• Title/Summary/Keyword: Ni film

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Fabrication of Nanodot Arrays Via Pulsed Laser Deposition Technique Using (PS-b-PMMA) Diblock Copolymer and Anodic Aluminum Oxide Templates (고분자 공중합체와 알루미늄 양극 산화막 템플레이트를 이용한 나노점 배열 형성)

  • Park Sung-Chan;Bae Chang-Hyun;Park Seung-Min;Ha Joeng-Sook
    • Journal of the Korean Vacuum Society
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    • v.15 no.4
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    • pp.427-433
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    • 2006
  • We have fabricated nanodot arrays by using phase separated (PS- b- PMMA) diblock copolymer film and anodic aluminum oxide (AAO) membrane as templates with hexagonal arrays of cylindrical microdomains perpendicular to the substrate. Pulsed laser deposition technique was used to deposit various kinds of materials including Ag, Ni, ZnO, Si:Er, and Co/Pt onto Si substrates. The size and separation of nanodots correspond to those of the templates used, The density of nanodots was estimated to be $6{\times}10^{11}/cm^2$ and $1{\times}10^{10}/cm^2$ when the diblock copolymer and AAO were used, respectively. In particular, the optical properties of ZnO and Si: Er nanodot arrays were investigated and the strong photoluminescence at 380 nm and $1.54{\mu}m$ was observed from ZnO and Si:Er nanodot arrays, respectively.

Hot Corrosion Behavior of Al-Y Coated Haynes 263 in Lithium Molten Salt under Oxidation Atmosphere (리튬용융염계 산화성분위기에서 Al-Y 코팅한 Haynes 263의 고온 부식거동)

  • Cho Soo-Hang;Lim Jong-Ho;Chung Jun-Ho;Seo Chung-Seok;Park Seoung-Won
    • Korean Journal of Materials Research
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    • v.15 no.3
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    • pp.155-160
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    • 2005
  • The electrolytic reduction of spent oxide fuel involves the liberation of oxygen in a molten LiCl electrolyte, which results in a chemically aggressive environment that is very corrosive fir typical structural materials. So, it is essential to choose the optimum material f3r the process equipment handling molten salt. In this study, the corrosion behavior of Al-Y coated Haynes 263 in a molten salt of $LiCl-Li_2O$ under oxidation atmosphere was investigated at $650^{\circ}C$ for $72\~168$ hours. The corrosion rate of Al-Y coated Haynes 263 was low while that of bare Haynes 263 was high in a molten salt of $LiCl-Li_2O$. Al-Y coated Haynes 263 improved the corrosion resistance better than bare Haynes 263 alloy. An Al oxide layer acts as a protective film which Prohibits Penetration of oxygen. Corrosion Products were formed $Li(Ni,Co)O_2$ and $LiTiO_2$ on bare Haynes 263, but $LiAlO_2,\;Li_5Fe_5O_8\;and\;LiTiO_2$ on Al-Y coated Haynes 263.

Optimization of Growth Gases for the Low-temperature Synthesis of Carbon Nanotubes (탄소나노튜브의 저온성장을 위한 합성가스의 최적화 연구)

  • Kim, Young-Rae;Jeon, Hong-Jun;Lee, Han-Sung;Goak, Jeung-Choon;Hwang, Ho-Soo;Kong, Byung-Yun;Lee, Nae-Sung
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.22 no.4
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    • pp.342-349
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    • 2009
  • This study investigated the growth characteristics of carbon nanotubes (CNTs) by changing a period of annealing time and a $C_{2}H_{2}/H_2$ flow ratio at temperature as low as $450^{\circ}C$ with inductively coupled plasma chemical vapor deposition. The 1-nm-thick Fe-Ni-Co alloy thin film served as a catalyst layer for the growth of CNTs, which was thermally evaporated on the 15-nm-thick Al underlayer deposited on the 50-nm-thick Ti diffusion barrier. The annealing at low temperature of $450^{\circ}C$ brought about almost no granulation of the catalyst layer, and the CNT growth was not affected by a period of annealing time. A study of changing the flow rate of $C_{2}H_{2}$ and $H_2$ showed that as the ratio of the $C_{2}H_{2}$ flow rate to the $H_2$ flow rate was lowered, the CNTs were grown to be longer With further decreasing the flow ratio, the length of CNTs reached the maximum and then became shorter. Under the optimized gas flow rates, we successfully synthesized CNTs with a uniform length over a 4-inch Si wafer at $450^{\circ}C$.

A Study on the Characterization of Electroless and Electro Plated Nickel Bumps Fabricated for ACF Application (무전해 및 전해 도금법으로 제작된 ACF 접합용 니켈 범프 특성에 관한 연구)

  • Jin, Kyoung-Sun;Lee, Won-Jong
    • Journal of the Microelectronics and Packaging Society
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    • v.14 no.3
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    • pp.21-27
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    • 2007
  • Nickel bumps for ACF(anisotropic conductive film) flip chip application were fabricated by electroless and electro plating and their mechanical properties and impact reliability were examined through the compressive test, bump shear test and drop test. Stress-displacement curves were obtained from the load-displacement data in the compressive test using nano-indenter. Electroplated nickel bumps showed much lower elastic stress limits (70MPa) and elastic moduli ($7.8{\times}10^{-4}MPa/nm$) than electroless plated nickel bumps ($600-800MPa,\;9.7{\times}10^{-3}MPa/nm$). In the bump shear test, the electroless plated nickel bumps were deformed little by the test blade and bounded off from the pad at a low shear load, whereas the electroplated nickel bumps allowed large amount of plastic deformation and higher shear load. Both electroless and electro plated nickel bumps bonded by ACF flip chip method showed high impact reliability in the drop impact test.

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The Effects of Aging Heat Treatments on the Hardness and Electrocemical Corrosion for the Nimonic 80A Superalloy (Nimonic 80A 초내열합금의 경도와 전기화학적부식에 미치는 시효열처리의 효과)

  • 나은영
    • Journal of Advanced Marine Engineering and Technology
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    • v.22 no.5
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    • pp.660-669
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    • 1998
  • In this paper the Hardness and Electro-chemical corrosion of the Nimonic 80A superalloy were studied. It aging heat treatments was carried out at $650^{\circ}C$, $700^{\circ}C$, $750^{\circ}C$,$800^{\circ}C$ and $850^{\circ}C$ with different time of 20min , 30min 1hour, 2hours, 4hours, and 16hours additionally 64hours and 128hours at $650^{\circ}C$. The obtained results were as follows; 1. As aging temperature increased the time for the maximum hardness was reduced from 128hours at $650^{\circ}C$ to 30min at $850^{\circ}C$ whereas the highest hardness was reduced from Hv 381 at $650^{\circ}C$ to Hv 321 at $850^{\circ}C$. 2. In the Electro-chemical corrosion test as a function of aging heat treatment time and tem-perature the corrosion potential was reversely proportional to Hardness which indicated the effects of ${\gamma}/{\gamma}'$ coherency of base material and precipitate. 3. Initiation point of the pitting was observed at grain boundary twin boundary and near${\gamma}'$ pre-cipitates. The results of composition analysis by EDS at this point indicated that sulphur originat-ed from 1N $H_2SO_4$ solution was found in depletion at the grain boundaries and the pit which arouse in the near precipitates were lack of Al Ti and Ni which are the main element of ${\gamma}'$ The depletion of such element was cause breakdown of passive film.

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Controlled Growth of Large-area Mono-, Bi-, and Few-layer Graphene by Chemical Vapor Deposition on Copper Substrate

  • Kim, Yooseok;Lee, Su-il;Jung, Dae Sung;Cha, Myoung-Jun;Kim, Ji Sun;Park, Seung-Ho;Park, Chong-Yun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.380.2-380.2
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    • 2014
  • Direct synthesis of graphene using a chemical vapor deposition (CVD) has been considered a facile way to produce large-area and uniform graphene film, which is an accessible method from an application standpoint. Hence, their fundamental understanding is highly required. Unfortunately, the CVD growth mechanism of graphene on Cu remains elusive and controversial. Here, we present the effect of graphene growth parameters on the number of graphene layers were systematically studied and growth mechanism on copper substrate was proposed. Parameters that could affect the thickness of graphene growth include the pressure in the system, gas flow rate, growth pressure, growth temperature, and cooling rate. We hypothesis that the partial pressure of both the carbon sources and hydrogen gas in the growth process, which is set by the total pressure and the mole fraction of the feedstock, could be the factor that controls the thickness of the graphene. The graphene on Cu was grown by the diffusion and precipitation mode not by the surface adsorption mode, because similar results were observed in graphene/Ni system. The carbon-diffused Cu layer was also observed after graphene growth under high CH4 pressure. Our findings may facilitate both the large-area synthesis of well-controlled graphene features and wide range of applications of graphene.

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Resistive Switching Properties of Cr-Doped SrZrO3 Thin Film on Si Substrate (실리콘 기판위에서의 Cr-Doped SrZrO3 박막의 저항변화 특성)

  • Yang, Min-Kyu;Ko, Tae-Kuk;Park, Jae-Wan;Lee, Jeon-Kook
    • Korean Journal of Materials Research
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    • v.20 no.5
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    • pp.241-245
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    • 2010
  • One of the weak points of the Cr-doped SZO is that until now, it has only been fabricated on perovskite substrates, whereas NiO-ReRAM devices have already been deposited on Si substrates. The fabrication of RAM devices on Si substrates is important for commercialization because conventional electronics are based mainly on silicon materials. Cr-doped ReRAM will find a wide range of applications in embedded systems or conventional memory device manufacturing processes if it can be fabricated on Si substrates. For application of the commercial memory device, Cr-doped $SrZrO_3$ perovskite thin films were deposited on a $SrRuO_3$ bottom electrode/Si(100)substrate using pulsed laser deposition. XRD peaks corresponding to the (112), (004) and (132) planes of both the SZO and SRO were observed with the highest intensity along the (112) direction. The positions of the SZO grains matched those of the SRO grains. A well-controlled interface between the $SrZrO_3$:Cr perovskite and the $SrRuO_3$ bottom electrode were fabricated, so that good resistive switching behavior was observed with an on/off ratio higher than $10^2$. A pulse test showed the switching behavior of the Pt/$SrZrO_3:Cr/SrRuO^3$ device under a pulse of 10 kHz for $10^4$ cycles. The resistive switching memory devices made of the Cr-doped $SrZrO_3$ thin films deposited on Si substrates are expected to be more compatible with conventional Si-based electronics.

Fabrication of Solid Oxide Fuel Cells via Physical Vapor Deposition with Electron Beam: II. Unit Cell Performance (전자빔 물리증착을 이용한 고체 산화물 연료전지의 제조: II. 단전지 성능)

  • Kim, Hyoung-Chul;Park, Jong-Ku;Jung, Hwa-Young;Son, Ji-Won;Kim, Joo-Sun;Lee, Hae-Weon;Lee, Jong-Ho
    • Journal of the Korean Ceramic Society
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    • v.43 no.5 s.288
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    • pp.299-303
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    • 2006
  • In this paper, anode supported SOFC with columnar structured YSZ electrolyte was fabricated via Electron Beam Physical Vapor Deposition (EBPVD) method. Liquid condensation process was employed for the preparation of NiO-YSZ substrate and the high power electron beam deposition method was used for the deposition of YSZ electrolyte film. Double layered cathode with LSM-YSZ and LSM was printed on electrolyte via screen-printing method and fired at $1150^{\circ}C$ in air atmosphere for 3 h. The electrochemical performance and the long-term stability of $5{\times}5cm^2$ single cell were investigated with DC current-voltage characteristics and AC-impedance spectroscopy. According to the investigation, $5{\times}5cm^2$ sized unit cell showed the maximum power density of around $0.76W/cm^2$ at $800^{\circ}C$ and maintained the stable performance over 400 h.

Performance Evaluation of Selective Coatings for Solar Thermal Collectors (태양열 집열기에 사용될 선택흡수막의 성능 평가)

  • Lee, Kil-Dong
    • Journal of the Korean Solar Energy Society
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    • v.32 no.4
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    • pp.43-50
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    • 2012
  • Metal-metal oxide (M-M oxide) cermet solar selective coatings with a double cermet layer film structure were deposited on the Al-deposited glass substrate by using a directed current (DC) magnetron sputtering technology. M oxide (CrO and ZrO) was used as the ceramic component in the cermets, and Cr and Zr used as the metallic components. In addition, black Cr (Cr-$Cr_2O_3$ cermet) solar selective coatings were deposited on the Ni-plated Cu substrate by using a electroplating method for comparison. The thermal stability tests were carried out for performance evaluation of solar coatings. Reflectance measurements were used to evaluate both solar absorptance(${\alpha}$) and thermal emittance (${\epsilon}$) of the solar coatings before and after thermal testing by using a spectrometer. Optical properties of optimized cermet solar coatings were ${\alpha}{\simeq}0.94-0.96$ and ${\epsilon}{\simeq}0.1$ ($100^{\circ}C$). The results of thermal stability test of M-M oxide solar coatings showed that the Cr-CrO cermet solar selective coatings were more stable than the Zr-ZrO cermet selective coatings at temperature of both $400^{\circ}C$ in air and $450^{\circ}C$ in vacuum. The black Cr solar selective coatings were degraded in air at temperature of $400^{\circ}C$. The main optical degradation modes of these coatings were diffusion of metal atoms, and oxidation.

Effects of Sulfuric Acid Concentration and Alloying Elements on the Corrosion Resistance of Cu-bearing low Alloy Steels

  • Kim, Ki Tae;Kim, Young Sik
    • Corrosion Science and Technology
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    • v.17 no.4
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    • pp.154-165
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    • 2018
  • During the process of sulfur dioxide removal, flue gas desulfurization equipment provides a serious internal corrosion environment in creating sulfuric acid dew point corrosion. Therefore, the utilities must use the excellent corrosion resistance of steel desulfurization facilities in the atmosphere. Until now, the trend in developing anti-sulfuric acid steels was essentially the addition of Cu, in order to improve the corrosion resistance. The experimental alloy used in this study is Fe-0.03C-1.0Mn-0.3Si-0.15Ni-0.31Cu alloys to which Ru, Zn and Ta were added. In order to investigate the effect of $H_2SO_4$ concentration and the alloying elements, chemical and electrochemical corrosion tests were performed. In a low concentration of $H_2SO_4$ solution, the major factor affecting the corrosion rate of low alloy steels was the exchange current density for $H^+/H_2$ reaction, while in a high concentration of $H_2SO_4$ solution, the major factors were the thin and dense passive film and resulting passivation behavior. The alloying elements reducing the exchange current density in low concentration of $H_2SO_4$, and the alloying elements decreasing the passive current density in high concentration of $H_2SO_4$, together play an important role in determining the corrosion rate of Cu-bearing low alloy steels in a wide range of $H_2SO_4$ solution.