus the films were applied to the DSSCs, The $TiO_{2}$ Films made on these exhibited the BET specific surface area of 95, the pore volume of $0.3cm^{2}$ and the TEM particle size of ${\sim}25$ nm. The DSSCs made of this $TiO_{2}$ material exhibited an energy conversion efficiency of about 2.25% at $100mW/cm^{2}$ light intensity.

• 대한전자공학회논문지SD
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• 제44권11호
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• pp.15-19
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• 2007

OTFTs (Organic Thin Film Transistors)의 구동에 있어, 게이트 절연막 표면과 채널의 계면상태가 소자의 전기적 특성에 큰 영향을 미치게 된다. OTS(Octadecyltrichlorosilane)등과 같은 습식 SAM(Self Assembly Monolayer)를 이용하거나, $O_2$ Plasma와 같은 건식 표면 처리등 여러 표면 처리법에 대한 연구가 진행되고 있다. 본 논문에서는 pentacene을 진공 증착하기 전에 게이트 절연막을 $O_2$ plasma와 Ar ion beam을 이용하여 건식법으로 전처리 한 후 표면 특성을 atomic force microscope (AFM) and X-ray photoelectron spectroscopy (XPS)를 사용하여 비교 분석하였고, 각 조건으로 OTFT를 제작하여 전기적 특성을 확인하였다. Ar ion beam으로 표면처리 했을 때, $O_2$ plasma처리했을 때 보다 향상된 on/off ratio 전기적 특성을 얻을 수 있었다. 표면 세정을 위하여 $O_2$ plasma 처리시 $SiO_2$ 표면의 OH-기와 반응하여 oxide trap density가 높아지게 되고 이로 인하여 off current가 증가하는 문제가 발생한다. 불활성 가스인 Ar ion beam 처리를 할 경우 게이트 절연막의 세정 효과는 유지하면서, $O_2$ Plasma 처리했을 때 증가하게 되는 계면 trap을 억제할 수 있게 되어, mobility 특성은 동등 수준으로 유지하면서 off current를 현저하게 줄일 수 있게 되어, 결과적으로 높은 on/off ratio를 구현할 수 있다는 것을 확인하였다.

• 센서학회지
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• 제31권4호
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• pp.214-217
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• 2022

The effect of inductively coupled plasma (ICP) treatment with O₂ gas on the surface properties of poly(ether sulfone) (PES) was investigated. X-ray photoelectron spectroscopy (XPS) was used to analyze the chemical characteristics of the O₂ plasma-treated PES films. The surface roughness of the pristine and O₂ plasma-treated PES films for different RF powers of the ICP was determined using an atomic force microscope (AFM). The contact angles of the PES films were also measured, using which the surface free energies were calculated. The O1s XPS spectra of the PES films revealed that the number of polar functional groups increased following the O₂ plasma treatment. The AFM analysis showed the average surface roughness increased from 1.01 to 4.48 nm as the RF power of the ICP was increased. The contact angle measurements revealed that the PES films became more hydrophilic as the RF power of the ICP was increased. The total surface energy increased with the RF power of the ICP, resulting from the increased polar energy component.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.491-491
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• 2013

A novel plasma system has been developed for 3-dimensional modification of the carbon nano-powders. Improvement of dispersion of these nano materials are studied by plasma discharge, not using chemical modification. The plasma process is considered to great advantages over wet chemical process due to environmental, economic viewpoint, and uniformity over the treated volume. The uniform dispersion is a critical factor for these material's nano composite applications. Using this plasma system, graphene, carbon black, and CNT was treated and functionalized. Several key discharge conditions such as Ar/H2/O2 or Ar/H2/NH3 gas ratio, treatment time, power, feeder's vibration frequency are investigated. Hydrophobic of graphene has turned some more into hydrophilic by reaction test with water, electrophoresis, surface contact angle test, and turbidity analysis. The oxygen content ratio in the plasma treated CNT has increased about 3.7 times than the untreatedone. In the case of graphene and carbon black, the oxygen- and nitrogen- content has been enhanced average 10%. O-H (N-H) peak, C-O (C-N) peak, and C=O (C=N) peak data have been detected by FTIR measurement and intensified compared to before-plasma treatment due to O2 or NH3 content.

• 한국항해항만학회:학술대회논문집
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• 한국항해항만학회 2000년도 추계학술대회논문집
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• pp.116-119
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• 2000

The advantage of plasma-sprayed coating is their good resistance against thermal shock due to the porous state of the coated layer with a consequently low Youngs modulus. However, the existence of many pores with a bimodal distribution and a laminar structure in the coating reduces coating strength and oxidation protection of the base metals. In order to counteract these problems, there have been many efforts to obtain dense coatings by spraying under low pressure or vacuum and by controlling particle size and morphology of the spraying materials. The aim of the present study is to survey the effects of the HIP treatment between 1100 and 130$0^{\circ}C$ on plasma-sprayed oxide coating of A1$_2$O$_3$, A1$_2$O$_3$-SiO$_2$on the metal substrate (type C18N10T stainless steel). These effects were characterized by phase identification, Vickers hardness measurement, and tensile test before and after HIPing. These results show that high-pressure treatment has an advantage for improving adhesive strength and Vickers hardness of plasma-sprayed coatings.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2000년도 추계학술대회 논문집
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• pp.116-119
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• 2000

The advantage of plasma-sprayed coating is their good resistance against thermal shock due to the porous state of the coated layer with a consequently low Youngs modules. However, the existence of many pores with a bimodal distribution and a laminar structure in the coating reduces coating strength and oxidation protection of the base metals. In order to counteract these problems, there have been many efforts to obtain dense coatings by spraying under low pressure or vacuum and by controlling particle size and morphology of the spraying materials. The aim of the present study is to survey the effects of the HIP treatment between 1100 and 130$0^{\circ}C$ on plasma-sprayed oxide coating of A1$_2$O$_3$, A1$_2$O$_3$-SiO$_2$ on the metal substrate (type C18N10T stainless steel). These effects were characterized by phase identification, Vickers hardness measurement, and tensile test before and after HIPing, These results show that high-pressure treatment has an advantage for improving adhesive strength and Vickers hardness of plasma- sprayed coatings.

• Bulletin of the Korean Chemical Society
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• 제34권11호
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• pp.3367-3371
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• 2013

MgO nanorods were fabricated by the thermal evaporation of $Mg_3N_2$. The influence of ZnO sheathing and hydrogen plasma exposure on the photoluminescence (PL) of the MgO nanorods was studied. PL measurements of the ZnO-sheathed MgO nanorods showed two main emission bands: the near band edge emission band centered at ~380 nm and the deep level emission band centered at ~590 nm both of which are characteristic of ZnO. The near band edge emission from the ZnO-sheathed MgO nanorods was enhanced with increasing the ZnO shell layer thickness. The near band edge emission from the ZnO-sheathed MgO nanorods appeared to be enhanced further by hydrogen plasma irradiation. The underlying mechanisms for the enhancement of the NBE emission from the MgO nanorods by ZnO sheathing and hydrogen plasma exposure are discussed.

• 한국전기전자재료학회논문지
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• 제18권5호
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• pp.450-456
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• 2005

In this paper, the effect of adhesion properties of semiconductive-insulating interface layer of silicone rubber on electrical properties was investigated. The modifications produced on the silicone surface by oxygen plasma were accessed using ATR-FTIR, contact angle and Surface Roughness Tester. Adhesion was obtained from T-peel tests of semiconductive layer haying different treatment durations. In addition, ac breakdown test was carried out for elucidating the change of electrical property with duration of plasma treatment. From the results, the treatment in the oxygen plasma produced a noticeable increase in surface energy, which can be mainly ascribed to the creation of O-H and C=O. It is observed that adhesion performance was determined by surface energy and roughness level of silicone surface. It is found that at dielectric strength was increased with improving the adhesion between the semiconductive and insulating interface.

• 한국식품위생안전성학회지
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• 제32권1호
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• pp.64-69
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• 2017

본 연구에서는 양상추에 접종된 E. coli O157:H7, S. Typhimurium과 L. monocytogene에 대하여 저온 플라즈마와 UV-C 단독처리 및 병행처리 효과를 측정하였다. E. coli O157:H7, S. Typhimurium, L. monocytogenes는 양상추에 초기 농도가 5.82, 5.09, 5.65 log CFU/g이 되도록 각각 접종하였다. 저온 플라즈마와 UV-C를 처리된 양상추는 $4^{\circ}C$에서 9일간 보관하며 미생물학적 분석과 관능평가를 실시하였다. 저온 플라즈마 처리는 E. coli O157:H7, S. Typhimurium, L. monocytogenes의 개체 수를 각각 0.26, 0.65, 0.93 log CFU/g 수준으로 감소시켰다. 또한, UV-C 처리 시 각각 0.87, 0.88, 1.14 log CFU/g 수준으로 감소되었다. 또한 UV-C 처리 후 저온 플라즈마를 처리한 병행처리에서는 각각 1.44, 2.70, 1.62 log CFU/g 수준으로 감소하였다. 저온 플라즈마와 UV-C 단독처리 보다는 병행처리가 좀 더 효과적으로 균을 저감하는 것으로 판단되었다. 관능평가 결과는 외관, 질감, 전체적인 수용도 면에서 대조구와 비교하였을 때, 보관 6일까지 유의적인 차이가 없었다. 따라서 저온 플라즈마와 UV-C 병행처리는 양상추에 존재하는 균을 저감하기 위한 효과적인 기술로 활용될 수 있을 것으로 생각되었다.

• Applied Science and Convergence Technology
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• 제25권3호
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• pp.51-55
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• 2016

The surface treatment of a titanium implant is investigated with a non-thermal atmospheric pressure plasma jet. The plasma jet is generated by the injection of He and $O_2$ gas mixture with a sinusoidal driving voltage of 3 kV or more and with a driving frequency of 20 kHz. The generated plasma plume has a length up to 35 mm from the jet outlet. The wettability of 4 different titanium surfaces with plasma treatments was measured by the contact angle analysis. The water contact angles were significantly reduced especially for $O_2/He$ mixture plasma, which was explained with the optical emission spectroscopy. Consequently, plasma treatment enhances wettability of the titanium surface significantly within the operation time of tens of seconds, which is practically helpful for tooth implantation.