• Title/Summary/Keyword: Nano Machining

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Optimization of Nano Machining Parameters Using Acoustic Emission and the Taguchi Method (음향방출과 다구찌 방법을 이용한 나노머시닝 가공조건의 최적화)

  • 이성환;손정무
    • Journal of the Korean Society for Precision Engineering
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    • v.21 no.3
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    • pp.163-170
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    • 2004
  • Atomic force microscope (AFM) techniques are increasingly used fur tribological studies of engineering surfaces at scales ranging from atomic and molecular to micro-scale. Recently, AFM with suitable tips is being used for nano fabrication/nano machining purposes. In this paper, machining characteristics of silicon were investigated by nano indentation and nano scratch. Nano-scale material removal mechanisms are studied and the Taguchi method was introduced to acquire optimum parameters for nano machining. Also, Acoustic Emission (AR) is used for the monitoring of nano machining.

Experimental study of filamentation using ultra fast pulse laser in transparent material (극초단 펄스 레이저를 사용한 유리 내부의 필라멘테이션에 대한 실험적 연구)

  • Choi, Won-Suk;Yoon, Ji-Wook;Kim, Joohan;Choi, Jiyeon;Chang, Won-Seok;Kim, Jae-Goo;Choi, Doo-Sun;Whang, Kyoung Hyun;Cho, Sung-Hak
    • Laser Solutions
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    • v.16 no.1
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    • pp.5-9
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    • 2013
  • We have successfully formed filament inside of a transparent soda-lime glass using a Ti:sapphire based femtosecond laser. To make filament form, keeping the laser intensity higher than critical intensity is essential. Also each of the machining parameters plays an important role for the formation of filament. In this paper, we study what parameter can possibly influence for formation of filament, and we introduce an application using filamentation by femtosecond laser for transparent material.

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Development of Nano Machining Technology using Focused ion Beam (FIB를 이용한 나노가공공정 기술 개발)

  • 최헌종;강은구;이석우;홍원표
    • Proceedings of the Korean Society of Machine Tool Engineers Conference
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    • 2004.04a
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    • pp.482-486
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    • 2004
  • The application of focused ion beam (FIB) technology in micro/nano machining has become increasingly popular. Its use in micro/nano machining has advantages over contemporary photolithography or other micro/nano machining technologies, such as small feature resolution, the ability to process without masks and being accommodating for a variety of materials and geometries. This paper presents that the recent development and our research goals in FIB nano machining technology are given. The emphasis will be on direct milling, or chemical vapor deposition techniques (CVD), and this can distinguish the FIB technology from the contemporary photolithography process and provide a vital alternative to it. After an introduction to the technology and its FIB principles, the recent developments in using milling or deposition techniques for making various high-quality devices and high-precision components at the micro/nano meter scale are examined and discussed. Finally, conclusions are presented to summarize the recent work and to suggest the areas for improving the FIB milling technology and for studying our future research.

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Electron beam lithography patterning research for stamper fabrication using nano-injection molding (나노사출성형용 스탬퍼 제작을 위한 Electron beam lithography 패터닝 연구)

  • Uhm S.J.;Seo Y.H.;Yoo Y.E.;Choi D.S.;Je T.J.;Whang K.H.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2005.10a
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    • pp.698-701
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    • 2005
  • We have investigated experimentally a nano patterning using electron beam lithography for the nickel stamper fabrication. Recently, DVD and Blu-ray disk(BD) have nano-scale patterns in order to increase the storage density. Specially, BD has 100nm-scale patterns which are generally fabricated by electron beam lithography. In this paper, we found optimum condition of electron-beam lithography for 100nm-scale patterning. We controlled various conditions of EHP(acceleration voltage), beam current, dose and aperture size in order to obtain optimum conditions. We used 100nm-thick PMMA layer on a silicon wafer as photoresist. We found that EHP was the most dominant factor in electron-beam lithography.

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Micro-machining inside of a transparent glass (투명유리 내부의 컬러 미세형상 가공)

  • Kim Y.M.;Yoo B.H.;Cho S.H.;Chng W.S.;Kim J.G.;Whang K.H.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2006.05a
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    • pp.209-210
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    • 2006
  • We have successfully termed brown colored patterns inside of a transparent borosilicate glass generally known as BK7, laying the focus of near infrared Ti: sapphire femtosecond laser beam in the bulk BK7 glass. It is important to keep the laser power well below the damage threshold of BK7 in forming the color center. Thanks to the low laser power, there was no laser induced mechanical damage such as cracks or threads in the color formed area. From the absorbance spectrum and its gaussian fitting, we found the band gap of BK7, 4.21eV, and three absorption edges.

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Study the effect of machining process and Nano Sio2 on GFRP mechanical performances

  • Afzali, Mohammad;Rostamiyan, Yasser
    • Structural Engineering and Mechanics
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    • v.76 no.2
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    • pp.175-191
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    • 2020
  • In this study, the effect of Nano silica (SiO2) on the buckling strength of the glass fiber reinforced laminates containing the machining process causes holes were investigated. The tests have been applied on two status milled and non-milled. To promote the mechanical behavior of the fiber-reinforced glass epoxy-based composites, Nano sio2 was added to the matrix to improve and gradation. Nano sio2 is chosen because of flexibility and high mechanical features; the effect of Nanoparticles on surface serenity has been studied. Thus the effect of Nanoparticles on crack growth and machining process and delamination caused by machining has been studied. We can also imply that many machining factors are essential: feed rate, thrust force, and spindle speed. Also, feed rate and spindle speed were studied in constant values, that the thrust forces were studied as the main factor caused residual stress. Moreover, entrance forces were measured by local calibrated load cells on machining devices. The results showed that the buckling load of milled laminates had been increased by about 50% with adding 2 wt% of silica in comparison with the neat damaged laminates while adding more contents caused adverse effects. Also, with a comparison of two milling tools, the cylindrical radius-end tool had less destructive effects on specimens.

Color modification inside a transparent glass(BK7) using a femtosecond laser (펨토초 레이저 기반 투명유리(BK7) 내부의 컬러 미세형상 가공)

  • Kim, Hoon-Young;Yoon, Ji-Wook;Choi, Won-Seok;Park, Jung-Kyu;Choi, Ji-Yeon;Kim, Jae-Goo;Whang, Kyoung-Hyun;Cho, Sung-Hak
    • Laser Solutions
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    • v.15 no.3
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    • pp.16-19
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    • 2012
  • We have successfully formed brown colored patterns inside of a transparent borosilicate glass generally known as BK7, laying the focus of near infrared Ti: sapphire femtosecond laser beam in the bulk BK7 glass. It is important to keep the laser power well below the damage threshold of BK7 in forming the color center. According to the low laser power, there was no laser induced mechanical damage such as cracks or threads in the color formed area. From the absorbance spectrum and its gaussian fitting, we found the band gap of BK7, 4.21eV, and three absorption edges.

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Thin Film Micromachining Using Femtosecond Laser Photo Patterning of Organic Self-assembled Monolayers

  • Chang Won-Seok;Choi Moo-Jin;Kim Jae-Gu;Cho Sung-Hak;Whang Kyung-Hyun
    • International Journal of Precision Engineering and Manufacturing
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    • v.7 no.1
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    • pp.13-17
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    • 2006
  • Self-Assembled Monolayers (SAMs) formed by alkanethiol adsorption to thin metal film are widely being investigated for applications as coating layer for anti-stiction or friction reduction and in fabrication of micro structure of molecules and bio molecules. Recently, there have been many researches on micro patterning using the advantages of very thin thickness and etching resistance of Self-Assembled Monolayers in selective etching of thin metal film. In this report, we present the several machining method to form the nanoscale structure by Mask-Less laser patterning using alknanethiolate Self-Assembled Monolayers such as thin metal film etching and heterogeneous SAM structure formation.