• 한국광학회지
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• 제5권2호
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• pp.340-346
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• 1994

2.5Gbps 광통신시스템용 수광소자로서 charge plate층을 갖는 링구조의 separate absorption grading multiplication avalanche photodiode를 제작하고 그 특성을 조사 분석하였다. Avalanche Photodiode의 제작은 Metal-Organic Chemical Vapor Deposition 과 Liquid Phase Epitaxy법을 이용한 에피성장과 Br:Methanol을 이용한 채널식각 방법을 사용하였고, passivation과 평탄화는 photosensitive polyimide를 이용하였다. 제작된 ADP는 10nA 이하의 작은 누설전류를 나타내었고, -38~39 V의 항복전압을 나타내었다. 제작된 ADP를 GaAs FET hybrid 전치증폭기와 결합하여 2.5Gbps 속도에서 $2^{23}-1$의 길이를 갖는 입력 광신호에 대해 $ 10^{-10}$ Bit Error Rate에서 -31.0dBm의 수신감도를 얻었다.

• KIEE International Transactions on Electrophysics and Applications
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• 제5C권1호
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• pp.39-43
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• 2005

We proposed a structure for a 1.55 ㎛ strained separate confinement heterostructure (SCH) multi- quantum well (MQW) superluminescent diode (SLD), having a tapered active region. SLD was fabricated through a two-step procedure: the first step being metal organic chemical vapor deposition (MOCVD) and the second-step being liquid phase epitaxy (LPE). We used a 15 laterally tilted stripe and window region to suppress the lasing action of the SLD. The performance of the SLD showed output power of 11 mW with no lasing under 200 mA pulse driving. The full-width at half-maximum was 42 nm at 200 mA, 25℃.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1994년도 추계학술대회 논문집
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• pp.50-53
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• 1994

In this study. we report the properties of optically pumped stimulated emission at room temperature (RT) from column-III nitride semiconductors of GaN, GaInN, AlGaN/GaN double hetero-structure (DH) and AlGaN/GaInN DH which grown by low pressure metal-organic vapor phase epitaxy on sapphire substrate using an AIN buffer-layer. The peak wavelength of the stimulated emission at RT from AlGaN/GaN DH is 370nm and the threshold of excitation pumping power density (P$\_$th/) is about 89㎾/$\textrm{cm}^2$, and they from AlGaN/GaInN DH are 403nm and 130㎾/$\textrm{cm}^2$, respectively. The P$\_$th/ of AlGaN/GaN and AlGaN/GaInN DHs are lower than the bulk materials due to optical confinement within the active layers of GaN and GaInN. The optical gain and the polarization of stimulated emission characteristics are presented in this article.

• Journal of Ceramic Processing Research
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• 제13권spc1호
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• pp.93-95
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• 2012

We report on the growth and characterization of the nano- and micro scale GaN structures selectively grown on the vertex of GaN stripes using the metal organic vapor phase epitaxy method and conventional photolithography technique. The triangular shaped nano- and micro GaN structures which have semi-polar {11-22} facets were formed only on the vertex of the lower GaN stripes. Crystalline defects reduction was observed by transmission electron microscopy for upper GaN stripes. We also have grown the InGaN/GaN multi-quantum well structures on the semi-polar facets of the upper GaN stripes. Cathodoluminescence images were taken at 366, 412 and 555 nm related to GaN band edge, InGaN/GaN layer and defects, respectively.

• 한국표면공학회지
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• 제24권1호
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• pp.1-17
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• 1991

Understanding of the detailed reaction mechanisms during MOVPE and ALE is essential to further improve the properties of the grown crystals and the controllability of the growth parameters. The unified models for the detailed reaction paths are not available at this stage. The study, however, has been advanced to the extent that consensus on some of the reaction paths can be drawn from the scattered data. Metalakyls such as TMGa and TMIn seem to nearly fully decompose in the gas phase through homogeneous reaction at the typical MOVPE growth temperature. Hydrides such as AsH3 and PH3, on the contrary. seem to decompose heterogeneously onthe substrate surfaces as well as homogeneously in the gas phase. However, at lower temperatures, where ALE crystals are typically grown, the growth process is strongly dependent on the surface reactions. It seems that steric hindrance effects which the radicals reaching the substrate exhibit on the surface the growth rate a function of the metalalkyle supply durations. In addition, dydrogens released from hydrides seem to play an essential role in removing carbons leberated from the metalalkyls. High growth temperatures also seem to be effective in desorbing carbons from surface. The understanding of the reaction mechanisms was possible though diverse appraaches utilizing many ex-situ and in-situ diagnostic techniques and genuine experimental designs. It is the purpose of this paper to review and discuss many of these efforts and to draw some possible conclusions from them.

• 한국표면공학회지
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• 제24권1호
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• pp.1.1-1.1
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• 1991

Understanding of the detailed reaction mechanisms during MOVPE and ALE is essential to further improve the properties of the grown crystals and the controllability of the growth parameters. The unified models for the detailed reaction paths are not available at this stage. The study, however, has been advanced to the extent that consensus on some of the reaction paths can be drawn from the scattered data. Metalakyls such as TMGa and TMIn seem to nearly fully decompose in the gas phase through homogeneous reaction at the typical MOVPE growth temperature. Hydrides such as AsH3 and PH3, on the contrary. seem to decompose heterogeneously onthe substrate surfaces as well as homogeneously in the gas phase. However, at lower temperatures, where ALE crystals are typically grown, the growth process is strongly dependent on the surface reactions. It seems that steric hindrance effects which the radicals reaching the substrate exhibit on the surface the growth rate a function of the metalalkyle supply durations. In addition, dydrogens released from hydrides seem to play an essential role in removing carbons leberated from the metalalkyls. High growth temperatures also seem to be effective in desorbing carbons from surface. The understanding of the reaction mechanisms was possible though diverse appraaches utilizing many ex-situ and in-situ diagnostic techniques and genuine experimental designs. It is the purpose of this paper to review and discuss many of these efforts and to draw some possible conclusions from them.

• 한국결정성장학회지
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• 제24권4호
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• pp.145-150
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• 2014

3차원적 선택적 결정 성장 방법에 의해 GaN stripe 구조의 꼭지점 부분에만 GaN 나노로드를 성장하였다. GaN stripe의 꼭지점 부분의 $SiO_2$ 만을 최적화된 포토리소그라피 공정을 이용하여 제거하고 이를 선택적 결정 성장을 위한 마스크로 사용하였다. $SiO_2$가 제거된 꼭지점 부근에만 Au 금속을 증착하고, metal organic vapor phase epitaxy(MOVPE) 방법에 의해 GaN stripe의 꼭지점 부분에만 GaN 나노로드의 선택적 성장을 실시하였다. GaN 나노로드의 형상과 크기는 결정 성장 온도와 III족 원료의 공급량에 의해 변화가 있음을 확인하였다. Stripe 꼭지점에 성장된 GaN 나노로드는 단면이 삼각형형태를 가지고 있으며 끝으로 갈수록 점점 폭이 좁아지는 테이퍼 형상을 가지며 성장되었다. TEM 관측 결과, 매우 좁은 영역에서만 선택적 결정 성장이 이루어졌기 때문에 GaN 나노로드에서 관통전위(threading dislocations)는 거의 관찰되지 않음을 확인하였다. 선택성장이 시작되는 부분의 결정면과 GaN 나노로드의 성장방향의 결정면 방향의 차이에 기인하는 적층결함(stacking faults)들이 GaN 나노로드의 중심영역에서 생성되는 것을 관찰할 수 있었다.

• 한국결정성장학회지
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• 제21권3호
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• pp.114-118
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• 2011

본 논문에서는 육각형 GaN 피라미드의 꼭지점 부분에만 나노 혹은 마이크로 크기의 GaN 구조를 선택적으로 성장시킬 수 있는 결정 성장 방볍에 대하여 연구하였다. 최적화된 포토리소그라피 공정을 이용하여 육각형 GaN 피라미드 구조의 꼭지점 부분의 $SiO_2$ 마스크 영역만을 제거할 수 있었으며, 이렇게 하여 노출된 육각형 GaN 피라미드의 꼭지점 부분에만 metal organic vapor phase epitaxy(MOVPE) 결정 성장방법을 사용하여 나노 및 마이크로 크기의 GaN 구조를 선택적으로 성장하였다. GaN 피라미드 꼭지점 부근에 형성된 나노 및 마이크로 G값J 구조는 semi-polar {1-101} 결정면으로 둘러싸인 육각 피라미드 형상을 하고 있으며 그들의 크기는 성장 시간에 의해 쉽게 조절할 수 있음을 확인하였다. TEM 관측 결과, 측면 방향으로 진행하는 관통전위들이 $SiO_2$ 마스크에 의해 효율적으로 차단되어 나노 및 마이크로 GaN 구조에서는 전위 밀도가 감소하는 것을 확인할 수 있었으나 $SiO_2$ 마스크의 끝부분의 매끄럽지 못한 부분에 의해 적층 결함이 발생함을 확인하였다.

• 한국결정성장학회지
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• 제19권1호
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• pp.1-5
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• 2009

본 연구에서는 metal organic vapor phase epitaxy(MOVPF) 방법으로 $8^{\circ}$-off (100) Si 기판 위에 분극이 완화된(1-101) GaN를 성장한 후 광소자로서의 가능성을 확인하고자 (1-101) GaN 위에 InGaN/GaN MQW 구조를 제작하였으며 암모니아 유량, TMI 유랑 그리고 성장 온도 등 다양한 성장 조건에 따른 구조적, 광학적인 특성을 scanning electron microscopy(SEM)와 cathodoluminescence(CL)을 통하여 관찰하였다. (1-101) GaN 성장시 암모니아 유량이 적을수록 관통전위가 현저히 줄어드는 것을 확인하였다. (1-101) GaN stripe 위에 성장 시킨 InGaN/GaN MQW 구조를 이용하여 성장조건에 따라서 391.5nm부터 541.2nm에 이르는 넓은 영역의 범위에서 발광 스펙트럼을 조절할 수 있음을 확인하였다.

• 한국군사과학기술학회지
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• 제1권1호
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• pp.227-237
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• 1998

HgCdTe Is the most versatile material for the developing infrared devices. Not like III-V compound semiconductors or silicon-based photo-detecting materials, HgCdTe has unique characteristics such as adjustable bandgap, very high electron mobility, and large difference between electron and hole mobilities. Many research groups have been interested in this material since early 70's, but mainly due to its thermodynamic difficulties for preparing materials, no single growth technique is appreciated as a standard growth technique in this research field. Solid state recrystallization(SSR), travelling heater method(THM), and Bridgman growth are major techniques used to grow bulk HgCdTe material. Materials with high quality and purity can be grown using these bulk growth techniques, however, due to the large separation between solidus and liquidus line on the phase diagram, it is very difficult to grow large materials with minimun defects. Various epitaxial growth techniques were adopted to get large area HgCdTe and among them liquid phase epitaxy(LPE), metal organic chemical vapor deposition(MOCVD), and molecular beam epitaxy(MBE) are most frequently used techniques. There are also various types of photo-detectors utilizing HgCdTe materials, and photovoltaic and photoconductive devices are most interested types of detectors up to these days. For the larger may detectors, photovoltaic devices have some advantages over power-requiring photoconductive devices. In this paper we reported the main results on the HgCdTe growing and characterization including LPE and MOCVD, device fabrication and its characteristics such as single element and linear array($8{\times}1$ PC, $128{\times}1$ PV and 4120{\times}1$ PC). Also we included the results of the dewar manufacturing, assembling, and optical and environmental test of the detectors.