• Title/Summary/Keyword: Metal oxide material

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Capacitance-voltage Characteristics of MOS Capacitors with Ge Nanocrystals Embedded in HfO2 Gate Material

  • Park, Byoung-Jun;Lee, Hye-Ryeong;Cho, Kyoung-Ah;Kim, Sang-Sig
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.21 no.8
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    • pp.699-705
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    • 2008
  • Capacitance versus voltage (C-V) characteristics of Ge-nanocrystal (NC)-embedded metal-oxide-semiconductor (MOS) capacitors with $HfO_2$ gate material were investigated in this work. The current versus voltage (I-V) curves obtained from Ge-NC-embedded MOS capacitors fabricated with the $NH_3$ annealed $HfO_2$ gate material reveal the reduction of leakage current, compared with those of MOS capacitors fabricated with the $O_2$ annealed $HfO_2$ gate material. The C-V curves of the Ge-NC-embedded MOS capacitor with $HfO_2$ gate material annealed in $NH_3$ ambient exhibit counterclockwise hysteresis loop of about 3.45 V memory window when bias voltage was varied from -10 to + 10 V. The observed hysteresis loop indicates the presence of charge storages in the Ge NCs caused by the Fowler-Nordheim (F-N) tunneling. In addition, capacitance versus time characteristics of Ge-NC-embedded MOS capacitors with $HfO_2$ gate material were analyzed to investigate their retention property.

Deposition of Spacer-Si3N4 Thin Film for WSi2 Word-Line and Bit-Line (WSi2 word-line 및 bit-line용 spacer-Si3N4 박막의 증착)

  • Ahn S.;Kim D.W.;Kim J.H;Ahn S.J.;Kim Y.J.;Kim H.S.
    • Korean Journal of Materials Research
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    • v.14 no.6
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    • pp.402-406
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    • 2004
  • $WSi_2$, $TiSi_2$, $CoSi_2$, and $TaSi_2$ are general silicides used today in semiconductor devices. $WSi_2$ thin films have been proposed, studied and used recently in CMOS technology extensively to reduce sheet resistance of polysilicon and $n^{+}$ region. However, there are several serious problems encountered because $WSi_2$ is oxidized and forms a native oxide layer at the interface between $WSi_2$ and $Si_3$$N_4$. In this study, we have introduced 20 $slm-N_2$ gas from top to bottom of the furnace in order to control native oxide films between $WSi_2$ and $Si_3$$N_4$ film. In resulting SEM photographs, we have observed that the native oxide films at the surface of $WSi_2$ film are removed using the long injector system.

Sliding We3f Properties for 5%Co-5%V-1%Nb High Speed Steel by Powder Metallurgy at High Temperature (5%Co-5%V-1%Nb 분말고속도공구강의 고온 미끄럼마모특성)

  • 이한영;김용진;배종수
    • Tribology and Lubricants
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    • v.19 no.3
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    • pp.151-158
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    • 2003
  • In metal cutting at the tool-chip interface, friction generates considerable amount of heat. Thus, the knowledge of wear properties of cutting tool material in high temperature has been as one of important factors in need of clarification. The authors presented the wear properties of 5%Co-5%V-1%Nb high speed steel, fabricated by powder metallurgy, in room temperature in previous articles. The objective of this paper is to clarify the effects of temperature on its wear properties. Wear tests in sliding conditions under various temperatures have been conducted using the pin-on-disc type wear test machine. The results indicate that the wear properties of 5%Co-5%V-1%Nb high speed steel in high temperature as well as in room temperature are excellent. It may be deduced that the oxide layer formed on worn surface at high temperature is stable enough to prevent wear due to the high temperature strength of its matrix.

Electrochemical Properties of a Si3N4 Dielectric Layer Deposited on Anodic Aluminum Oxide for Chemical Sensors

  • Jo, Ye-Won;Lee, Sung-Gap;Yeo, Jin-Ho;Lee, Dong-Jin
    • Transactions on Electrical and Electronic Materials
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    • v.17 no.3
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    • pp.159-162
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    • 2016
  • We studied an electrolyte-dielectric metal (EDM) device based on a Si3N4 layer-coated anodic aluminium oxide (AAO) template for chemical sensors. The AAO templates were fabricated using a two-step anodization procedure at 0℃ and 70 V in 0.3 M oxalic acid, after which the Si3N4 was deposited on them using plasma enhanced chemical vapor deposition (PECVD). The average pore size was approximately 106 nm and the depth of the AAO templates was 24.6 nm to 86.5 nm. The Si3N4 layer-coated AAO is more stable than a single AAO template.

Synthesis of Non-hydrate Iron Oleate for Eco-friendly Production of Monodispersed Iron Oxide Nanoparticles

  • Kim, Do Kyung;Lee, Jae Won
    • Journal of the Korean Ceramic Society
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    • v.55 no.6
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    • pp.625-634
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    • 2018
  • In this work, we describe a novel and simple technique to produce non-hydrate surfactant complexes for the formation of highly crystalline fatty acid modified SPIONs by thermolysis of iron oleate (FeOl) complexes in a non-coordinating solvent. FeOl complexes were prepared by direct coordination of iron ions and carboxylic acid; thus, we could control the stoichiometric composition of the precursor by changing the molar ratio of fatty acid and metal ions. The discrete thermal behaviors and chemical coordination of the intermediate non-hydrated FeOl were studied by thermo-analytic techniques including differential scanning calorimetry, thermal gravimetric analysis, and Fourier transform infrared spectroscopy.

Improved Electrical Properties of Indium Gallium Zinc Oxide Thin-film Transistors by AZO/Ag/AZO Multilayer Transparent Electrode

  • No, Yeong-Su;Yang, Jeong-Do;Park, Dong-Hui;Wi, Chang-Hwan;Jo, Se-Hui;Kim, Tae-Hwan;Choe, Won-Guk
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.443-443
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    • 2012
  • We fabricated a-IGZO TFT with AZO/Ag/AZO transparent multilayer source/drain contacts by rf magnetron sputtering. Enhanced electrical device performance of a-IGZO TFT with AZO/Ag/AZO multilayer S/D electrodes (W/L = = 400/50 mm) was achieved with a subs-threshold swing of 3.78 V/dec, a minimum off-current of 10-12 A, a threshold voltage of 1.80 V, a field effect mobility of 10.86 cm2/Vs, and an on/off ration of 9x109. It demonstrated the potential application of the AZO/Ag/AZO film as a promising S/D contact material for the fabrication of the high performance TFTs.

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Joining of Lanthanum Chromite and Yttria Stabilized Zirconia in Sealing of Planar Solid Oxide Fuel Cell

  • Lee, You-Kee;Park, Jong-Wan
    • Korean Journal of Materials Research
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    • v.4 no.7
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    • pp.741-749
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    • 1994
  • The planar solid oxide fuel cell(SOFC) contains several ceramic materials depending on its structure and has rdfractory metal parts for manifolds, shrouds and current leads. Among ceramic materials for planar SOFC, joining of lanthanum chromite separator and yttria stabilized zirconia(YSZ) electoyte in planar SOFC stack to give strong gas tight seals is necessary for satisfactory operation and high performance. Nevertheless, for planar SOFC/sub s/, how to seal the cell stack and gas manifold remains as one of the unsolved problems. Therefore, in this study. we investigated the joining of sintered lanthanum chromite and YSZ pellets using unsintered lanthanum chromite green films as sealent. Scanning electron microscopy(SEM) and energy dispersive X-ray analysis(EDX) revealed that Ca in the sealing material diffused and dissolved into YSZ and sintered lanthanum chromite, and unsintered lanthanum chromite green films reacted with YSZ to from a new phase at the interface. Also, the densification of unsintered lanthanum chromite green films was inpeded by the Ca migration.

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AZO-Embedded Transparent Cu Oxide Photodetector (AZO 기반의 투명 Cu Oxide 광검출기)

  • Lee, Gyeong-Nam;Park, Wang-Hee;Um, Sung-Yun;Jang, Jun-min;Lim, Sol-Ma-Ru;Yun, Hyun-Chan;Hyeon, Seong-Woo;Kim, Joondong
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.30 no.6
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    • pp.339-344
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    • 2017
  • An all-transparent photodetector was fabricated by structuring $Cu_2O$/ZnO/AZO/ITO on a glass substrate. The visible-range transmittance was as high as 80%, which ensures clear vision forhuman eyes. High-transparency metal conductive oxides (p-type $Cu_2O$ and n-type ZnO) were appliedto form the transparent p/n junction. The functional AZO layer was adopted to improve the transparent photodetector performance between the ZnO and ITO, improving the photoresponses because of its electrical conductivity. To clarify the AZO functionality, a comparator device was prepared without the AZO layer in the formation of $Cu_2O$/ZnO/ITO/Glass. The $Cu_2O$/ZnO/AZO/ITO device provided a rectifying ratio of 113.46, significantly better than the 9.44 of the $Cu_2O$/ZnO/ITO device. In addition, the $Cu_2O$/ZnO/AZO/ITO device's photoresponses at short wavelengths were better than those of the comparator. The functioning AZO layer provides ahigh-performing transparent Cu oxide photodetector and may suggest a route for the design of efficient photoelectric devices.

Metal Oxide-Based Heterojunction Broadband Photodetector (산화물 반도체 기반의 이종접합 광 검출기)

  • Lee, Sang-eun;Lee, Gyeong-Nam;Ye, Sang-cheol;Lee, Sung-ho;Kim, Joondong
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.31 no.3
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    • pp.165-170
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    • 2018
  • In this study, double-layered TCO (transparent conductive oxide) films were produced by depositing two distinct TCO materials: $SnO_2$ works as an n-type layer and ITO (indium-doped tin oxide) serves as a transparent conductor. Both transparent conductive oxide-films were sequentially deposited by sputtering. The electrical and optical properties of single-layered TCO films ($SnO_2$) and double-layered TCO ($ITO/SnO_2$) films were investigated. A TCO-embedding photodetector was realized through the formation of an $ITO/SnO_2/p-Si/Al$ layered structure. The remarkably high rectifying ratio of 400.64 was achieved with the double-layered TCO device, compared to 1.72 with the single-layered TCO device. This result was attributed to the enhanced electrical properties of the double-layered TCO device. With respect to the photoresponses, the photocurrent of the double-layered TCO photodetector was significantly improved: 1,500% of that of the single-layered TCO device. This study suggests that, due to the electrical and optical benefits, double-layered TCO films are effective for enhancing the photoresponses of TCO photodetectors. This provides a useful approach for the design of photoelectric devices, including solar cells and photosensors.

$SnO_2$ Dispersion of Sintered Body in $In_2O_3-SnO_2$ Binary System ($In_2O_3-SnO_2$ 이성분계 소결특성에 있어서 $SnO_2$ 분산성)

  • Chun, Tae-Jin;Park, Wan-Soo;Cho, Muyung-Jin;Kim, Jong-Su;Kim, Young-Soo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.11a
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    • pp.198-198
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    • 2006
  • Tin doped $In_2O_3$ sputtering target is widely used to produce a various kinds of flat panel display because of high transmittance in visible region and high electrical conductivity. In2O3 and SnO2 powders were prepared by a homogeneous precipitation method using metal source, respectively, the calcining and sintering behavior of the indium-tin oxide(In2O3-SnO2) composite powders were studied. The tin oxide(SnO2) dispersion condition in ITO sputtering target was improved by increasing calcining temperature. And the tin oxide dispersion was also improved by reducing the tin oxide contents in the ITO target from 30 to 5wt%. SnO2 dispersion and densification of ITO target is very difficult to control due to sublimation of SnO2 at over 1150C.

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