• 제목/요약/키워드: Near-Field Microwave Microscope

검색결과 26건 처리시간 0.026초

유기 발광소자내 dark spot의 마이크로파 근접장 현미경(near-field scanning microwave microscope)을 이용한 연구 (Investigation of dark spots in OLEDs by using a near-field scanning microwave microscope)

  • 윤순일;박미화;유현준;임은주;김주영;이기진
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.2
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    • pp.984-987
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    • 2003
  • 유기발광소자 안에 존재하는 비발광영역(dark spot)의 전압에 대한 영향을 근접장 마이크로파 현미경(near-field scanning microwave microscope)을 이용하여 관찰하였다. 유기발광소자는 glass/indiumtin oxide(ITO)/Cu-Pc/tris-(8-hydroquinoline)aluminum(Alq3)/aluminum(Al) 의 기본구조로 제작하였다. Dark spot은 ITO 기판을 부분적으로 에칭하여서 형성시켰다. Dark spot에 $0{\sim}l5 V$ 까지 전압을 인가시키면서 인가 전압에 따른 전기적 특성을 근접장 마이크로파 현미경 image의 변화와 반사계수인 $S_{11}$ 측정을 통하여 연구하였다.

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유기 발광소자내 dark spot의 마이크로파 근접장 현미경(near-field scanning microwave microscope)을 이용한 연구 (Investigation of dark spots in OLEDs by using a near-field scanning microwave microscope)

  • 윤순일;박미화;유현준;임은주;김주영;이기진
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 춘계학술대회 논문집 디스플레이 광소자분야
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    • pp.147-150
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    • 2003
  • 유기발광소자 안에 존재하는 비발광영역(dark spot)의 전압에 대한 영향을 근접장 마이크로파 현미경(near-field scanning microwave microscope)을 이용하여 관찰하였다. 유기발광소자는 glass/indiumtin oxide(ITO)/Cu-Pc/tris-(8-hydroquinoline)aluminum(Alp3)/aluminum(Al)의 기본구조로 제작하였다. 비발광영역은 ITO 기판을 부분적으로 에칭하여서 형성시켰다. Dark spot에 0~15V 전압을 인가시키면서 인가 전압에 따른 dark spot 구조적 및 전기적 특성을 근접장 마이크로파 현미경 Image의 변화와 반사계수인 $S_11$측정을 통하여 연구하였다.

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마이크로파 근접장 현미경을 이용한 유기 발광소자내 dark spot 연구 (Investigation of dark spots in organic light emitting diodes by using a near-field scanning microwave microscope)

  • 윤순일;유현준;박미화;김송희;이기진
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 추계학술대회 논문집 Vol.16
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    • pp.494-497
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    • 2003
  • We report the dark spots in organic light emitting diodes by using a near-field scanning microwave microscope. Devices structure was glass / indium-tin-oxide(ITO) / copper-pthalocyiane(Cu-Pc) / tris-(8-hydroquinoline)aluminum(Alq3) / aluminum(Al). We made artificial dark spots by using a etching technique on a ITO substrate. Near-field scanning microwave microscope images and reflective coefficient of dark spots were measured and compared by the change of various applied voltage changes 0-15V.

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근접장 마이크로파 현미경을 이용한 Copper(II)-phthalocyanine 박막의 특성 연구 (Characterization of thin film properties of Copper(II)-Phthalocyanine using a near-field scanning microwave microscope)

  • 박미화;이기진
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 추계학술대회 논문집 Vol.16
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    • pp.460-463
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    • 2003
  • We report the microwave reflection coefficient $S_{11}$ of copper(II)-phthalocyanine(CuPc) using a near-field microwave microscope(NSMM) in order to understand the intrinsic electromagnetic properties of organic materials. For a NSMM system, a high-quility microstip resonator coupled with a dielectric resonator was used. The reflection coefficient $S_{11}$ was changed by the preparation conditions of CuPc thin films. We compared the reflection coefficient with crystal phase, surface morphology, UV absorption spectra and x-ray diffraction results.

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근접장 마이크로파 현미경을 이용한 ITO 박막 면저항의 비파괴 관측 특성 연구 (Nondestructive measurement of sheet resistance of indium tin oxide(ITO) thin films by using a near-field scanning microwave microscope)

  • 윤순일;나승욱;윤영운;유현준;이영주;김현정;이기진
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 추계학술대회 논문집 Vol.17
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    • pp.522-525
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    • 2004
  • ITO thin films $({\sim}150\;nm)$ are deposited on glass substrates by different deposition condition. The sheet resistance of ITO thin films measured by using a four probe station. The microstructure of these films is determined using a X-ray diffractometer (XRD) and a scanning electron microscope (SEM) and a atomic force microscope (AFM). The sheet resistance of ITO thin films compared $s_{11}$ values by using a near field scanning microwave microscope.

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근접장 마이크로파 현미경을 이용한 ITO 박막 면저항의 비파괴 관측 특성 연구 (Nondestructive measurement of sheet resistance of indium tin oxide(ITO) thin films by using a near-field scanning microwave microscope)

  • 윤순일;나승욱;유현준;이영주;김현정;이기진
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.2
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    • pp.1042-1045
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    • 2004
  • ITO thin films ($\sim150nm$) are deposited on glass substrates by different deposition condition. The sheet resistance of ITO thin films measured by using a four probe station. The microstructure of these films is determined using a X-ray diffractometer (XRD) and a scanning electron microscope (SEM) and a atomic force microscope (AEM). The sheet resistance of ITO thin films compared $s_11$ values by using a near field scanning microwave microscope.

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근접장 마이크로파 현미경을 이용한 Copper(II)-phthalocyanine의 Phase Transition 연구 (Study of Phase Transition of Copper(II)-phthalocyanine using a Near Field Scanning Microwave Microscope)

  • 박미화;유현준;윤순일;임은주;이기진;차덕준;이용산
    • 한국전기전자재료학회논문지
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    • 제17권6호
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    • pp.641-646
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    • 2004
  • We report the changes of the microwave reflection coefficients S$_{11}$ of copper(II)-phthalocyanine (CuPc) thin films by using a near-field microwave microscope(NSMM) in order to understand the phase transition of CuPc. For a NSMM system, a high-quality microstrip resonator coupled with a dielectric resonator was used. CuPc thin films were prepared on the pre-heated glass substrates using a thermal evaporation method. The reflection coefficients S$_{11}$ of CuPc thin films were changed by the dependence on the substrate pre-heating temperatures. By comparing reflection coefficient S$_{11}$ and crystal structures, we found the phase transition of CuPc thin films from $\alpha$-phase to $\beta$-phase at the substrate heating temperature 200 $^{\circ}C$./TEX>.

Theoretical and Experimental Investigation on the Probe Design of a Ridge-loaded Slot Type for Near-Field Scanning Microwave Microscope

  • Son, Hyeok-Woo;Kim, Byung-Mun;Hong, Jae-Pyo;Cho, Young-Ki
    • Journal of Electrical Engineering and Technology
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    • 제10권5호
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    • pp.2120-2125
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    • 2015
  • In this paper, a rectangular waveguide probe with a ridge-loaded straight slot (RLSS) is presented for a near-field scanning microwave microscope (NSMM). The RLSS is located laterally at the end wall of the cavity and is loaded on double ridges in a narrow straight slot to improve the spatial resolution compared with a straight slot. The probe consists of a rectangular cavity with an RLSS and a feed section of a WR-90 rectangular waveguide. When the proposed NSMM is located at distance of 0.1mm in front of a substrate without patches or strips, the simulated full width at half maximum (FWHM) of the probe improve by approximately 31.5 % compared with that of a straight slot without ridges. One dimensional scanning of the E-plane on a sample under test was conducted, and the reflection coefficient of the near-field scanning probe is presented.

결정 성장 조건에 따른 copper(II)-phthalocyanine 박막의 전기전도도 특성 (Conductivity of copper(II)-phthalocyanine thin films due to a grain growth)

  • 박미화;유현준;이기진
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 춘계학술대회 논문집 디스플레이 광소자분야
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    • pp.132-136
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    • 2004
  • 열 증착 방법을 이용하여 copper(II)-phthalocyanine(CuPc) 박막을 glass 기판 위에 제작하였다. 열처리 조건은 $150^{\circ}C$에서 후열(annealing) 처리 하는 방식과 예열하는 두 가지 방식으로 달리하였다. 제작된 박막의 전기전도도를 평가하기 위해 마이크로웨이브 근접장 효과를 이용한 근접장 현미경(near-field scanning microwave microscope)을 이용하여 비파괴적인 방식으로 CuPc 박막의 반사계수(reflection coefficient)를 측정하였다. CuPc 박막의 전기전도도 특성을 UV 흡수도를 통한 에너지 밴드갭의 shift 현상과 관련지어 설명하고 또한 x-ray diffraction(XRD) data를 통해 박막의 결정 특성과 비교하였다. 박막 표면 특성은 SEM(scanning microscope microscopy)을 통해 관측하였다. 열처리 조건에 따른 CuPc 박막의 전기전도도 특성은 후열 처리한 박막의 경우 예열 처리한 박막보다 전기 전도 특성이 향상되었음을 관측할 수 있었다.

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Chemical bath deposition(CBD)에 의해 성장된 CdS 박막의 annealing 효과 (Annealing effects of CdS thin films grown by Chemical bath deposition(CBD))

  • 김미정;정원호;오동훈;채영안;차덕준;조승곤;정양준;;이기진
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 추계학술대회 논문집
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    • pp.358-360
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    • 2007
  • For large scaled solar cells and photosensors CdS thin films of $2{\mu}m$ thickness have deposited on ITO glass substrate by chemical bath deposition methode in $300^{\circ}C$ electric furnace. The surface roughness and resistance of cadmium sulphide(CdS) thin films with different microstructures and morphologies was investigated by using a x-ray diffraction (XRD), a scanning electron microscope (SEM), an atomic force microscope (AFM), and a near-field scanning microwave microscope (NFMM). As the different substrate heat temperatures, the microwave reflection coefficient $S_{11}$ and intensity of the (002) diffraction peak was changed, and the surface morphology also has shown differently.

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