• 한국생산제조학회지
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• 제22권3호
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• pp.480-487
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• 2013

In this study, we researched the LED source MR16,which maintains the strong points of an ordinary MR16 while compensating for its weak points. The optical system composition of the LED MR16 includes four aspherical lens per sheet and a patterned reflector. The aspherical optical system and reflector were designed using optical software, and the performance was estimated using a lighting simulation program. Finally, a prototype was manufactured after analyzing the simulation data, and the reliability of the simulation results was estimated using a comparative analysis of the designed data and measured data.

• 한국정밀공학회지
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• 제23권12호
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• pp.128-134
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• 2006

Two-dimensional nano-patterns are fabricated using immersion holographic lithography. The photoresist layer is exposed to an interference pattern generated by two incident laser beams($\lambda$=441.6 nm, He-Cd laser) of which the pitch size is less than 200 nm. Good surface profiles of the 2 dimensional patterns are achieved by trimming the lithography process parameters, such as, exposure time, developing time and refractive index of medium liquid.

• Journal of the Optical Society of Korea
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• 제20권2호
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• pp.245-250
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• 2016

In this paper, we demonstrate a self-imaging technique that can visualize longitudinal interference patterns behind periodically-structured objects, which is often referred to as Talbot carpet. Talbot carpet is of great interest due to ever-decreasing scale of interference features. We demonstrate experimentally that Talbot carpets can be imaged in a single exposure configuration revealing a broad spectrum of multi-scale features. We have performed rigorous diffraction simulations for showing that Talbot carpet print can produce ever-decreasing structures down to limits set by mask feature sizes. This demonstrates that large-scale pattern masks may be used for direct printing of features with substantially smaller scales. This approach is also useful for characterization of image sensors and recording media.

• Bulletin of the Korean Chemical Society
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• 제26권4호
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• pp.553-557
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• 2005

The formation of striped phases of unsymmetric hexyl octadecyl disulfide ($CH_3(CH_2)_5SS(CH_2)_{17}CH_3$, HOD) and 1-hydroxyundecyl octadecyl disulfide ($CH_3(CH_2)_{17}SS(CH_2)_{11}$OH, HUOD) on Au(111) and graphite has been investigated by scanning tunneling microscopy (STM) to understand the self-assembly processes of dialkyl disulfides. STM imaging clearly shows the formation of striped phases having corrugation periodicities that are nearly consistent with the molecular length of alkanethiolate moieties formed after the S-S bond cleavage of dialkyl disulfide on a gold surface. On the other hand, self-assembled monolayers (SAMs) of dialkyl disulfides on a graphite surface displayed long-range, well-ordered monolayers with one striped pattern that shows periodicity as a function of molecular length via nondissociative adsorption. From a nonoscopic viewpoint, we have clearly demonstrated that dialkyl disulfide SAMs on gold form via S-S bond cleavage of disulfide.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2003년도 춘계학술대회
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• pp.1030-1035
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• 2003

The nanoimprint lithography technology makes higher density of semiconductor device and larger capacity of storage media. In this technology the induced damage while detaching polymer pattern from mold should be minimized. In order to analyze the problem, the basic knowledge of adhesion between the polymer and the mold is required. In this study a contact experiment of polyisobutylene specimen with spherical steel tip and polyisobutylene bead tip was conducted using nano indenter. During the contact experiment with various loading rate under load control the contact behavior of viscoelastic material was measured, i.e., the load and displacement between the tip and the specimen were measured. The data was analyzed by HBK model to obtain the stress intensity factor of contact edge and the contact radius as a function of time. Also the adhesion energies between steel/polyisobutylene and polyisobutylene/polyisobutylene were obtained employing the analysis of the crack of viscoelastic material by Schapery.

• 한국기계가공학회지
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• 제12권1호
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• pp.104-109
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• 2013

In order to apply nano imprint technology in large area process, roller pressing is promising because of its low cost and high productivity. When pressing mold by roller, liquid resin is locally squeezed between mold and substrate. In this study, the main focus is to understand which process parameter affects residual layer. To do this, a simple analytical model was introduced. Especially, we consider the aspect ratio of patterns as essential cause of variation of the thickness in the equation. As a result, when the aspect ratio of pattern in the mold increases, the thickness of residual layer also increases. In conclusion, we show that the uniformity of residual layer could be accomplished by the control of velocity and pressing force in roller pressing imprint process.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1999년도 추계학술대회 논문집 학회본부 C
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• pp.1160-1163
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• 1999

In this study, we developed FE-tip lithography system that could apply to multi-tip system and did lithography using FE-tip. The software that control FE-tip lithography system, was proposed for acquiring more adaptive data to compensate the effect of fluctuation. We found that the fluctuation effect was reduced. The minimum line width was related to applied voltage and we observed a movement of Z-axis piezo stage to correct the error of this system. When FE current was 5nA, scanning speed was $3{\mu}m/sec$ and applied voltage was 200V, we made a line pattern which had minimum line width of 614 nm. If we reduce applied voltage to several decades and increase scanning speed to $20{\mu}m/sec$, it is possible to set the minimum line width of 100 nm. The proposed system can be easily applied to multi FE-tip lithography system.

• 진공이야기
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• 제2권2호
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• pp.17-23
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• 2015

Medium Energy Ion Scattering (MEIS) has been successfully used for ultrathin film analysis such as gate oxides and multilayers due to its single atomic depth resolution in compostional and structural depth profiling. Recently, we developed a time-of-flight (TOF) MEIS for the first time, which can analyze a $10{\mu}m$ small spot. Small spot analysis would be useful for test pattern analysis in semiconductor industry and various thin film technology. The ion beam damage problem is minimized due to its improved collection efficiency by orders of magnitude and the ion beam neutralization problem is removed completely for quantitative analysis. Newly developed TOF-MEIS has been applied for gate oxides, ultra shallow junctions, nanoparticles, FINFET structures to provide compositional and structural profiles. Further development for submicron spot analysis and applications for functional nano thin films and nanostructured materials are expected for various nanotechnology and biotehnology.

• 센서학회지
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• 제19권6호
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• pp.475-482
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• 2010

Rogowski coil which detects magnetic flux on current changes. It is used for digital integration with watt-hour meter's current sensor, because, Rogowski coil has non-cored or non-magnetic core structure, so that, it cannot be saturated magnetically. This is a study for inventing accurate electric current sensors that have been applied on multi-layer ceramic substrate. We have confirmed its properties from each different layer's materials and pattern sizes by MWS 3D Electromagnetic field analysis program. And, after sensor manufacturing on multi-layer ceramic substrate, we confirmed its sensing quality is reliable as accurate electric current sensor for watt-hour meter.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2007년도 Techno-Fair 및 추계학술대회 논문집 전기물성,응용부문
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• pp.156-157
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• 2007

나노임프린팅 기술을 이용하여 원기둥형 나노 패턴을 갖는 도광판을 제작하였다. 나노 임프린트 공정을 이용하기 위해서는 니켈 스탬퍼가 필요하기 때문에 이를 제작하기 위하여 실리콘 웨이퍼 상에 건식식각을 이용하여 실리콘 몰드를 제작하였다. 제작된 실리콘 몰드를 전주도금을 이용하여 니켈 스탬퍼를 제작하였다. 제작된 니켈 스탬퍼를 사용한 나노임프린트 공정을 통해 원기둥 나노패턴을 갖는 도광판을 제작하였다.