• 한국태양에너지학회 논문집
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• 제31권1호
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• pp.107-114
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• 2011

Two-step thermochemical cycle using ferrite-oxide($Fe_3O_4$) device was investigated. The $H_2O$(g) was converted into $H_2$ in the first experiment which was performed using a dish type solar thermal system. However the experiment was lasted only for 2 cycles because the metal oxide device was sintered and broken down. Another problem was that the reaction was taken place mainly on a side of the metal oxide device. The $m-ZrO_2$, which was widely known as a material preventing sintering, was applied on the metal oxide device. The ferrite loading rate and the thickness of the metal oxide device were increased from 10.67wt% to 20wt% and from 10mm to 15mm, respectively. The chemical reactor having two inlets was designed in order to supply the reactants uniformly to the metal oxide device. The second-experiment was lasted for 5 cycles, which was for 6 hours. The total amount of the $H_2$ production was 861.30mL.

• Bulletin of the Korean Chemical Society
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• 제18권9호
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• pp.1028-1031
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• 1997

Electrostatic interaction is a very important parameter for the membrane selectivity. In this work, the electrical double layer establishment on the surface of metal oxide material from the Stern-Grahame model has been described. Then, some examples of rejection using micro and mesoporous ceramic membranes have been given. A correlation between the charges of the membrane material and the species to be filtered has been precised. Two rejection mechanisms have to be taken into account the size of the solutes and the electrostatic interactions.

• 한국전기전자재료학회논문지
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• 제28권3호
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• pp.185-190
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• 2015

In this study, we fabricated the indium gallium zinc oxide (IGZO), zinc oxide (ZnO), aluminum zinc oxide (AZO). oxide and silver are deposited by magnetron sputtering and thermal evaporator, respectively transparency and energy bandgap were changed by the thickness of silver layer. To fabricate metal oxide metal (OMO) structure, IGZO sputtered on a corning 1,737 glass substrate was used as bottom oxide material and then silver was evaporated on the IGZO layer, finally IGZO was sputtered on the silver layer we get the final OMO structure. The radio-frequency power of the target was fixed at 30 W. The chamber pressure was set to $6.0{\times}10^{-3}$ Torr, and the gas ratio of Ar was fixed at 25 sccm. The silver thickness are varied from 3 to 15 nm. The OMO thin films was analyzed using XRD. XRD shows broad peak which clearly indicates amorphous phase. ZnO, AZO, OMO show the peak [002] direction at $34^{\circ}$. This indicate that ZnO, AZO OMO structure show the crystalline peak. Average transmittance of visible region was over 75%, while that of infrared region was under 20%. Energy band gap of OMO layer was increased with increasing thickness of Ag layer. As a result total transmittance was decreased.

• 대한의용생체공학회:의공학회지
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• 제30권3호
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• pp.199-204
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• 2009

Iridium oxide films (IROFs) have been extensively studied as a material for electrical stimulation of neurons, as iridium oxide has higher charge storage capacity than other metal films. More recently, sputtered iridium oxide film (SIROF) has been studied, because it can be made more conveniently than activated iridium oxide film (AIROF). Typically, the SIROFs are grown at temperatures from 400 to 600 $^{\circ}C$. However, such high temperatures cannot be used when the iridium oxide (IrOx) film is to be deposited on a flexible polymer material, such as polyimide. In this paper, we show that we can still obtain excellent characteristics in SIROFs grown without heating (cold SIROF), by optimizing the growth conditions. We show that the oxygen flow rate is a critical parameter for controlling the surface properties of a cold SIROF. At an oxygen flow rate of 12 seem, the cold SIROF exhibited a charge storage capacity (CSC) of 60 mC/cm$^2$, which is comparable to or better than other published values for iridium oxide films including heated SIROFs. The film produced under these conditions also had the minimum impedance value of all cold SIROFs deposited for this study. A stability test and biocompatibility test also demonstrated the superiority of the optimized cold SIROF.

• 한국수소및신에너지학회논문집
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• 제14권3호
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• pp.258-267
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• 2003

A new kind of oxygen carrier material is tested for chemical-looping combustion. NiO, CoO, $Fe_2O_3$ is chosen as metal oxide and YSZ as a binder. Hydrogen fuel is reacted with metal oxide (reduction of metal oxide) and then the reduced metal is successively oxidized by air. Dissolution method is examined to prepare the oxygen carriers. The effects of reaction temperature are measured by a TGA, mechanical strength and regenerability after 10 cycle are examined. $Fe_2O_3/YSZ$ oxygen carrier is bested in mechanical strength and we consider that NiO/YSZ after 3rd cycle are good oxygen carrier in according to reactor design.

• 방사성폐기물학회지
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• 제19권2호
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• pp.255-266
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• 2021

Solid-state mechanochemical reduction combined with subsequent melting consolidation was suggested as a technical option for the oxide reduction in pyroprocessing. Ni ingot was produced from NiO as a starting material through this technique while Li metal was used as a reducing agent. To determine the technical feasibility of this approach for pyroprocessing, which handles spent nuclear fuels, thermodynamic calculations of the phase stabilities of various metal oxides of U and other fission elements were made when several alkaline and alkali-earth metals were used as reducing agents. This technique is expected to be beneficial, not only for oxide reduction but also for other unit processes involved in pyroprocessing.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 추계학술대회 논문집
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• pp.6-6
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• 2009

We present an alternative process whereby deuterium is delivered to the location where the gate oxide reside by an implantation process. Deuterium ions were implanted using different energies to account for the topography of the overlaying layers and placing the D peak at the top of gate oxide. A short anneal at forming gas was performed to remove the D-implantation damage. We have observed that deuterium ion implantation into the gate oxide region can successfully remove the interface states and the bulk defects.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1997년도 춘계학술대회 논문집
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• pp.314-317
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• 1997

The electrical and physical characteristics of aluminum oxide and Pt thin films on it, deposited by reactive sputtering and DC magnetron sputtering respectively, were analyzed with increasing annealing temperature(400~80$0^{\circ}C$) by four point probe, SEM and XRD. Under $600^{\circ}C$ of annealing temperature, aluminum oxide had the properties of improving Pt adhesion to SiO$_2$and insulation without chemical reaction to Pt thin films and the resistivity of Pt thin films was improved. But these properties of aluminum oxide and Pt thin films on it were degraded over $700^{\circ}C$ of annealing temperature because aluminum oxide was changed into metal aluminum and then reacted to Pt thin films deposited on it. In the analysis of the thermal charateristics of Pt micro-heater fabricated on Si07/si substrate, the temperature of Pt micro-heater is up to 41$0^{\circ}C$ with the power dissipation 1.8 watts.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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• pp.223-224
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• 2008

Important element are low cost, high-efficiency crystalline silicon solar cells. in this paper, Will be able to contribute in low cost, high-efficiency silicon solar cells, Applies oxide/nitride passivation, produced screen-printed solar cells. and the Measures efficiency, and evaluated a justice quality oxide/nitride passivation screen-printed solar cells.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 하계학술대회 논문집
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• pp.331-331
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• 2009

Hafnium oxide ($HfO_2$) attracted by one of the potential candidates for the replacement of si-based oxides. For applications of the high-k gate dielectric material, high thermodynamic stability and low interface-trap density are required. Furthermore, the amorphous film structure would be more effective to reduce the leakage current. To search the gate oxide materials, metal-insulator-metal (MIM) capacitors was fabricated by pulsed laser deposition (PLD) on indium tin oxide (ITO) coated glass with different oxygen pressures (30 and 50 mTorr) at room temperature, and they were deposited by Au/Ti metal as the top electrode patterned by conventional photolithography with an area of $3.14\times10^{-4}\;cm^2$. The results of XRD patterns indicate that all films have amorphous phase. Field emission scanning electron microscopy (FE-SEM) images show that the thickness of the $HfO_2$ films is typical 50 nm, and the grain size of the $HfO_2$ films increases as the oxygen pressure increases. The capacitance and leakage current of films were measured by a Agilent 4284A LCR meter and Keithley 4200 semiconductor parameter analyzer, respectively. Capacitance-voltage characteristics show that the capacitance at 1 MHz are 150 and 58 nF, and leakage current density of films indicate $7.8\times10^{-4}$ and $1.6\times10^{-3}\;A/cm^2$ grown at 30 and 50 mTorr, respectively. The optical properties of the $HfO_2$ films were demonstrated by UV-VIS spectrophotometer (Scinco, S-3100) having the wavelength from 190 to 900 nm. Because films show high transmittance (around 85 %), they are suitable as transparent devices.