• 제목/요약/키워드: Ni film

검색결과 866건 처리시간 0.026초

Ni-Cr계 합금을 이용한 정밀 박막저항체의 제조 및 특성 (Manufacture of Precision Thin film Resistors using Ni-Cr Alloy and Their Properties)

  • 이영화;박세일;김국진;임영언
    • 한국전기전자재료학회논문지
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    • 제19권1호
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    • pp.52-57
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    • 2006
  • Precision thin film resistors using evanohm R alloy were fabricated by do magnetron sputtering method. The physical and electrical properties of the resistors were studied after treatment of thermal annealing. The crystallization of the film was increased as the annealing temperature increase. Diffusion and oxidation of Cr and Al elements were occurred into the film surface. The minimum TCR values of 10.46 ppm/$^{\circ}C$ and 10.65 ppm/$^{\circ}C$ were measured at the annealing temperatures of $200^{\circ}C$ and $300^{\circ}C$, respectively. We are conducting additional studies to improve characteristics of our resistors for practical device application.

Fabrication of Nano-Structures on NiFe Film by Anodization with Atomic Force Microscope

  • Okada, T.;Uchida, H.;Inoue, M.
    • Journal of Magnetics
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    • 제11권3호
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    • pp.135-138
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    • 2006
  • We studied local anodization on permalloy $(Ni_{80}Fe_{20})$ thin film with an atomic force microscope (AFM), which was performed by applying a voltage between the permalloy sample and conductive AFM tip. Comparing with anodization on Si (100) substrate, nano-structures on the permalloy thin film was fabricated with low processability.In order to improve the processability on the permalloy thin film, we used dot-fabrication method, thatis, a conductive AFM probe was kept at a position on the film during the anodization process.

다공성 알루미나 마스크를 이용한 니켈 나노점 구조 제작 (Fabrication of Ni Nanodot Structure Using Porous Alumina Mask)

  • 임수환;김철성;고태준
    • 한국자기학회지
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    • 제23권4호
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    • pp.126-129
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    • 2013
  • 본 연구에서는 인산 용액 하에서 2차 양극 산화 기법에 의해 제작된 양극 산화 알루미나 막을 마스크로 이용하여 정렬된 니켈 나노점 구조를 제작하였다. $2{\mu}m$ 두께의 얇은 양극 산화 알루미나 막 표면에 평균 279 nm 크기의 기공구조를 형성하였으며 이를 얇은 니켈 박막의 열 증착 시 다공 구조 마스크로 이용하여 정렬된 니켈 나노점 구조를 제작하였다. 형성된 니켈 나노점의 크기는 평균 293 nm의 크기를 가지고 있으며 알루미나 막 표면상의 기공 구조의 형상을 따르고 있음을 볼 수 있었다. 제작된 나노점 구조의 자기적 특성을 상온에서 자기이력곡선의 측정을 통해 살펴보았으며 연속적인 니켈 박막과 비교하였을 때 고립된 나노점 구조로 인하여 자화용이축을 따라 각형비의 감소와 보자력의 증가가 나타남을 관찰할 수 있었다. 본 연구를 통해 양극 산화 막을 마스크로 이용한 박막 증착 과정을 통해 균일한 자기 나노점 구조를 제작할 수 있음을 확인할 수 있었다.

Ni 박막 위 20 nm급 고정렬 Pt 크로스-바 구조물의 형성 방법 (Pattern Formation of Highly Ordered Sub-20 nm Pt Cross-Bar on Ni Thin Film)

  • 박태완;정현성;조영래;이정우;박운익
    • 대한금속재료학회지
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    • 제56권12호
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    • pp.910-914
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    • 2018
  • Since catalyst technology is one of the promising technologies to improve the working performance of next generation energy and electronic devices, many efforts have been made to develop various catalysts with high efficiency at a low cost. However, there are remaining challenges to be resolved in order to use the suggested catalytic materials, such as platinum (Pt), gold (Au), and palladium (Pd), due to their poor cost-effectiveness for device applications. In this study, to overcome these challenges, we suggest a useful method to increase the surface area of a noble metal catalyst material, resulting in a reduction of the total amount of catalyst usage. By employing block copolymer (BCP) self-assembly and nano-transfer printing (n-TP) processes, we successfully fabricated sub-20 nm Pt line and cross-bar patterns. Furthermore, we obtained a highly ordered Pt cross-bar pattern on a Ni thin film and a Pt-embedded Ni thin film, which can be used as hetero hybrid alloy catalyst structure. For a detailed analysis of the hybrid catalytic material, we used scanning electron microscope (SEM), transmission electron microscope (TEM) and energy-dispersive X-ray spectroscopy (EDS), which revealed a well-defined nanoporous Pt nanostructure on the Ni thin film. Based on these results, we expect that the successful hybridization of various catalytic nanostructures can be extended to other material systems and devices in the near future.

Spin-coating 공정에 의해 제조된 음극 지지형 고체산화물 연료전지 (Anode-supported Solid Oxide Fuel Cells Prepared by Spin-coating)

  • 유지행;이희락;우상국
    • 한국세라믹학회지
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    • 제44권12호
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    • pp.733-739
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    • 2007
  • NiO-YSZ anode-supported single cell was prepared by spin-coating YSZ and LSM slurries as electrolyte and cathode, respectively. Dense YSZ electrolyte film was successfully prepared on the porous NiO-YSZ anode substrate by tuning pre-sintering temperature of NiO-YSZ and co-firing temperature. The thickness of YSZ film was controlled by the solid content of slurry and coating cycles. The experimental conditions affecting on the thickness of YSZ film was discussed. Single cells with the active electrode area ${\sim}0.8\;cm^2$ were prepared by spin-coating the cathode layers of LSM-YSZ mixture and LSM consequently as well. The effects of the pre-sintering temperature and thus the microstructure of NiO-YSZ substrate on the current-voltage characteristics of co-fired cell were investigated.

Pt와 $LaNiO_3$ 전극에 대한 PZT(53/47) sol-gel 막의 전기적 특성 (Electrical properties of PZT films on Pt and $LaNiO_3$ electrode by using sol-gel method)

  • 서병준;여기호;류지구;김강언;정수태
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.2
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    • pp.641-643
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    • 2003
  • The ferroelectric properties of PZT(53/47) thin film was investigated by methoxy enthanol solution based on sol-gel method. The thickness of each layer by spincoating 0.25M sol at one time was $0.1{\mu}m$ and crack-free film was formed. $LaNiO_3/Si(100)$ electrode and $Pt/Ti/SiO_2/Si(100)$ electrode was coated by PZT sol at several times. PZT orientation was confirmed as a method of XRD and coercive field(Ec) as well as remnant polarization(Pr) was investigated from hysterisis curve. As a result of XRD analysis, we can know that the orientation of on PZT/LNO/Si(100) is better than on $Pt/Ti/SiO_2/Si(100)$. The remnant polarization(Pr) in LNO electrode was $87.5{\mu}C/cm^2$ and $39.8{\mu}C/cm^2$ in Pt. From this figures, it is investigated that the Pr in LNO electrode was better than in Pt.

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Development of High-Efficient Organic Solar Cell With $TiO_2$/NiO Hole-Collecting Layers Using Atomic Layer Deposition

  • Seo, Hyun Ook;Kim, Kwang-Dae;Park, Sun-Young;Lim, Dong Chan;Cho, Shinuk;Kim, Young Dok
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.157-158
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    • 2013
  • Organic solar cell was fabricated using one-pot deposition of a mixture of NiO nanoparticles, P3HT and PCBM. In the presence of NiO, the photovoltaic performance was slightly increased comparing to that of the device without NiO. When $TiO_2$ thin films with a thickness of 2~3 nm was prepared on NiO nanoparticles using atomic layer deposition, the power conversion efficiency was increased by a factor 2.5 with respect to that with bare NiO. Moreover, breakdown voltage of the film consisting of NiO, P3HT, and PCBM on indium tin oxide was increased by more than 1 V in the presence of $TiO_2$-shell on NiO nanoparticles. It is evidenced that S atoms of P3HT can be oxidized on NiO surfaces, and $TiO_2$-shell on NiO nanoparticles. It is evidenced that S atoms of P3HT can be oxidzed on NiO surfaces, and $TiO_2$ shell heavily reduced oxidation of S at oxide/P3HT interfaces. Oxidized S atoms can most likely act as carrier generation sites and recombination centers within the depletion region, decreasing breakdown voltage and performance of organic solar cells. Our result shows that fabrication of various core-shell nanostruecutres of oxides by atomic layer deposition with controlled film thickness can be of potential importance for fabricating highly efficient organic solar cells.

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기판온도와 열처리온도의 변화에 따른 Au/Cr, Au/Ni/Cr 및 Au/Pd/Cr 다층박막의 AES 분석 (AES Analysis of Au, Au/Cr, Au/Ni/Cr and Au/Pd/Cr Thin Films by the Change of Substrate Temperature and Annealing Temperature)

  • 유광수;정형진
    • 분석과학
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    • 제6권2호
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    • pp.217-223
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    • 1993
  • 저항가열식 진공중착기를 이용하여 실온(ambient temp.)과 $250^{\circ}C$에서 알루미나 기판 위에 Au/Cr, Au/Ni/Cr 및 Au/Pd/Cr 박막을 제조하였으며, 공기 중에서 $300^{\circ}C$, $450^{\circ}C$, $600^{\circ}C$의 온도로 각각 1시간 동안 열처리하였다. Au, Ni(또는 Pd) 및 Cr 박막의 두께는 각각 $1000{\AA}$, $300{\AA}$, 및 $50{\AA}$이었다. 박막 제조시 기판의 온도와 박막 제조 후 열처리 온도는 각 층의 상호확산으로 인하여 박막의 면저항값에 영향을 주었다. Auger depth profile 분석결과, Au/Cr 시스템에서는 기판의 온도는 $250^{\circ}C$로 하여 박막을 제조할 때 이미 Cr은 Au 표면으로 확산되었으며, 열처리 후에는 Au의 분포도만 변화하였다. Au/Ni/Cr과 Au/Pd/Cr 시스템의 경우 Ni와 Pd 모두 확산현상이 발견되었으며, 특히 Ni(약 45 at.%)는 Au 박막 표면으로 확산되어 산화되었다.

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IrMn 스핀밸브 박막소자의 폭 크기에 의존하는 자장감응도 (Magnetic Sensitivity Depending on Width of IrMn Spin Valve Film Device)

  • 최종구;이상석
    • 한국자기학회지
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    • 제20권2호
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    • pp.41-44
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    • 2010
  • NiFe/Cu/NiFe/IrMn 스핀밸브 박막에 대해 Cu의 두께에 의존하는 자장감응도를 조사하였다. Ta(5 nm)/NiFe(8 nm)/Cu(3.5 nm)/NiFe(4 nm)/IrMn(8 nm)/Ta(2.5 nm) 다층박막 구조에 대해 측정한 Minor 자기저항 곡선에서 자기저항비, 자장감응도, 보자력, 층간상호교환결합력은 각각 1.46 %, 2.0 %/Oe, 2.6 Oe, 0.1 Oe 이었다. 광 리소그래피 공정으로 제작한 10가지 다른 폭 크기와 $4.45\;{\mu}m$의 길이를 갖는 GMR-SV 소자의 자장감응도는 폭 크기가 $10\;{\mu}m$에서 $1\;{\mu}m$까지 작아짐에 따라 0.3 %/Oe에서 0.06 %/Oe로 감소하였다.