• Journal of the Korean Institute of Telematics and Electronics D
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• v.34D no.5
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• pp.7-13
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• 1997

A X-band 3-stage monolithic LNA (low noise amplifier) with series feedback has been successfully desined and demonstrated by suign 0.5-$\mu\textrm{m}$ GaAs MESFET. In the design of the 3-stage LNA, the effects of series feedback to the noise figure, the gain, and the stability have been investigated ot find the optimal short stub length. As a result, the inductive series feedback topology which has 10degree short stub in the GaAs MESFET source lead, has been employed in the 1-st stage. The fabricated MMIC LNA's chip size is only 1mm$^{2}$/stage, which is smaller than the previously reported X-band MMIC input/output return losses are less than -10dB and -15dB, respectively. The noise figure (NF) is less than 2.6dB. The measured data show good agreement with the simulated values.

• The Journal of Korean Institute of Communications and Information Sciences
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• v.16 no.7
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• pp.628-639
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• 1991

A new efficient method for GaAs MESFET model parameter extraction is proposed, which is based on the bias dependance of each parameter characteristics derved from the analytic model. The requiremnts of the method are only small-signal S-parameter measurements under the three bias variations. Fixation of the linear model parameter values in the optimization process is made using the sensitivity information of the model parameter obtained by the weighted Broyden update method, it is to improve the uniqueness and reliablility of the solution. The validity of the extracted values of the FET model parameters is confirmed by comparing the simulation results with the experimental data.

• Proceedings of the IEEK Conference
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• 2002.06b
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• pp.33-36
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• 2002

MESFET was fabricated using 4H-SiC substrates and epitaxy The DC characteristics of 0.5 urn gate length, 400 urn gate width MESFET had $I_{dss}$=200 ㎃/mm, maximum transconductance of 12 ㎳/mm at Vrs=-4 V, V, Is=27 V. Thc device had an fT of 2.5 GHz and $f_{mdx}$ of 13.3 GHz at $V_{ds}$ =27 V and $V_{g}$=-4 V. The fabrication and characterization of this device are discussed.d.d.d.

• Proceedings of the IEEK Conference
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• 2003.07b
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• pp.755-758
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• 2003

본 논문에서 단거리전용통신(DSRC)용 OBE에 사용되는 5.8GHz 송신측 ASK와 PA를 one-chip화하여 MMIC로 설계를 및 제작하였다. 설계된 ASK-PA는 3V 단일 공급전원을 사용하였고, 능동 소자로서 GaAs MESFET을 사용하였다. ASK는 회로의 복잡도를 줄이기 위해 직접변조 방식을 채택하였고, 인접채널 간섭의 영향을 줄이기 위하여 드레인 제어 변조회로를 사용하였다. 또한 전력증폭기는 2단으로 하여 AB급으로 동작하도록 전압분배 바이어스회로로 구성하였다. 측정결과 3V의 공급전압에서 전체이득 20.63dB, 송신출력 7.8dBm으로 나타냈다. 공정은 ETRI 0.5㎛ GaAs MESFET 공정을 사용하였고, Chip size는 1.2mm×l.4mm이다.

• Journal of the Korean Institute of Telematics and Electronics D
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• v.34D no.12
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• pp.69-75
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• 1997

A Si-channle MESFET using .delta.-doped layers was designed and the considerable enhancement of the current driving capability of the device was observed by simulation. The channel consists of double .delta.-doped layers separated by a low-doped spacer. Cariers are spilt from the .delta.-doped layers and are accumulated in the spacer. The saturation current is enhanced by the contribution of the carriers in the spacer. Among the design parameters that affect the peformance of the device, the thickness of the spacer and the ratio of the doping concentrations of the two .delta.-doped layers were studied. The spacer thickenss of 300~500.angs. and the doping ratio of 3~4 were shown to be the optimized values. The saturation current was observed to be increased by 75% compared with a bulk-channel MESFET. The performances of transconductance, output resistance, and subthreshold swing were also enhanced.

• The Journal of Korean Institute of Communications and Information Sciences
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• v.13 no.4
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• pp.360-368
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• 1988

A 14 to 14.5 GHz low noise MIC amplifier is designed on the $Al_2$$O_3$ substrate. The amplifier which uses a GaAsMESFET developed at COMSAT Laboratories has been designed and optivized to have gain greater than 7dB and noise figure less than 2dB using Super-Compact program. Experimental results show that the gain of the amplifier is 7 to 7.7 dB, while noise figure is 3.8 to 4.3dB through the desired band.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.14 no.4
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• pp.274-280
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• 2001

This paper presents transconductance (g$\_$m/( characteristics of GaAs MESFET's at high temperatures ranging from room temperature to 350$\^{C}$. GaAs MESFET of 0.3x750[㎛] gate dimension has been used to obtain the experimental data. Gate to source voltage(V$\_$GS/) has been controlled to obtain the temperature dependent characteristics for maximum transconductance g$\_$mmax/ of the device. Furthermore g$\_$mmax/ and expected g$\_$m/ have been traced with temperatures ranging from room temperature to 350$\^{C}$ also by compensating for C$\_$GS/ to maintain the optimum operation of the device. From the results, V$\_$GS/decreases as the operating temperature increases for optimum operation of the transconductance. Finally V$\_$GS/ has been optimized to trace g$\_$mmax/ and enhances the decreased g$\_$m/ with different temperatures.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1999.05a
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• pp.497-500
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• 1999

This paper reports on the fabrication and characteristics of recessed gate GaN MESFETs fabricated using a photoelectrochemical wet etching method. The unique etching process utilizes photo-resistive mask and KOH based etchant. GaN MESFETs with successfully recessed gate structure was characterized in terms of dc and RF performance. The fabricated GaN MESFET exhibits a current saturation at $V_{DS}$ = 4 V and a pinch-off at $V_{GS}$ =-3V The peak drain current of the device is about 230mA/mm at 300 K and the value is remained almost same for 500K operation. The $f_{T}$ and $f_{max}$ from the device are 6.357Hz and 10.25 GHz, respectively.y.y.

• Journal of the Korean Institute of Telematics and Electronics
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• v.24 no.5
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• pp.804-812
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• 1987

1\ulcorner gate MESFETs are fabricated on MOCVD and VPE grown GaAs wafers using photolithography, chemical wet etching and lift-off techniques. DC characteristics such as Vt, Gm, Rs, etc. are studied and active channel parameters of MESFET(a, n, Leff, \ulcorner)are analyzed for 1-4 \ulcorner gate FETs and 100\ulcorner FAT FET. The correlation between DC data and active channel parameters are experimentally analyzed. The measured transconductance and low-field mobility in the active channel for the 1\ulcorner gate MESFET made on MOCVD wafer are 67mS/mm and 2980cm\ulcornerVs respectively.

• Proceedings of the Materials Research Society of Korea Conference
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• 1998.05a
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• pp.126-126
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• 1998