• Title/Summary/Keyword: Nickel stamper

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High Brightness Prism Light-guide Plate for TFT-LCDs Using Optical Simulation and Novel Injection Mold Process (광학시뮬레이션과 새로운 사출성형법을 사용한 TFT-LCD용 고휘도 프리즘 도광판)

  • Han, Jeong-Min;Shon, Jin-Geun
    • The Transactions of the Korean Institute of Electrical Engineers P
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    • v.61 no.2
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    • pp.93-96
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    • 2012
  • We have designed high performance prism light-guide plate (LGP) in 17 inch TFT-LCD. In test result to embody high brightness BLU in case of LGP of base and upper surface with 17 inch, thickness 8mm adding prism construct. Using optical simulation, we forecast the brightness and uniformity in LGP with prism structure. And we adopted novel injection mold method and Nickel stamper to make actual evolution sample. Novel injection mold process has steady heating time zone in heat cycle time of injection mold process. For this novel heat cycle control, we achieved above 90[%] height prism structure as our design. It is superior brightness improvement than previous that of printing form about some 20[%] and in this course to embody actual material it succeeded prism LGP production by 17 inch injection form process.

Characteristics of Hot Embossing using DVD/Blu-ray Stamper (DVD/Blu-ray 스템퍼를 이용한 핫엠보싱 특성)

  • Kim B. H.;Ban J. H.;Shin J. K.;Kim H. Y.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2004.10a
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    • pp.305-310
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    • 2004
  • The Hot Embossing Lithography(HEL) as a method for the fabrication of nanostructure with polymer is becoming increasingly important because of its simple process, low cost, high replication fidelity and relatively high throughput. In this study, we investigated the characteristics of hot embossing lithography as a nanoreplication technique. To grasp characteristics of nano patterning rheology by process parameters(embossing temperature, pressure and time), we have carried out various experiments by using the DVD(400nm pattern width) and Blu-ray nickel stamps(150nm pattern width). During the hot embossing process, we have observed the characteristics of the size effect. The quality of products made by hot embossing is affected by its cooling shrinkage. The demolding process at the glass transition temperature results in low quality because of the shrinkage of the polymer. Therefore, the quantification of the temperature condition is essential for the replication of high quality.

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A study on the duplication of nickel stamper using circular paraboloid AAO nano-patterned master for anti-reflection effect (무반사 효과를 위한 회전포물체 나노패턴 양극산화 마스터를 이용한 니켈스탬퍼 제작에 관한 연구)

  • Kim, Min-Gu;Hong, Seok-Gwan;Park, Chun-Man;Gwak, Mun-Gyu;Kim, Hyeon-Jong;Yun, Gyeong-Hwan;Gang, Jeong-Jin
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2014.11a
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    • pp.158-159
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    • 2014
  • 무반사 효과를 보이는 나방눈을 관찰해보면 눈 표면에 회전포물체 형상 나노패턴이 형성된 것을 확인할 수 있다. 본 논문에서는 회전포물체 형상 AAO를 제작하였으며 이 마스터를 이용해 전주공정으로 니켈스탬퍼를 제작하였다. 제작된 father, mother 니켈스탬퍼 윗면의 나노패턴 형상을 FE-SEM(Field Emission Scanning Electron Microscope)으로 확인하였다.

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Technology to Fabricate PMMA Light Guiding Plate with nano pattern Using Nano Imprinting Technology (나노 임프린팅 기술에 의한 나노패턴을 갖는 PMMA 도광판 제조 기술)

  • Lee, B.W.;Lee, T.S.;Lee, C.H.;Lee, K.W.;Hong, C.;Chung, Jae-Hoon;Kim, C.K.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.11a
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    • pp.414-415
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    • 2007
  • PMMA light guiding plate with nano pattern was fabricated by nano imprinting technology. Silicon mold was fabricated by conventional photolithography. A nickel stamper was fabricated by electroplating process using silicon mold. Nano imprinting was performed on PMMA plate at $140^{\circ}C$ under pressure of 20kN. The nano pattern on PMMA plate was investigated using FE-SEM.

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Development of control technique of nano-sized pattern for electroplating (나노급 도금공정을 위한 미세패턴 제어기술의 개발)

  • Lee, Jae-Hong;Lee, Byoung-Wook;Lee, Kyung-Ho;Kim, Chang-Kyo
    • Proceedings of the KIEE Conference
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    • 2004.07c
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    • pp.1576-1578
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    • 2004
  • The alumina membrane with nano sized pore was prepared from aluminum by anodic oxidation to apply for storage equipment, gas sensor and stamper. The pore size and cell size of the pores are controlled by anodic oxidation voltage. The alumina thickness was controlled by etching process using 0.2M $H_3PO_4$. The thickness of alumina on Si wafer was very accurately controlled by anodic oxidation time. Nickel with nano-sized grain was electroplated on the Au layer on silicon wafer. The fabricated pores on alumina membrane was the thickness of $7{\sim}10{\mu}m$ with straight nano-sized pore of 307${\sim}$120nm. The alumina by the etching process shows smooth surface. The size of Ni grain was 130nm and 250nm for 10mA/$cm^2$and 20mA/$cm^2$of electroplating currents, respectively.

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