• 제목/요약/키워드: Nanolithography

검색결과 62건 처리시간 0.024초

전기화학적 에칭법에 의한 텅스텐 와이어의 Sharp tip 제조에 관한 연구 (Tungsten With Tip Sharpening by Electrochemical Etching)

  • 우선기;이홍로
    • 한국표면공학회지
    • /
    • 제31권1호
    • /
    • pp.45-53
    • /
    • 1998
  • Sharp tips are commonly used for applications in fields as diverse as nanolithography, lowvoltage field emitters, emitters, nanoelectroniecs, electrochemisty, cell biology, field-ion and electron microscopy. tungsten wire, mater만 used in this experiment, which test the chip of wafer has been used to the needle of probe card. Tungsten wire was sharpened by electrochemical etching methode to get a typical tip shape.

  • PDF

미세탐침기반 기계-화학적 리소그래피공정을 이용한 3차원 미세 구조물 제작에 관한 기초 연구

  • 박미석;성인하;김대은;장원석
    • 한국정밀공학회:학술대회논문집
    • /
    • 한국정밀공학회 2004년도 춘계학술대회 논문요약집
    • /
    • pp.128-128
    • /
    • 2004
  • 나노 스케일의 구조물 제작에 있어서 기존의 리소그래피 공정들이 가지는 한계점을 극복하기 위해서 다양한 방식의 새로운 공정들이 개발되고 있다. 특히, 기계-화학적 가공공정을 이용한 미세탐침 기반의 나노리소그래피 기술(Mechano-Chemical Scaning Probe based Lithography; MC-SPL)은 기존의 포토리소그래피 공정의 단점을 극복하고, 보다 경제적이며 패턴 디자인 변경이 유연한 미세 패턴 제작 기술임이 확인되었다.(중략)

  • PDF

AFM기반 기계적 TNL 패터닝을 통한 PDMS 몰드제작 (Fabrication of PDMS Mold by AFM Based Mechanical TNL Patterning)

  • 정윤준;박정우
    • 한국생산제조학회지
    • /
    • 제22권5호
    • /
    • pp.831-836
    • /
    • 2013
  • This study demonstrates the process of fabricating patterns using tribonanolithography (TNL),with laboratory-made micro polycrystalline diamond (PCD) tools that are attached to an atomic force microscope (AFM). The various patterns are easily fabricated using mechanical scratching, under various normal loads, using the PCD tool on single crystal silicon, which is the master mold for replication in this study. Then, polydimethylsiloxane (PDMS) replica molds are fabricated using precise pattern transfer processes. The transferred patterns show high dimensional accuracy as compared with those of TNL-processed silicon micro molds. TNL can reduce the need for high cost and complicated apparatuses required for conventional lithography methods. TNL shows great potential in that it allows for the rapid fabrication of duplicated patterns through simple mechanical micromachining on brittle sample surfaces.

나노 스케일 가상환경에서의 나노-원격 조작의 임피던스 스케일링에 관한 연구 (A Study on the Impedance Scaled Tele-Nanomanipulation in a Nanoscale Virtual Environment)

  • 김성관
    • 대한기계학회논문집A
    • /
    • 제30권11호
    • /
    • pp.1401-1407
    • /
    • 2006
  • In a haptic interface system with a nanoscale virtual environment (NVE) using an atomic force microscope (AFM), impedance scaling is important. In order to explicitly derive the relationship between performance and impedance scaling factors, a nanoscale virtual coupling (NSVC) concept and a selection method of scaling factors of velocity (or position) and force are introduced. An available scaling factor region is represented based on Llewellyn's absolute stability criteria and the physical limitation of the haptic device. Experiments have been performed for tele-nanomanipulation tasks such as positioning, indenting and nanolithography with available force scaling factor in the NVE.

DNA 기반 금속 나노 와이어의 제작기술 (DNA Metallization for Nanoelectronics)

  • 한경엽;이정규
    • 공업화학
    • /
    • 제29권3호
    • /
    • pp.253-257
    • /
    • 2018
  • DNA를 기반으로 한 금속 나노와이어는 전기적인 물성은 떨어지지만, 제작 방식이 간단하고, 대면적에서 대량으로 제작할 수 있으며, 유기 반응을 통해 분자 소자 제작의 기판으로도 사용가능한 차세대 재료로 전망된다. 본 총설에서는 DNA 금속화 반응을 이용한 나노와이어의 제작 및 3차원 구조체의 제작 기술에 대해 소개하고, 이와 관련한 연구 현황과 발전 방향에 대해 논의하고자 한다.

FIB 밀링을 이용한 나노스텐실 제작 및 나노패터닝 (Fabrication of nanostencil using FIB milling for nanopatterning)

  • 정성일;오현석;김규만
    • 한국정밀공학회지
    • /
    • 제23권3호
    • /
    • pp.56-60
    • /
    • 2006
  • A high-resolution shadow mask, or called a nanostencil was fabricated for high resolution lithography. This high-resolution shadowmask was fabricated by a combination or MEMS processes and focused ion beam (FIB) milling. 500 nm thick and $2{\times}2mm$ large membranes wore made on a silicon wafer by micro-fabrication processes of LPCVD, photolithography, ICP etching and bulk silicon etching. A subsequent FIB milling enabled local membrane thinning and aperture making into the thinned silicon nitride membrane. Due to the high resolution of the FIB milling process, nanoscale apertures down to 70 nm could be made into the membrane. By local deposition through the apertures of nanostencil, nanoscale patterns down to 70 nm could be achieved.

FIB 밀링을 이용한 나노스텐실 제작 (Nanostencil fabrication using FIB milling)

  • 김규만;정성일;오현석
    • 한국정밀공학회:학술대회논문집
    • /
    • 한국정밀공학회 2004년도 추계학술대회 논문집
    • /
    • pp.871-874
    • /
    • 2004
  • Fabrication of a high-resolution shadow mask, or called nanostencil, is presented. This high-resolution shadowmask is fabricated by a combination of MEMS processes and focused ion beam (FIB) milling. 500 nm thick and 2x2 mm large membranes are made on a silicon wafer by micro-fabrication processes of LPCVD, photolithography, ICP etching and bulk silicon etching. Subsequent FIB milling enabled local membrane thinning and aperture making into the thinned silicon nitride membrane. Due to high resolution of FIB milling process, nanoscale apertures down to 70 nm could be made into the membrane.

  • PDF

유도결합형 플라즈마 식각공정을 통해 제작된 460 nm 격자를 갖는 나노 광결정 특성 (Fabrication of Nano-photonic Crystals with Lattice Constant of 460-nm by Inductively-coupled Plasma Etching Process)

  • 최재호;김근주
    • 반도체디스플레이기술학회지
    • /
    • 제5권2호
    • /
    • pp.1-5
    • /
    • 2006
  • The GaN thin film on the 8 periods InGaN/GaN multi-quantum well structure was grown on the sapphire substrate using metal-organic chemical vapor deposition. The nano-scaled triangular-lattice holes with the diameter of 150 nm were patterned on a polymethylmethacrylate blocking film using an electron beam nano-lithography system. The thin slab and two-dimensional photonic crystals with the thickness of 28 nm were fabricated on the GaN layer for the blue light diffraction sources. The photonic crystal with the lattice parameter of 460 nm enhances spectral intensity of photoluminescence indicating that the photonic crystals provides the source of nano-diffraction for the blue light of the 450-nm wavelength.

  • PDF

Nanostructure Fabrication using Dip-pen Nanolithography

  • Lee, Seung-Woo;Mirkin Chad A.
    • 한국고분자학회:학술대회논문집
    • /
    • 한국고분자학회 2006년도 IUPAC International Symposium on Advanced Polymers for Emerging Technologies
    • /
    • pp.285-285
    • /
    • 2006
  • The ionic layer-by-layer (LBL) assembled films can be formed by sequentially dipping of substrates to oppositely charged polyions solution in the multilayer, called polyelectrolytes multilayer (PEM) films. Easy way of these assemblies of charged polymers offer the ability to adjust important parameters such as controllability of thickness in the nanometer-scale level and functionality of most top layer of PEM films. Nevertheless, we do not know of any trials to fabricate PEM organic films into nanometer size. Herein, we show the integration of the LBL technique with DPN in fabricating nanometer size patterns of multilayered polyelectrolyte structures. Through the use of single and multiple cantilever AFM probes, we demonstrate the parallel writing capabilities of DPN.

  • PDF

Synthesizing Dendronized Linear Polymers using "Click Chemistry"

  • Mynar Justin L.;Helms Brett;Hawker Craig J.;Frechet Jean M.J.
    • 한국고분자학회:학술대회논문집
    • /
    • 한국고분자학회 2006년도 IUPAC International Symposium on Advanced Polymers for Emerging Technologies
    • /
    • pp.317-317
    • /
    • 2006
  • Dendronized linear polymers have recently come forward as new materials for nanoscale applications. These "molecular cylinders" may be modified with specific chemical makeup, rigidity, surface decoration, and backbone properties much like their spherical analogs, dendrimers. There exist three main synthetic pathways to yield dendronized polymers: (i) graft-to; (ii) graft-from; and (iii) macromonomer. We present an efficient "graft-to" approach towards dendronized microstructures utilizing click chemistry. With the capacity to manipulate their chemical composition, these dendronized structures have already found broad use in site-isolation for catalysis, nanolithography and organic light emitting diodes. These and other potential applications of these materials will be also presented.

  • PDF