• Journal of the Korean Society for Heat Treatment
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• v.8 no.2
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• pp.137-148
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• 1995

The nitridation kinetics of titanium powder were studied by isothermal and non-isothermal (dynamic) methods in high purity nitrogen under I atm pressure. For the comparison with nitridation, the oxidation kinetics of titanium powder were also studied in dry oxygen at I atm pressure. An automatic recording electrobalance was used to measure the weight gain as a function of time and temperature. For the reaction with nitrogen, the nitride was formed at over $700^{\circ}C$. The reaction with nitrogen followed the parabolic rate law, and the activation energy was calculated to be 31 kcal/mol in the isothermal method (above $900^{\circ}C$). The non-stoichiometric TiNx has been synthesized by the nitridation at a proper temperature and time, followed by the homogenizing treatment above $1100^{\circ}C$. In comparison with the stoichiometric $TiN_{1.0}$ and the non-stoichiometric TiNx ($TiN_{0.5}$ and $TiN_{0.65}$), the hot oxidation characteristics of the former is superior to that of the latter. However, both non-stoichiometric nitrides make little difference in the hot oxidation characteristics.

• Journal of the Korean Society for Heat Treatment
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• v.31 no.5
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• pp.213-219
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• 2018

This study was carried out to investigate the effect of hot forging ratio and solution treatment temperature on the mechanical properties of incoloy 825 alloy. With an increasing of the hot forging ratio, grain size and range of grain size was decreased. With an increasing of the solution treatment temperature after 90% forging, grain size and range of grain size was increased. Cr carbides and Ti nitrides was precipitated at below $900^{\circ}C$ and volume fraction of precipitate was increased with an decreasing of the solution treatment temperature. With an increasing of the hot forging ratio, hardness, tensile strength and elongation, toughness was increased. With an increasing of the solution treatment temperature after 90% forging, hardness and strength was increased, elongation and toughness was decreased by grain refinement. With an increasing of the forging ratio, effect of solution treatment temperature on the hardness, strength and elongation was small, but on the toughness was large.

• Journal of Powder Materials
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• v.26 no.5
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• pp.415-420
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• 2019

SiAlON ceramics are used as ceramic cutting tools for heat-resistant super alloys (HRSAs) due to their excellent fracture toughness and thermal properties. They are manufactured from nitride and oxide raw materials. Mixtures of nitrides and oxides are densified via liquid phase sintering by using gas pressure sintering. Rare earth oxides, when used as sintering additives, affect the color and mechanical properties of SiAlON. Moreover, these sintering additives influence the cutting performance. In this study, we have prepared $Yb_{m/3}Si_{12-(m+n)}Al_{m+n}O_nN_{16-n}$ (m = 0.5; n = 0.5, 1.0) ceramics and manufactured SiAlON ceramics, which resulted in different colors. In addition, the characteristics of the sintered SiAlON ceramics such as fracture toughness and microstructure have been investigated and results of the cutting test have been analyzed.

• Composites Research
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• v.32 no.5
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• pp.296-300
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• 2019

Two dimensional transition metal carbides and/or nitrides, known as MXenes, are a promising electrode material in energy storage due to their excellent electrical conductivity, outstanding electrochemical performance, and abundant functional groups on the surface. Use of $Ti_3C_2$ as electrode material has significantly enhanced electrochemical performance by providing more chemically active interfaces, short ion-diffusion lengths, and improved charge transport kinetics. Here, we reports the efficient method to synthesize $Ti_3C_2$ from MAX phase, and opens new avenues for developing MXene based electrode materials for Lithium-Ion batteries.

• Journal of Powder Materials
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• v.28 no.6
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• pp.502-508
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• 2021

SiAlON-based ceramics are a type of oxynitride ceramics, which can be used as cutting tools for heat-resistant super alloys (HRSAs). These ceramics are derived from Si3N4 ceramics. SiAlON can be densified using gas-pressure reactive sintering from mixtures of oxides and nitrides. In this study, we prepare an α-/β-SiAlON ceramic composite with a composition of Yb_0.03Y_0.10Si_10.6Al_1.4O_1.0N_15.0. The structure and mechanical/thermal properties of the densified SiAlON specimen are characterized and compared with those of a commercial SiAlON cutting tool. By observing the crystallographic structures and microstructures, the constituent phases of each SiAlON ceramic, such as α-SiAlON, β-SiAlON, and intergranular phases, are identified. By evaluating the mechanical and thermal properties, the contribution of the constituent phases to these properties is discussed as well.

• Journal of the Korean Vacuum Society
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• v.4 no.S2
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• pp.131-138
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• 1995

The broad beam ion sources of hot filament plasma type have widely used for modifications of materials and thin films, and the new type intensive current broad beam metal ion source including reactive gaseous ion beams is needed for preparing the hard coating films such as DLC, $\beta-C_3N_4$ Carbides, Nitrides, Borides etc. Now a electorn beam evaporation(EBE) broad beam metal ion source has been developed for this purpose in our lab. CN film has been formed by the EBE ion source. Study of the CN film shows that it has high hardness(HK=5800kgf/$\textrm {mm}^2$)and good adhesion. This method can widely changes the ratio of C/N atom's concentrations from 0.14 to 0.6 and has high coating rate. The low energy pocket ion source which was specially designed for surface texturing of medical silicon rubber was also developed. It has high efficiency and large uniform working zone. Both nature texturing and mesh masked texturing of silicon rubbers were performed. The biocompatibility was tested by culture of monocytes, and the results showed improved biocompatibility for the treated silicon rubbers. In addition, the TiB2 film synthesized by IBED is being studied recently in our lab. In this paper, the results which include the hardness, thickness of the films and the AES, XRD analysis as well as the tests of the oxidation of high temperature and erosion will be presented.

• Corrosion Science and Technology
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• v.23 no.2
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• pp.166-178
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• 2024

The localized corrosion resistance of UNS N07718 alloy was investigated after solution heat treatment. When the alloy was heat-treated at 1050 ℃ for 2.5 hours, it experienced an increase in average grain diameter, a reduction in grain boundary area, and the dissolution of delta phases along grain boundaries. Additionally, primary metallic nitrides (MN) and metallic carbides (MC), enriched with either Ti or Nb, were identified and exhibited a random distribution within the microstructures. Despite the solution heat treatment, the composition, diameter, and abundance of MNs and MCs remained relatively consistent. The critical pitting temperature (CPT), as determined by the ASTM G48-C immersion test, revealed similar values of 45 ℃ for both treated and untreated alloys. However, a decrease in maximum pit depth and corrosion rate was observed after the solution heat treatment. The microstructural changes that occurred during the heat treatment and their potential implications were discussed to understand the influence of the solution heat treatment.

• Journal of the Korean Ceramic Society
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• v.49 no.4
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• pp.318-324
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• 2012

Reaction-bonded silicon nitrides containing rare-earth oxide sintering additives were densified by gas pressure sintering. The sintering behavior, microstructure and mechanical properties of the resultant specimens were analyzed. For that purpose, $Lu_2O_3-SiO_2$ (US), $La_2O_3$-MgO (AM) and $Y_2O_3-Al_2O_3$ (YA) additive systems were selected. Among the tested compositions, densification of silicon nitride occurred at the lowest temperature when using the $La_2O_3$-MgO system. Since the $Lu_2O_3-SiO_2$ system has the highest melting temperature, full densification could not be achieved after sintering at $1950^{\circ}C$. However, the system had a reasonably high bending strength of 527 MPa at $1200^{\circ}C$ in air and a high fracture toughness of 9.2 $MPa{\cdot}m^{1/2}$. The $Y_2O_3-Al_2O_3$ system had the highest room temperature bending strength of 1.2 GPa.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.11a
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• pp.172-172
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• 2009

In this study, we presented comparative discrimination methods to identify various line and planar defects observed in nonpolar a-GaN epilayers on r-sapphire substrates. Unlike the case of conventional c-GaN, which is dominated by perfect threading dislocations, systematic identification of undistinguishable defects using transmission electron microscopy (TEM) is necessary to suppress the propagation of defects in nonpolar GaN epilayers. Cross-sectional TEM images near the [0001] zone axis revealed that perfect mixed and pure screw type dislocations are visible, while pure edge, partial dislocations, and basal stacking faults (BSFs) are not discernible. In tilted cross-sectional TEM images along the [$1\bar{2}10$] zone axis, the dominant defects were BSFs and partial dislocations for the $g=10\bar{1}0$ and 0002 two-beam images, respectively. From plan view TEM images taken along the [$11\bar{2}0$] axis, it was found that the dominantpartial and perfect dislocations were Frank-Shockley with b=${\pm}1/6$<$20\bar{2}3$> and mixed type without an 1 component including b=${\pm}1/3$<$1\bar{2}10$> and ${\pm}1/3$<$\bar{2}110$>, respectively. Prismatic stacking faults were observed as inclined line contrast near the [0001] zone axis and were visible as band contrast in the two-beam images along the [$1\bar{2}10$] and [$11\bar{2}0$] zone axes.

• Journal of Sensor Science and Technology
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• v.6 no.3
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• pp.200-206
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• 1997

Using $SiCl_{2}H_{2}$, $NH_{3}$ and $N_{2}O$, we have fabricated silicon oxynitride ($Si_{x}O_{y}N_{z}$) layers on thermally oxidized silicon wafer by low pressure chemical vapor deposition. Three different compositions were achieved by controlling gas flow ratios($NH_{3}/N_{2}O$)) to 0.2, 0.5 and 2 with fixed gas flow of $SiCl_{2}H_{2}$. Ellipsometry and high frequency capacitance-voltage(HFCV) measurements were adapted to investigate the difference of the refractive index, dielectric constant, and composition, respectively. Regardless of nitride content, silicon oxynitrides had similar stability to silicon nitrides. The relative standing of alkali ion sensitivity in silicon oxynitride layers was influenced by nitride content. The better alkali ion-sensitivity was achieved by increasing oxide content in bulk of silicon oxynitrides.