• Title/Summary/Keyword: Non-vacuum

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Consideration on the Electromagnetic Wave Absorption Properties of the Plasma for the Stealth Technology (은신기술을 위한 플라즈마의 전자기파 흡수 특성에 대한 고찰)

  • In, S.R.
    • Journal of the Korean Vacuum Society
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    • v.17 no.6
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    • pp.501-510
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    • 2008
  • The stealth technology to conceal an aircraft from the vision of a radar have been accomplished by coating the surface with special paints absorbing the electromagnetic wave. Nowadays, researches to utilize characteristics of the plasma-wave interaction for realizing the stealth technology are actively progressed. In this paper, to investigate the physical feasibility of the plasma stealth, calculation results for the required conditions of the plasma cloaking on the aircraft flying in the air for showing the stealth function, using a flat non-magnetized non-uniform plasma model, are reported and discussed.

Research trend of programmable metalization cell (PMC) memory device (고체 전해질 메모리 소자의 연구 동향)

  • Park, Young-Sam;Lee, Seung-Yun;Yoon, Sung-Min;Jung, Soon-Won;Yu, Byoung-Gon
    • Journal of the Korean Vacuum Society
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    • v.17 no.4
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    • pp.253-261
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    • 2008
  • Programmable metallizaton cell (PMC) memory device has been known as one of the next generation non-volatile memory devices, because it includes non-volatility, high speed and high ON/OFF resistance ratio. This paper reviews the operation principle of the device. Besides, the recent research results of professor Kozicki who firstly invented the device and investigated it for the memory applications, NEC corporation which studied it for the FPGA (field programmable gate array) switch applications, ETRI and chungnam national university which examined Te-based devices are introduced.

MWPCVD에 의해 합성된 다이아몬드 박막 특성에 대한 증착조건의 영향

  • 이병수;박상현;신태현;유도현;이덕출
    • Proceedings of the Korean Vacuum Society Conference
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    • 2000.02a
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    • pp.97-97
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    • 2000
  • In this thesis, the metastable state diamond thin films have been deposited on Si substrates from methane-hydrogen and oxygen mixture using Microwave Plasma Enhanced Chemical Vapor deposition (MWPCVD) method. Effects of each experimental parameters of MWPCVD including methane concentrations, oxygen additions, operating pressure, deposition time, etc. on the growth rate and crystallinity were investigated. SEM, XRD, and Raman spectroscopy were employed to analyze the growth rate and morphology, crystallinity and prefered growth direction, and relative amounts of diamond and non-diamond phases respectively. As a methane concentration below 4%, the deposited films having well-defined facets could be obtained. As the methane concentration increases over 4%, the shape of films gradually changed into a amorphos form. The best crystallinity of the film at 3% in the Raman spectroscopy. Addition of oxygen to the methane-hydrogen mixture gave an improved film crystallinity at 50% oxygen concentration due to its more effectiveness in the selective removal of the non-diamond phased compared to the of H atom. on the contrary, the growth rate generally decreased by oxygen to from the more stable CO and CO2 is responsible for such an effect. Upon increasing the operating pressure and time, increased of growth rate and crystallinity were increased simultaneously.

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Microstructural investigation of the electroplating Cu thin films for ULSI application (ULSI용 Electroplating Cu 박막의 미세조직 연구)

  • 박윤창;송세안;윤중림;김영욱
    • Journal of the Korean Vacuum Society
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    • v.9 no.3
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    • pp.267-272
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    • 2000
  • Electroplating Cu was deposited on Si(100) wafer after seed Cu was deposited by sputtering first. TaN was deposited as a diffusion barrier before depositing the seed Cu. Electroplating Cu thin films show highly (111)-oriented microstructure for both before and after annealing at $450^{\circ}C$ for 30min and no copper silicide was detected in the same samples, which indicates that TaN barrier layer blocks well the Cu diffusion into silicon substrate. After annealing the electroplating Cu film up to $450^{\circ}C$, the Cu film became columnar from non-columnar, its grain size became larger about two times, and also defects density of stacking faults, twins and dislocations decreased greatly. Thus the heat treatment will improve significantly electromigration property caused by the grain boundary in the Cu thin films.

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Synthesis of binary Cu-Se and In-Se nanoparticle inks using cherry blossom gum for CuInSe2 thin film solar cell applications

  • Pejjai, Babu;Reddy, Vasudeva Reddy Minnam;Seku, Kondaiah;Cho, Haeyun;Pallavolu, Mohan Reddy;Le, Trang Thi Thuy;Jeong, Dong-seob;Kotte, Tulasi Ramakrishna Reddy;Park, Chinho
    • Korean Journal of Chemical Engineering
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    • v.35 no.12
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    • pp.2430-2441
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    • 2018
  • Selenium (Se)-rich binary Cu-Se and In-Se nanoparticles (NPs) were synthesized by a modified heat-up method at low temperature ($110^{\circ}C$) using the gum exudates from a cherry blossom tree. Coating of CISe absorber layer was carried out using Se-rich binary Cu-Se and In-Se NPs ink without the use of any external binder. Our results indicated that the gum used in the synthesis played beneficial roles such as reducing and capping agent. In addition, the gum also served as a natural binder in the coating of CISe absorber layer. The CISe absorber layer was integrated into the solar cell, which showed a power conversion efficiency (PCE) of 0.37%. The possible reasons for low PCE of the present solar cells and the steps needed for further improvement of PCE were discussed. Although the obtained PCE is low, the present strategy opens a new path for the fabrication of eco-friendly CISe NPs solar cell by a relatively chief non-vacuum method.

Study on the measurement of activation temperature of Non-Evaporable Getter (비증발형 게터의 활성화 온도 측정방법에 관한 연구)

  • Lee D. J.;Kim K. B.;In S. R.;Lim J. Y,;Kim W. B.
    • Journal of the Korean Vacuum Society
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    • v.14 no.1
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    • pp.1-6
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    • 2005
  • Getters are invariably covered with thin layers of oxides even in air. For the getter to function properly it is necessary to activate them by heating in vacuum during which the oxide layer is removed exposing clean surface. The so-called activation temperature is an important parameter along with gas sorption capacity since it determines the maximum temperature of a device in which a getter can be installed. Nevertheless, no standard method to measure activation temperature has been documented yet. In this study, a relatively simple method to measure the activation temperature based on the ultimate pressure measurement was suggested. The activation temperature of TiZrV alloy measured by the method was between 100℃~200℃.

Influence of Drying Methods on Measurement of Hydration Degree of Hydraulic Inorganic Materials: 2) Alkali-activated slag (수경성 무기재료의 수화도 측정에 대한 건조방법의 영향: 2) 알칼리 활성 슬래그)

  • Lee, Hyo Kyong;Song, Keum-Il;Song, Jinkyu;Kim, Hyeong-Ki
    • Resources Recycling
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    • v.27 no.1
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    • pp.106-117
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    • 2018
  • The present study was carried out to find a suitable drying method for the determination of non-evaporable water in hydraulic inorganic materials. In Part 1 of the paper, the case ordinary Portland cement was discussed and, in this Part 2, the case of alkali active slag (AAS) was investigated. Various drying methods including vacuum and oven drying, and an ignition, were used for the AAS system having different w/b, types and amounts of alkali activators. It was found that a combination of the vacuum and oven drying was a suitable drying method for the AAS case. Although a part of the crystallized water in hydration products was decomposed, but the free and adsorbed water could be completely evaporated and the deviation of the results was small.

Design and Fabrication of a Nonglass Solar Vacuum Collector (비유리식 진공관형 태양열 집열기의 설계 및 제작)

  • Oh, Seung-Jin;Hyun, Jun-Ho;Kim, Nam-Jin;Lee, Heon-Ju;Lee, Yoon-Jun;Chun, Won-Gee
    • Proceedings of the Korea Society for Energy Engineering kosee Conference
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    • 2007.11a
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    • pp.181-186
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    • 2007
  • 본 논문은 현재 국내 외적으로 널리 공급되고 있는 유리식(glass) 진공관형 태양열 집열기를 대체할 수 있는 비유리식(non-glass) 진공관형 태양열 집열기의 설계 및 제작에 관한 실험적 내용을 소개하고 있다. 비유리식 진공관형 태양열 집열기는 유리식에 비해 그 내구성이 탁월할 뿐 아니라 적용성도 뛰어나지만 비유리식 집열기는 유리식 집열기와 달리 외부공기 입자의 진공관 내부로의 확산을 억제하거나 그 내부의 진공도 유지를 위해 특수 설계를 하여야 하며 아울러 소재의 특성을 최대한 살릴 수 있는 응용 기술의 개발을 필요로 한다. 이를 위하여 진공관 내부의 일정한 진공도 유지를 위해 집열기와 별도로 설치된 Vacuum Chamber를 진공관과 튜브(vacuum connector)로 연결하여 진공관 내의 outgasing이 가능하도록 할 수도 있으며, 진공관 외피에 공기의 침투를 억제하기 위한 gas barrier coating을 고려할 수도 있다. 본 논문에서 소개하는 비유리식(non-glass) 진공관형 태양열 집열기는 기계, 화공, 재료 등 다양한 분야의 원천 기술을 복합적으로 적용한 것으로 기존의 유리식에 비해 설계 및 제작에 있어서 다소 복잡한 양상을 띠고 있다.

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Comparison of vacuum metal deposition (VMD) and powder method for developing latent fingerprint on plastic envelope surface (플라스틱 봉투 표면에서 지문을 현출하기 위한 Vacuum Metal Deposition (VMD)과 분말법의 비교)

  • Kim, Chaewon;Lee, Narae;Kim, Taewon;Yu, Jeseol
    • Analytical Science and Technology
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    • v.33 no.3
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    • pp.159-166
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    • 2020
  • Vacuum metal deposition (VMD) is effective to develop latent fingerprints on non-porous and semi-porous surfaces. VMD can be used in cases when fingerprints that can not be developed by generalized techniques or deposited on difficult surfaces. The recommended surfaces for VMD techniques include vinyl, polymer bills, magnetic coated tickets, etc. In this study, the minimum amount of gold input was explored for developing fingerprints from at least 12 hours to up to 28 days after deposit fingerprint on the pink high density polyethylene envelope (HDPE) and low density polyethylene envelope (LDPE), which are mainly used as delivery envelopes. And the results were compared with the effects of black powder and fluorescent powder. In addition, delivery envelopes used for delivery were collected, then classified as HDPE and LDPE and pseudo-operation test was performed. As a result, VMD method developed good quality of fingerprints.

Comparative Study on Microwave Probes for Plasma Density Measurement by FDTD Simulations

  • Kim, D.W.;You, S.J.;Na, B.K.;Kim, J.H.;Chang, H.Y.;Oh, W.Y.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.218.1-218.1
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    • 2014
  • In order to measure the absolute plasma density, various probes are proposed and investigated and microwave probes are widely used for its advantages (Insensitivity to thin non-conducting material deposited by processing plasmas, High reliability, Simple process for determination of plasma density, no complicate assumptions and so forth). There are representative microwave probes such as the cutoff probe, the hairpin probe, the impedance probe, the absorption probe and the plasma transmission probe. These probes utilize the microwave interactions with the plasma-sheath and inserted structure (probe), but frequency range used by each probe and specific mechanisms for determining the plasma density for each probe are different. In the recent studies, behaviors of each microwave probe with respect to the plasma parameters of the plasma density, the pressure (the collision frequency), and the sheath width is abundant and reasonably investigated, whereas relative diagnostic characteristics of the probes by a comparative study is insufficient in spite of importance for comprehensive applications of the probes. However, experimental comparative study suffers from spatially different plasma characteristics in the same discharge chamber, a low-reproducibility of ignited plasma for an uncertainty in external discharge parameters (the power, the pressure, the flow rate and so forth), impossibility of independently control of the density, the pressure, and the sheath width as well as expensive and complicate experimental setup. In this paper, various microwave probes are simulated by finite-different time-domain simulation and the error between the input plasma density in FDTD simulations and the measured that by the unique microwave spectrums of each probe is obtained under possible conditions of plasma density, pressure, and sheath width for general low-temperature plasmas. This result shows that the each probe has an optimum applicable plasma condition and reliability of plasma density measurement using the microwave probes can be improved by the complementary use of each probe.

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