• Proceedings of the Korean Vacuum Society Conference
• /
• 2012.02a
• /
• pp.184-184
• /
• 2012

We proposed a new measurement method of cutoff probe using the reactance spectrum of the plasma in cutoff probe system instead of transmission spectrum. The high accurate reactance spectrum of the plasma which is expected in previous circuit simulation of cutoff probe [1] was measured by using the automatic port extension method of the network analyzer. The measured reactance spectrum is good agreement with E/M wave simulation result (CST Microwave Studio). From the analysis of the measured reactance spectrum based on the circuit modeling, not only the electron density but also electron-neutral collision frequency can be simply obtained. The obtained results of electron density and e-n collision frequency were presented and discussed in wide range of experimental conditions, together with comparison result with previous methods (a previous cutoff probe using transmission spectrum and a single langmuir probe).

• Transactions of the Korean Society of Machine Tool Engineers
• /
• v.17 no.4
• /
• pp.75-80
• /
• 2008

This paper presents an atomic force probe for triggering coordinate measuring machines(CMMs). A rigorous comparison is made between touch trigger probe and atomic force probe for CMMs. Typical CMMs(touch trigger probe based CMMs) often lead to some errors associated with object curvature and difference in triggering sensitivity. Their applicability is limited only to hard objects. The aim of this work is to develop a trigger sensor for CMMs using atomic force. In order to show the applicability of atomic force as a trigger sensor, a cylindrical shape is measured with a CMM and an atomic force microscope. Three different touch probe heads with different ball sizes are tested. The experiments show that smaller ball provides better results for curved objects. The experimental results also show that the performance of atomic force as a trigger sensor is about that of the smallest ball probe. In addition, experiments are also performed to measure soft objects. Finally, this paper suggests and verifies a trigger sensor using atomic force for CMMs.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2016.02a
• /
• pp.185.1-185.1
• /
• 2016

Cutoff probe, diagnostics instrument for plasma density, have been received an extensive attention due to simple, robust and lowest assumption. Although the cutoff probe has a long history, physical model is limited in low density plasma. For that reason, we propose a novel transmission line model of cutoff probe for precise measurement of high density plasma. In addition simplified circuit model can be obtained from transmission line model. It can explain simply physics of cutoff probe in high density plasma.

• Journal of Power System Engineering
• /
• v.10 no.3
• /
• pp.23-31
• /
• 2006

Mean velocities and turbulent characteristics in the three-dimensional flow fields of a gun-type gas burner were measured by using triple hot-wire probe (T-probe) in order to compare them with the results already presented by X-type hot-wire probe (X-probe). Vectors obtained by the measurement of two kinds of probes in the horizontal plane and in the cross section respectively show more or less difference in magnitude each other, but comparatively similar shape in overall distribution. Axial mean velocity component along the centerline shows that the value by T-probe is about ten times smaller than that by X-probe above the range of X/R=3. Also, the axial component of turbulent intensity along the centerline appears the biggest difference between the two probes. Moreover, axial mean velocity component, axial turbulent intensity component and rotational along the Y-directional distance show a big difference between slits and swirl vanes. On the whole, the values by T-probe appear smaller than those by X-probe.

• International Journal of Contents
• /
• v.6 no.2
• /
• pp.6-9
• /
• 2010

Using symplectic relation and reaction concept, we propose a planar near-field antenna measurement method. A generalized probe compensation equation is deduced to obtain the probe correction formulation. To verify our approach, a reflector antenna with $1{\times}2$ horn array is fabricated and measured in the near-field measurement facility. The near-field measurement results are compared with the physical optics (PO) simulation. The results of measurement and simulation agree very well near to the mainbeam.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2012.08a
• /
• pp.148-148
• /
• 2012

A cutoff probe is the novel diagnostic method to get the absolute plasma density with simple system and less assumption. However, high density of ion flux from plasma on probe tip can make the error of plasma density measurement because the dielectric material of probe tip can be damaged by ion flux. We proposed a shielded cutoff probe using the ceramic tube for protection from ion flux. The ceramic tube on probe tip can intercept the ion flux from plasma. The transmitted spectrum using the shielded cutoff probe is good agreement with E/M wave simulation result (CST Microwave Studio) and previous circuit simulation of cutoff probe [1]. From the analysis of the measured transmitted spectrum base on the circuit modeling, the parallel resonance frequency is same as the unshielded cutoff probe case. The obtained results of electron density is presented and discussed in wide range of experimental conditions, together with comparison result with previous cutoff method.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.19 no.9
• /
• pp.825-831
• /
• 2006

As an increase of chip complexity and level of chip integration, chip input/output (I/O) pad pitches are also drastically reduced. With arrival of high complexity SoC (System on Chip) and SiP (System in Package) products, conventional horizontal type probe card showed its limitation on probing density for wafer level test. To enhance probing density, we proposed new vertical type probe card that has the $70{\mu}m$ probe needle with tungsten wire in $80{\mu}m$ micro-drilled hole in ceramic board. To minimize alignment error, micro-drilling conditions are optimized and epoxy-hardening conditions are also optimized to minimize planarity changes. To apply wafer level test for target devices (T5365 256M SDRAM), designed probe card was characterized by probe needle tension for test, contact resistance measurement, leakage current measurement and the planarity test. Compare to conventional probe card with minimum pitch of $50{\sim}125{\mu}m\;and\;2\;{\Omega}$ of average contact resistance, designed probe card showed only $22{\mu}$ of minimum pitch and $1.5{\Omega}$ of average contact resistance. And also, with the nature of vertical probing style, it showed comparably small contact scratch and it can be applied to bumping type chip test.

• Electrical & Electronic Materials
• /
• v.9 no.5
• /
• pp.506-511
• /
• 1996

This paper deals with an inexpensive, simple and fast Langmuir probe sweeping circuit and its application. This sweeper completes a probe trace in a 1 ms order. Futhermore, the circuit drives a maximum probe voltage of $\pm$30V and has a maximum probe current capability of a few amperes. The plasma parameters are successfully determined using the fast Langmuir probe method.

• The Journal of the Acoustical Society of Korea
• /
• v.13 no.3
• /
• pp.41-50
• /
• 1994

We studied an inherent error be caused by a measuring acoustic intensity using probe which can measure simultaneously the three-dimensional acoustic intensity. This three-dimensional intensity probe was constructed with four microphones, proposed by Suzuki et al. . In the computer simulation, we analyzed the nearfield measurement error with arbitary direction and each of axis direction on the ideal point source and the plate sound source which have finite size. From the results, in case of point source, we obtained accurate measurement below about 1dB when the distance of measurement was about 2.5 times with the distance among microphones in this probe. And in the case of plate sound source, the nearfield measurement error was decreased as the length of one side became above 0.02m, we obtained accurate measurement below about 1dB when the length of one side is 0.2m. The nearfield measurement error of finite size sound is small to ignore. Therefore this probe is useful to measure nearfield intensity.

• Journal of the Korean Society of Manufacturing Process Engineers
• /
• v.2 no.1
• /
• pp.75-84
• /
• 2003

In this paper, a new nano/micro-mechanical processing test machine was developed. This new test machine, which is based on the principle of the scanning force controlled probe microscope, can realize nano/micro-mechanical machining and in-process profile measurement. Experimental results of nano/micro indentation and scratching show that the controllable cutting depth of the test machine can be controlled by PZT actuator. Profile measurement of the machined surface has also been performed by using the test machine and a conventional AFM(Atomic Force Microscopy). A good agreement of the two measurement results have been achieved.