Journal of the Korean Society for Precision Engineering (한국정밀공학회지)

Korean Society for Precision Engineering (한국정밀공학회)
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Two-dimensional Nano-patterning with Immersion Holographic Lithography

액침 홀로그래픽 리소그래피 기술을 이용한 2 차원 나노패터닝

  • 김상원 (연세대학교 기계공학과 나노광자공학 연구실) ;
  • 박신증 (연세대학교 기계공학과 나노광자공학 연구실) ;
  • 강신일 (연세대학교 기계공학과 나노성형및광부품기술 연구실) ;
  • 한재원 (연세대학교 기계공학과 나노광자공학 연구실)
  • Published : 2006.12.01
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Abstract

Two-dimensional nano-patterns are fabricated using immersion holographic lithography. The photoresist layer is exposed to an interference pattern generated by two incident laser beams($\lambda$=441.6 nm, He-Cd laser) of which the pitch size is less than 200 nm. Good surface profiles of the 2 dimensional patterns are achieved by trimming the lithography process parameters, such as, exposure time, developing time and refractive index of medium liquid.

Keywords

References

  1. Mulkens, J., Flagello, D., Streetkerk, B. and Graeupner, P., 'Benefits and limitations of immersion lithography, ' J. Microlith., Microfab., Microsyst., Vol. 3, No. 1, pp. 104-114, 2004 https://doi.org/10.1117/1.1636768
  2. Lin, B. J., 'Immersion lithography and its impact on semiconductor manufacturing,' J. Microlith., Microfab., Microsyst., Vol. 3, No.3, pp. 377-395, 2004 https://doi.org/10.1117/1.1756917
  3. Gunawan, O., Hoe, L. W., Ooi, B. S., Chan, Y. C., Lam, Y. L. and Zhou Y., 'Development of a Laser Holographic fretnIεeener Lithography system,' Proc. of SPIE, Vol. 3896, pp. 515-522, 1999 https://doi.org/10.1117/12.370356
  4. Heng, M., Ho, B. C. P., Yamaguchi, R., Yoshioka, K. and Yaegashi, H., 'Optical Coupling of Lens， Liquid and Resist in Immersion Lithography: Rigorous Model and Assessment,' Proc. of SPIE, Vol. 5377, pp. 405-414, 2004 https://doi.org/10.1117/12.537443
  5. Su, H. M., Zhong, Y. C., Wang, X., Zheng, X. G., Xu, J. F. and Wang, H. Z., 'Effects of polarization on laser holography for microstructure fabrication,' Phys. Rev. E, Vol. 67, pp. (056619)1-6, 2003 https://doi.org/10.1103/PhysRevE.67.056619
  6. Adam, K. and Maurer, W., 'Polarization Effects in Immersion Lithography,' Proc. of SPIE, Vol. 5377, pp. 329-343, 2004 https://doi.org/10.1117/12.534322
  7. Farhound, M., Ferrera, J., Lochtefeld, A. J., Murphy, T. E., Schattenburg, M. L., Carter, J., Ross, C. A. and Smith, H. I., 'Fabrication of 200 nm period nano magnet arrays using interference lithography and a negative resist,' J. Vac. Sci. Technol. B, Vol. 17, No.6, pp. 3182-3185, 1999 https://doi.org/10.1116/1.590976
  8. Hoffnagle, J. A., Hinsberg, W. D., Sanchez, M. and Houle, F. A., 'Liquid immersion deep-ultraviolet int erferometric lithography,' J. Vac. Sci. Technol. B, Vol. 17, No.6, pp. 3306-3309, 1999 https://doi.org/10.1116/1.591000