• Title/Summary/Keyword: O-plasma treatment

Search Result 607, Processing Time 0.024 seconds

Plasma Surface Treatment of the Polymeric Film with Low Temperature Process (저온프로세스를 이용한 고분자필름의 플라즈마 표면처리)

  • Cho, Wook;Yang, Sung-Chae
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.21 no.5
    • /
    • pp.486-491
    • /
    • 2008
  • The plasma processing is applied to many industrial fields as thin film deposition or surface treatment technique. In this study, we investigated large-area uniformed surface treatment of PET film at low temperature by using Scanning Plasma Method(SPM). Then, we measured difference and distribution of temperature on film's surface by setting up a thermometer. We studied the condition of plasma for surface treatment by examining intensity of irradiation of uniformed plasma. And we compared contact angles of treated PET film by using Ar and $O_2$ plasma based low temperature. In our result, surface temperature of 3-point of treating is low temperature about $22^{\circ}C$, in other hands, there is scarcely any variation of temperature on film's surface. And by using Ar plasma treatment, contact angle is lower than untreatment or $O_2$ plasma treatment. In case of PET film having thermal weak point, low temperature processing using SPM is undamaged method in film's surface and uniformly treated film's surface. As a result, Ar plasma surface treatment using SPM is suitable surface treatment method of PET film.

Sliding Wear Characteristics of plasma Sprayed $8\%Y_{2}O_3-ZrO_2$ Coating for Post-spray Heat Treatment

  • Chae Young-Hun;Kim Seock-Sam
    • KSTLE International Journal
    • /
    • v.6 no.2
    • /
    • pp.45-50
    • /
    • 2005
  • Plasma ceramic spray that is applied on a machine part under severe work conditions has been investigated for tribological behavior. The application of ceramic coatings by plasma spray has become essential in tribosystems to produce wear resistance and long life in severe conditions. The purpose of this study was to investigate the wear characteristics of $8\%Y_{2}O_3-ZrO_2$ coating, in view of the effect of post-spay heat treatment. The plasma-sprayed $8\%Y_{2}O_3-ZrO_2$ coating was studied to know the relationship between phase transformations and wear behavior related to post-spray heat treatment. Wear test was carried out with ball on disk type on normal loads of 50N,70N and 90N under room temperature. The phase transformation of phase and the value of residual stress were measured by X-ray diffraction method(XRD). Tribological characteristics and wear mechanisms of coatings were observed by SEM. The tribological wear performance was discussed in the focusing of residual stress. Consequently, post-spray heat treatment plays an important role in decreasing residual stress. Residual stress in the coating system has a significant influence on the wear mechanism of coating.

The Characteristics of the Treatment of Pollutants ($SO_2$, NOx) Using Surface Discharge Induced Plasma Chemical Process (SPCP를 이용한 오염물질 ($SO_2$, NOx) 처리 특성)

  • 봉춘근;부문자
    • Journal of Korean Society for Atmospheric Environment
    • /
    • v.14 no.4
    • /
    • pp.333-342
    • /
    • 1998
  • Plasma process has great possibilities to remove SOx, NOx simultaneously with high treatment efficiency and is expected to be suitable for small or middle plants. It was accomplished to evaluate SO2, NOx control possibility and achieve basic data to control pollutants by use of Surface Discharge Induced Plasma Chemical Process (SPCP) in this study. O3 generation characteristics by discharge of a plate was proportional to O2 concentration and power consumption and inversely proportional to temperature and humidity, In case of dry air, NOx was highly generated by N2 and O2 in air during the plasma discharge process but it was decreased considerably as H2O was added. SO2 removal efficiency was very high, and removal rate was 170,350 mEA at 30,50 watt respectively in flue gas which is usually contain HIO. NOx removal efficiency was about 57% at 40 watt power consumption with 7.5% humidity. It is estimated that H2O has an important role in reaction mechanism with pollutants according to plasma discharge.

  • PDF

Degradation of electrical characteristics in Bio-FET devices by O2 plasma surface treatment and improving by heat treatment (O2 플라즈마 표면처리에 의한 Bio-FET 소자의 특성 열화 및 후속 열처리에 의한 특성 개선)

  • Oh, Se-Man;Jung, Myung-Ho;Cho, Won-Ju
    • Journal of the Korean Vacuum Society
    • /
    • v.17 no.3
    • /
    • pp.199-203
    • /
    • 2008
  • The effects of surface treatment by $O_2$ plasma on the Bio-FETs were investigated by using the pseudo-MOSFETs on the SOI substrates. After a surface treatment by $O_2$ plasma with different RF powers, the current-voltage and field effect mobility of pseudo-MOSFETs were measured by applying back gate bias. The subthreshold characteristics of pseudo-MOSFETs were significantly degraded with increase of RF power. Additionally, a forming gas anneal process in 2 % diluted $H_2/N_2$ ambient was developed to recover the plasma process induced surface damages. A considerable improvement of the subthreshold characteristics was achieved by the forming gas anneal. Therefore, it is concluded that the pseudo-MOSFETs are a powerful tool for monitoring the surface treatment of Bio-FETs and the forming gas anneal process is effective for improving the electrical characteristics of Bio-FETs.

$H_2$ plasma treatment effects on electrical and optical properties of the BZO (ZnO:B) thin films

  • Yoo, Ha-Jin;Son, Chan-Hee;Choi, Joon-Ho;Kang, Jung-Wook;Cho, Won-Tae;Park, Sang-Gi;Lee, Yong-Hyun;Choi, Eun-Ha;Cho, Guang-Sup;Kwon, Gi-Chung
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2010.08a
    • /
    • pp.309-309
    • /
    • 2010
  • We have investigated the effect of $H_2$ plasma treatment on the BZO (ZnO:B, Boron doped ZnO) thin films. The BZO thin films are prepared by LP-MOCVD (Low Pressure Metal Organic Chemical Vapor Deposition) technique and the samples of BZO thin film are performed with $H_2$ plasma treatment by plasma treatment system with 13.56 MHz as RIE (Reactive Ion Etching) type. After exposing $H_2$ plasma treatment, measurement of transmittance, reflectance and haze spectra in 300~1100 nm, electrical properties as resistivity, mobility and carrier concentration and work function was analysed. Regarding the results of the $H_2$ plasma treatment on the BZO thin films are application to the TCO for solar cells, such as the a-Si thin films solar cell.

  • PDF

Modifications of ITO Surfaces in Organic EL Devices by $O_2$ Plasma Treatment (O$_2$ 플라즈마 처리에 의한 ITO 표면개질 변화에 따른 유기 EL 소자 특성)

  • 박상무;김형권;이덕출
    • The Transactions of the Korean Institute of Electrical Engineers C
    • /
    • v.52 no.6
    • /
    • pp.261-266
    • /
    • 2003
  • We investigated the effect of oxygen plasma treatment of indium-tin oxide(ITO) surface on the performance of electroluminescence(EL) devices. ITO surface treated oxygen plasma has been analyzed using atomic force microscope(AFM) and X-ray photoelectron spectroscopy(XPS), to investigate the relations between the properties of the ITO surface and the properties of the current-voltage-luminance(I-V-L) characteristics of the fabricated OLED with the structure of ITO(plasma treatment) / TPD / Alq$_3$/ Al. It is found that the oxygen plasma treatment of ITO anode improve the hole injection of the OLED due to the modification of the surface states. The treated ITO anode nay be low voltage with high luminance efficiency.

Patterned Arrays of Well-Ordered ZnO Nanorods Assisted with Polystyrene Monolayer By Oxygen Plasma Treatment

  • Choi, Hyun Ji;Lee, Yong-Min;Lee, Yulhee;Seo, Hyeon Jin;Hwang, Ki-Hwan;Kim, Dong In;Yu, Jung-Hoon;Kim, Jee Yun;Nam, Sang Hun;Boo, Jin-Hyo
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2016.02a
    • /
    • pp.146-146
    • /
    • 2016
  • Zinc Oxide (ZnO) was known as a promising material for surface acoustic wave devices, gas sensors, optical devices and solar cells due to piezoelectric material, large band gap of 3.37 eV and large exciton binding energy of 60 meV at room temperature. In particular, the alignment of ZnO nanostructures into ordered nanoarrays can bring about improved sensitivity of devices due to widen the surface area to catch a lot of gas particle. Oxygen plasma treatment is used to specify the nucleation site of round patterned ZnO nanorods growth. Therefore ZnO nanorods were grown on a quartz substrate with patterned polystyrene monolayer by hydrothermal method after oxygen plasma treatment. And then, we carried out nanostructures by adjusting the diameter of the arranged ZnO nanorods according to polystyrene spheres of various sizes. The obtained ZnO nanostructures was characterized by X-ray diffraction (XRD), Field emission scanning electron microscopy (FE-SEM).

  • PDF

Influence of Inductive Coupled Plasma Treatment and SnO2 Deposition on the Properties of Polycarbonate (유도결합플라즈마 표면 처리 및 SnO2 증착에 따른 폴리카보네이트 특성 연구)

  • Eom, Tae-Young;Choi, Dong-Hyuk;Son, Dong-Il;Eom, Tae-Yong;Kim, Daeil
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.31 no.3
    • /
    • pp.156-159
    • /
    • 2018
  • Inductively coupled plasma (ICP) treatment with argon and a mixture of argon and oxygen gases has been used to modify the surface of polycarbonate (PC) substrates. The results showed that the surface contact angle was inversely proportional to the plasma discharge power and that the mixed-gas plasma (gas flow 10:10 sccm, discharge power 60 W) decreased the surface contact angle as low as $18.3^{\circ}$, indicating a large increase in the surface hydrophilicity. In addition, $SnO_2$ thin films deposited on the PC substrate effectively enhanced the ICP plasma treatment, and could also enhance the usefulness of PC in the inner parts of automobiles.

Surface modification for block copolymer nanolithographyon gold surface

  • Hwang, In-Chan;Bang, Seong-Hwan;Lee, Byeong-Ju;LeeHan, Bo-Ram;Kim, Hyeong-Jun
    • Proceedings of the Materials Research Society of Korea Conference
    • /
    • 2009.11a
    • /
    • pp.33.2-33.2
    • /
    • 2009
  • Block copolymer lithography has attracted great attention for emerging nanolithography since nanoscaleperiodic patterns can be easily obtained through self-assembly process without conventional top-down patterning process. Since the morphologies of self-assembled block copolymer patterns are strongly dependent on surface energy of a substrate, suitable surface modification is required. Until now, the surface modification has been studied by using random copolymer or self-assembled mono layers (SAMs). However, the research on surface modifications has been limited within several substrates such as Si-based materials. In present study, we investigated the formation of block copolymer on Au substrate by $O_2$ plasma treatment with the SAM of 3-(p-methoxy-phenyl)propyltrichloro-silane [MPTS, $CH_3OPh(CH_2)_3SiCl_3$]. After $O_2$ plasma treatment, the chemical bonding states of the surface were analyzed by X-ray photoelectron spectroscopy (XPS). The static contact angle measurement was performed to study the effects of $O_2$ plasma treatment on the formation of MPTS monolayer. The block copolymer nanotemplates formed on Au surface were analyzed by scanning electron microscopy. The results showed that the ordering of self-assembled block copolymer pattern and the formation of cylindrical nano hole arrays were enhanced dramatically by oxygen plasma treatment. Thus, the oxidation of gold surface by $O_2$ plasma treatment enables the MPTS to form the monolayer assembly leading to surface neutralization of gold substrates.

  • PDF

Optical Properties of Organic Light Emitting Diode and Characteristics of ITO by Variation of Radio Frequency Plasma Power (Radio Frequency Plasma Power변화에 따른 ITO 특성 및 OLED의 광학적 특성)

  • Ki, Hyun-Chul;Kim, Hwe-Jong;Hong, Kyung-Jin;Kim, En-Mei;Gu, Hal-Bon
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.22 no.1
    • /
    • pp.81-85
    • /
    • 2009
  • We has been analysed optical properties of OLED(organic light emitting diode) and characteristics of ITO(Indium Tin Oxide) in terms of $O_2$ plasma treatment for manufacturing high efficiency OLED, RF power of $O_2$ plasma was changed 25, 50, 100, 200 W. $O_2$ gas flow, gas pressure and treatment time were fixed. Sheet resistance and surface roughness of ITO were measured by Hall-effect measurement system and AFM, respectively. The ranges of sheet resistance and surface roughness were $5.5{\sim}6,06\;{\Omega}$ and $2.438{\sim}3.506\;nm$ changing of RF power, respectively, PM(Passive Matrix)OLED was fabricated with the structure of ITO(plasm treatment)/TPD($400\;{\AA}$)/$Alq_3(600\;{\AA})$/LiF($5\;{\AA}$)/Al($1200\;{\AA}$). Turn-on voltage of PMOLED was 7 V and luminance was $7,371\;cd/m^2$ at the RF power of 25 W, $O_2$ plasma treatment of ITO surface was result in lowering the operating voltage and improving luminance of PMOLED.