• 대한기계학회:학술대회논문집
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• 대한기계학회 2003년도 춘계학술대회
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• pp.1043-1047
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• 2003

With the advancement of micro-systems and nanotechnology, the need for ultra-precision fabrication techniques has been steadily increasing. In this paper, a novel nano-structure fabrication process that is based on the fundamental understanding of nano-scale tribological interaction is introduced. The process, which is called Mechano-Chemical Scanning Probe Lithography (MC-SPL), has two steps, namely, mechanical scribing for the removal of a resist layer and selective chemical etching on the scribed regions. Organic monolayers are used as a resist material, since it is essential for the resist to be as thin as possible in order to fabricate more precise patterns and surface structures. The results show that high resolution patterns with sub-micrometer scale width can be fabricated on both silicon and various metal surfaces by using this technique.

• Nano
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• 제13권10호
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• pp.1850120.1-1850120.9
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• 2018

Two-dimensional poly(dimethylsiloxane) (PDMS) films with wavy patterns were studied in order to investigate reversible and irreversible wetting effects. Pre-strained, surface oxidized layers of PDMS were used to form relieved wavy geometries, on which hydrophobic functionalization was carried out in order to produce irreversible wetting effects. Wavy-patterned PDMS films showed time-dependent reversible wetting effects. The degree of surface wettability could be tuned by the choice of wavy groove geometries. And the groove geometries were controlled via $O_2$ plasma treatment and mechanical pre-straining. The pre-strained, buckled PDMS films were applied to the fabrication of hydrophobic polystyrene nano-patterns using colloidal self-assembly, where the colloids were arrayed in two-dimensional way. The wavy polystyrene films were found to be more hydrophobic relative to flat polystyrene films. The grooving methodology used in this study could be applied to enhancing the hydrophobicity of other types of polymeric thin films, eliminating the need for chemical treatment.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2005년도 춘계학술대회 논문집
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• pp.1489-1492
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• 2005

Compared to other nano-patterning techniques, Nano imprint Lithography (NIL) has some advantages of high throughput and low process cost. To imprint low temperature and pressure, UV Nano imprint Lithography, which using the monomer based UV curable resin is suggested. Because fabrication of high fidelity pattern on topographical substrate is difficult, bi-layer Nano imprint lithography, which are consist of easily removable under-layer and imprinted pattern, is being used. If residual layer is not remained after imprinting, and under-layer is removed by oxygen RIE etching, we might be able to fabricate the bi-layer pattern for easy lift-off process.

• 소성∙가공
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• 제20권1호
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• pp.23-28
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• 2011

For the fabrication of nano patterned products manufacturing a nano patterned mold is needed in advance. The nano patterned stamper was fabricated by electroforming the AAO master with nickel. The surface of nickel-plated stamper had nano-patterned holes with the diameter of 73 nm and the depth of 83 nm. Hot embossing was used for forming P3HT sheet and the process factors of hot embossing were closer as pressure, temperature and time. In the present paper hot embossing experiments were performed to find the main process conditions to affect the replication ratio of nano patterns on surface of P3HT sheet. As a result, main contributing factors for the replication ratio of hot embossed pattern could be sequentially enumerated as pressure, temperature and time.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2003년도 춘계학술대회 논문집
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• pp.196-198
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• 2003

Classical lithography in semiconductor employs stepper technologies. Limits of this technology are clearly seen at structures below 100nm. Nano-imprinting lithography is a new method for generating patterns in submicron range at reasonable cost. In order to manufacture nano-imprinting lithography(NIL) equipment, several NIL manufacturers have been developing key technologies for realization of nano-imprinting process, recently. In this paper, we've been describe state-of-the-art and technology trends for nano-imprinting lithography equipments.

• 한국정밀공학회지
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• 제26권6호
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• pp.30-35
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• 2009

• 한국산학기술학회논문지
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• 제7권6호
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• pp.1047-1055
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• 2006

필드이온빔(FIB) 가공기를 써서 초고강도의 벌크다이아몬드를 가공하기 위해 이온 소오스의 종류와 가공 조건에 따른 나노급 미세 선폭의 최적조건을 알아보고 이에 근거한 2차원적인 텍스트의 가공과 3차원적인 박막요소의 가공을 시도하였다. 다이아몬드 기판과 실리콘 기판을 Ga과 $H_2O$ 소오스를 이용하는 FIB를 써서 30 kV 빔 전류를 10 pA $\sim$ 5 nA로 변화시키면서 패터닝하고 이때 각각 20 ${\mu}m$ 길이로 생성되는 선형 패턴의 선폭, 깊이, 에치속도, 에치형상, 깊이선폭비 (aspect ratio)를 확인하였다. 다이아몬드도 실리콘 기판과 마찬가지로 나노급 패턴의 형성이 가능하였다. $H_2O$ 소오스를 채용한 경우가 에치 깊이가 2배 정도 증가하였으며 동일한 가공 조건에서는 실리콘에 비해 다이아몬드의 에치 선폭이 감소는 경향이 있었다. 특히 다이아몬드는 절연성 때문에 차지가 축적되어 가공 중 이온빔이 불안정해지는 문제가 있었으나 차지 중화 모드를 이용하여 성공적으로 sub-100 nm급 선폭의 미세 가공이 가능하였다. 확인된 선폭가공 조건에 근거하여 2차원적으로 0.3carat의 보석용 다이아몬드의 거들부에 300여개의 글자를 FIB를 활용하여 선폭 240 nm정도로 명확히 기록하는 것이 가능하였다. $Ga^+$이온과 30 eV-30 pA로 조건에서 비교적 넓은 선폭과 Z축 depth 고정범위에서 많은 개인정보의 기록이 영구적으로 가능하였으며 전자현미경으로 재생이 가능하였다. 3차원적으로 두께 $1{\mu}m$의 박막요소를 FIB가공과 백금 용접으로 떼어낸 후 FIB가공으로 두께가 100 nm가 되도록 한 후 투과전자현미경을 이용하여 성분 분석을 하는 것이 성공적으로 수행될 수 있었다.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2013년도 춘계학술대회 논문집
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• pp.143-144
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• 2013

• 한국소성가공학회:학술대회논문집
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• 한국소성가공학회 2009년도 추계학술대회 논문집
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• pp.217-220
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• 2009

This paper presents fabrication method of nano-structured PMMA substrates as well as evaluations of their optical transmittance. For anti-reflective surface, surface coating method had been conventionally used. However, it requires high cost, complicated process and post-processing times. In this study, we suggested the fabrication method of anti-reflective surface by the hot embossing process. Using the nano patterned master fabricated by anodic aluminum oxidation process. Anodic aluminum oxide(AAO) is widely used as templates or a molds for various applications such as carbon nano tube (CNT), nano rod and nano dots. Anodic aluminum oxidation process provides highly ordered regular nano-structures on the large area, while conventional pattering methods such as E-beam and FIB can fabricate arbitrary nano-structures on small area. We fabricated a porous alumina hole array with various inter-pore distance and pore diameter. In order to replicate nano-structures using alumina nano hole array patterns, we have carried out hot-embossing process with PMMA substrates. Finally the nano-structured PMMA substrates were fabricated and their optical transmittances were measured in order to evaluate the charateristivs of anti-reflection. Anti-reflective structure can be applied to various displays and automobile components.

• 한국정밀공학회지
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• 제27권10호
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• pp.93-99
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• 2010

A nano-stereolithography is the direct patterning process with a nanoscale resolution using twophoton absorption induced by a femtosecond laser. However, in the majority of the works, the fabrication of 3D microstructures have been done only onto transparent glass due to the use of an oil immersion objective lens for achieving a high resolution. In this work, the coaxial illumination and the auto-focusing system are proposed for the direct patterning of nano-precision patterns on an opaque substrate such as a silicon wafer and a metal substrate. Through this work, 3D polymer structures and metallic patterns are fabricated on a silicon wafer using the developed process.