• Title/Summary/Keyword: Metal organic deposition

Search Result 463, Processing Time 0.033 seconds

Design and Fabrication of Laser Diode Integrated with Peltier Cooler (열전 냉각기가 집적된 레이저 다이오드)

  • 이상일;박정호
    • Journal of the Korean Institute of Telematics and Electronics A
    • /
    • v.32A no.1
    • /
    • pp.159-165
    • /
    • 1995
  • A double-heterostructure mesa-stripe-geometry laser diode integrated with thermoelectric Peltier cooler has been designed and fabricated. Epi-layers have been grown by metal organic chemical vapor deposition(MOCVD) method. Peltier cooling effect has been measured for devices with a mesa width of 14$\mu$m and a cavity length of 380$\mu$m. The effects of thermoelectric cooling could be shown by measuring the optical output of the laser with the increase of the current in the thermoelectric cooler. While the input courrent of the laser was maintained at 250mA, the optical output was decreased from 4.8mW to 3.8mW due to heating, but with the thermoelectric cooler on the optical output power was recovered by more than 40%. The results show that the complicated cooling device is not needed since the cooling can be achevied by the developement of the fabrication processing.

  • PDF

Fabrication and characterization of InGaAs Separate Absorption Grading Multiplication Avalache Photodiodes for 2.5 Gbps Optical Fiber Communication System (2.5Gbps 광통신용 InGaAs separate absorption grading multiplication (SAGM) advanche photodiode의 제작 및 특성분석)

  • 유지범;박찬용;박경현;강승구;송민규;오대곤;박종대;김흥만;황인덕
    • Korean Journal of Optics and Photonics
    • /
    • v.5 no.2
    • /
    • pp.340-346
    • /
    • 1994
  • 2.5Gbps 광통신시스템용 수광소자로서 charge plate층을 갖는 링구조의 separate absorption grading multiplication avalanche photodiode를 제작하고 그 특성을 조사 분석하였다. Avalanche Photodiode의 제작은 Metal-Organic Chemical Vapor Deposition 과 Liquid Phase Epitaxy법을 이용한 에피성장과 Br:Methanol을 이용한 채널식각 방법을 사용하였고, passivation과 평탄화는 photosensitive polyimide를 이용하였다. 제작된 ADP는 10nA 이하의 작은 누설전류를 나타내었고, -38~39 V의 항복전압을 나타내었다. 제작된 ADP를 GaAs FET hybrid 전치증폭기와 결합하여 2.5Gbps 속도에서 $2^{23}-1$의 길이를 갖는 입력 광신호에 대해 $ 10^{-10}$ Bit Error Rate에서 -31.0dBm의 수신감도를 얻었다.

  • PDF

Monitoring of III-V semiconductor surface by In-situ Surface PhotoAbsorption

  • Kim, T. J.;Kim, Y. D.;H. Hwang;E. Yoon
    • Journal of the Korean Vacuum Society
    • /
    • v.12 no.S1
    • /
    • pp.79-82
    • /
    • 2003
  • We present the investigation on P- and As-desorption process from the (001) InP surface in metal organic chemical vapor deposition using surface photoabsorption (SPA). The monochromatic SPA signal showed rapid initial increase to reach In-stabilized surface value after $PH_3$ was turned off, but in case of As-desorption, the signal showed clear existence of a metastable state after the $AsH_3$ was turned off. The SPA spectra at each stable surfaces were taken to confirm the interpretation. This result indicates that the As-desorption process should be understood as a two-step process, in contrast to P-desorption of one-step process.

Effects of Pt and Ir Electrodes on $Pb(Zr_xTi_{1-x})O_3$ Thin Films Deposited at Low Temperature(400$^{\circ}C$-500$^{\circ}C$) by Metal-Organic Chemical Vapor Deposition with Liquid Delievery System (액체수송 유기금속 화학증착법(LDS-MOCVD)에 의해 Pt전극과 Ir전극 위에 저온(400$^{\circ}C$-500$^{\circ}C$)증착된 $Pb(Zr_xTi_{1-x})O_3$ 박막의 특성분석)

  • Kim, Hye-Ryeong;Jeong, Si-Hwa;Jeon, Chung-Bae;Gwon, O-Seong;Hwang, Cheol-Seong;Han, Yeong-Gi;Yang, Du-Yeong;O, Gi-Yeong;Hwang, Cheol-Ju
    • Proceedings of the Korean Ceranic Society Conference
    • /
    • 2000.10a
    • /
    • pp.161.1-161
    • /
    • 2000
  • PDF

10Gbit/s AlGaAs/GaAs HBT limiting amplifier (AlGaAs/GaAs HBT를 사용한 10Gbit/s 리미팅증폭기)

  • 곽봉신;박문수
    • Journal of the Korean Institute of Telematics and Electronics D
    • /
    • v.34D no.7
    • /
    • pp.15-22
    • /
    • 1997
  • A 10Gbit/s limiting amplifier IC for optical transmission system was implemented with AlGaAs HBT (heterojunction bipolar transistor) technology. HBTs with 2x10.mu. $m^{2}$ and 6x20.mu. $m^{2}$ emitter size were used. The HBT structures are based on metal-organic chemical vapor deposition (MOCVD) epitxy and employ a mesa structure with self-aligned emitter/base and sidewall dielectric passivation. IC was designed to support differnetial input and output. Small signal performance of the packaged IC showed 26dB gain and $f_{3dB}$ of 8GHz. A single ouput has 800m $V_{p-p}$ swing with more than 26dB dynamic range. The performance of the limiting amplifier was verified through single mode fiber320km transmission link test.est.

  • PDF

Characteristics of Ta2O5 thin film prepared by RTMOCVD (RTMOCVD법에 의해 제조된 Ta2O5 박막의 특성)

  • So, Myoung-Gi;Kwong, Dim Lee
    • Journal of Industrial Technology
    • /
    • v.19
    • /
    • pp.101-105
    • /
    • 1999
  • Ultra thin $Ta_2O_5$ gate dielectrics were prepared by RTMOCVD (rapid thermal metal organic chemical vapor deposition) using Ta source $TaC_{12}H_{30}O_5N$ and $O_2$ gaseous mixtures. As a result, $Ta_2O_5$ thin films showed significantly low leakage current compared to $SiO_2$ of identical thickness, which was due to the stabilization of the interfacial layer by NO ($SiO_xN_y$) passivation layer. The conduction of leakage current in $Ta_2O_5$ thin films was described by the hopping mechanism of Poole-Frenkel (PF) type.

  • PDF

Fabrication of Infrared Filters for Three-Dimensional CMOS Image Sensor Applications

  • Lee, Myung Bok
    • Transactions on Electrical and Electronic Materials
    • /
    • v.18 no.6
    • /
    • pp.341-344
    • /
    • 2017
  • Infrared (IR) filters were developed to implement integrated three-dimensional (3D) image sensors that are capable of obtaining both color image and depth information at the same time. The combination of light filters applicable to the 3D image sensor is composed of a modified IR cut filter mounted on the objective lens module and on-chip filters such as IR pass filters and color filters. The IR cut filters were fabricated by inorganic $SiO_2/TiO_2$ multilayered thin-film deposition using RF magnetron sputtering. On-chip IR pass filters were synthetized by dissolving various pigments and dyes in organic solvents and by subsequent patterning with photolithography. The fabrication process of the filters is fairly compatible with the complementary metal oxide semiconductor (CMOS) process. Thus, the IR cut filter and IR pass filter combined with conventional color filters are considered successfully applicable to 3D image sensors.

Antimony Surfactant Effect on p-GaN growth by Metal Organic Chemical Vapor Deposition (MOCVD)

  • Lee, Yeong-Gon;Sadasivam, Karthikeyan Giri;Baek, Gwang-Seon;Kim, Bong-Jun;Kim, Hak-Jun;Lee, Jun-Gi
    • Proceedings of the Materials Research Society of Korea Conference
    • /
    • 2010.05a
    • /
    • pp.56.2-56.2
    • /
    • 2010
  • An improvement in the optical and structural properties of p-GaN was obtained by using antimony (Sb) as a surfactant during p-GaN growth. Two different growth temperatures of p-GaN such as $1030^{\circ}C$ and $900^{\circ}C$ were considered. Keeping the growth conditions for p-GaN constant, Sb was introduced during p-GaN growth while varying the [Sb]/([Ga]+[Mg]) flow ratio. [Sb]/([Ga]+[Mg]) flow ratio will be denoted as SGM ratio for convenience. SGM ratio of 0, 0.015 and 0.03% were considered for high temperature p-GaN growth. SGM ratio of 0, 0.005, 0.01 and 0.02% were considered for low temperature p-GaN growth. The analysis results suggest that using the optimum SGM ratio during p-GaN growth greatly improves the optical and structural properties of the p-GaN.

  • PDF

Improved Performance of 1.55 ㎛ InGaAsP/InP Superluminescent Diodes by Tapered Stripe Structure

  • Choi Young-Kyu
    • KIEE International Transactions on Electrophysics and Applications
    • /
    • v.5C no.1
    • /
    • pp.39-43
    • /
    • 2005
  • We proposed a structure for a 1.55 ㎛ strained separate confinement heterostructure (SCH) multi- quantum well (MQW) superluminescent diode (SLD), having a tapered active region. SLD was fabricated through a two-step procedure: the first step being metal organic chemical vapor deposition (MOCVD) and the second-step being liquid phase epitaxy (LPE). We used a 15 laterally tilted stripe and window region to suppress the lasing action of the SLD. The performance of the SLD showed output power of 11 mW with no lasing under 200 mA pulse driving. The full-width at half-maximum was 42 nm at 200 mA, 25℃.