• Title/Summary/Keyword: Maskless process

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Status of Research on Selective Laser Sintering of Nanomaterials for Flexible Electronics Fabrication (나노물질의 선택적 레이저소결을 이용한 유연전기소자 구현 연구현황)

  • Ko, Seung-Hwan
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.35 no.5
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    • pp.533-538
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    • 2011
  • A plastic-compatible low-temperature metal deposition and patterning process is essential for the fabrication of flexible electronics because they are usually built on a heat-sensitive flexible substrate, for example plastic, fabric, paper, or metal foil. There is considerable interest in solution-processible metal nanoparticle ink deposition and patterning by selective laser sintering. It provides flexible electronics fabrication without the use of conventional photolithography or vacuum deposition techniques. We summarize our recent progress on the selective laser sintering of metals and metal oxide nanoparticles on a polymer substrate to realize flexible electronics such as flexible displays and flexible solar cells. Future research directions are also discussed.

Maskless Fabrication of the Silicon Stamper for PDMS Nano/Micro Channel (나노/마이크로 PDMS 채널 제작을 위한 마스크리스 실리콘 스템퍼 제작 및 레오로지 성형으로의 응용)

  • 윤성원;강충길
    • Transactions of Materials Processing
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    • v.13 no.4
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    • pp.326-333
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    • 2004
  • The nanoprobe based on lithography, mainly represented by SPM based technologies, has been recognized as a potential application to fabricate the surface nanosctructures because of its operational versatility and simplicity. However, nanoprobe based on lithography itself is not suitable for mass production because it is time a consuming method and not economical for commercial applications. One solution is to fabricate a mold that will be used for mass production processes such as nanoimprint, PDMS casting, and others. The objective of this study is to fabricate the silicon stamper for PDMS casting process by a mastless fabrication technique using the combination of nano/micro machining by Nanoindenter XP and KOH wet etching. Effect of the Berkovich tip alignment on the deformation was investigated. Grooves were machined on a silicon surface, which has native oxide on it, by constant load scratch (CLS), and they were etched in KOH solutions to investigate chemical characteristics of the machined silicon surface. After the etching process, the convex structures was made because of the etch mask effect of the mechanically affected layer generated by nanoscratch. On the basis of this fact, some line patterns with convex structures were fabricated. Achieved groove and convex structures were used as a stamper for PDMS casting process.

Blind Via Hole Drilling Using DPSS UV laser (DPSS UV 레이저를 이용한 블라인드 비아 홀 가공)

  • 김재구;장원석;신보성;장정원;황경현
    • Laser Solutions
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    • v.6 no.1
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    • pp.9-16
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    • 2003
  • Micromachining using the DPSS 3rd Harmonic Laser (355nm) has outstanding advantages as a UV source in comparison with Excimer lasers in various aspects such as maintenance cost, maskless machining, high repetition rate and so on. It also has the greater absorptivity of many materials in contrast to other IR sources. In this paper, the process for micro-drilling of blind hole in Cu/PI/Cu substrate with the DPSS UV laser and the scanning device is investigated by the experimental methods. It is known that there is a large gap between the ablation threshold of copper and that of PI. We use the Archimedes spiral path for the blind hole with different energy densities to ablate the different material. Finally, the blind via hole of diameter 100$\mu\textrm{m}$ and 50$\mu\textrm{m}$ was drilled.

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Pattern Fabrication on Si (100) Surface by Using Both Nanoscratch and KOH Etching Technique (나노스크래치와 KOH 에칭 기술을 병용한 Si (100) 패턴제작)

  • 윤성원;이정우;강충길
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2003.05a
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    • pp.448-451
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    • 2003
  • This study describes a new maskless nano-fabrication technique of Si (100) using the combination of nanometer-scale mechanical forming by nano-indenter XP and KOH wet etching. First the surface of a Si (100) specimen was machined by using the nano-machining system, which utilizes the mechanism of the nano-indenter XP. Next, the specimen was etched by KOH solution. After the etching process, the convex structure or deeper hole is made because of masking or promotion effect of the affected layer generated by nano-machining. On the basis of this interesting fact, some sample structures were fabricated.

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Microstructural Characterization of GaN Epilayer by Maskless Pendeo-Epitaxial Process (마스크를 사용하지 않은 PE(Pendeo Epitaxy) GaN에피층의 미세구조적 특성)

  • 박동준;이정용;조형균;홍창희;정흥섭
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2003.11a
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    • pp.177-177
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    • 2003
  • GaN 에피층을 성장에 있어서 가장 문제가 되는 통과 전위를 줄이기 위한 방법 이 여러 가지로 진행되고 있다. 그중에서도 PE(Pendeo Epitaxy) 방법으로 많은 연구가 이루어 졌는데 이경우에 열적인 요인으로 인해 발생하는 스트레스와 마스크 물질로 인하여 그러한 물질들이 서로 반응하거나 성장시 악영향을 끼쳐 결국은 성장되는 GaN층의 결정학적 기울기의 원인이 된다는 것이 밝혀졌다. 따라서 이러한 마스크를 제거하여 PE GaN에서 마스크와 수평으로 자라나는 GaN층사이의 간섭이 사라져서 결정학적 기울기가 감소시킬 수 있게 되었다. 이 연구에서 우리는 위에서 언급했던 마스크를 사용하지 않은 PE GaN의 미세구조적인 특성과 전위들의 거동을 투과전자현미경, 주사 전자현미경 그리고 HRXRD(High Resolution X-Ray diffraction)결과를 이용하여 살펴보았다.

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Maskless Nano-fabrication by using both Nanoscratch and HF Wet Etching Technique (나노스크래치와 HF 에칭기술을 병용한 Pyrex 7740의 마스크리스 나노 가공)

  • 윤성원;이정우;강충길
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2003.06a
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    • pp.628-631
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    • 2003
  • This study describes a new mastless nano-fabrication technique of Pyrex 7740 glass using the combination of nanomachining by nano-indenter XP and HF wet etching. First, the surface of a Pyrex 7740 glass specimen was machined by using the nano-machining system, which utilizes the mechanism of the nano-indenter XP. Next, the specimen was etched by HF solution. After the etching process, the convex structure or deeper hole is made because of masking or promotion effect of the affected layer generated by nano-machining. On the basis of this interesting fact. some sample structures were fabricated.

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Optical Waveguide Fabrication using Laser Direct Writing Method (레이저 직접묘화방법을 이용한 광도파로 제작)

  • 김정민;신보성;김재구;장원석
    • Journal of the Korean Society for Precision Engineering
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    • v.20 no.12
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    • pp.42-47
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    • 2003
  • The laser direct writing method has some advantages of being maskless, allowing rapid and inexpensive prototyping in comparison to conventional mask-based photolithography. In general, there are two kinds of laser direct writing methods such as the laser ablation method and the laser polymerization method. The laser polymerization method was studied fur manufacturing waveguide in this paper. It is important to reduce line width for image mode waveguides, so some investigations will be carried out in various conditions of process parameters such as laser power, writing speed, focusing height and optical properties of polymer. Experimentally, the optical waveguide was manufactured trapezoid shape. Through SEM the waveguide was 20 ${\mu}{\textrm}{m}$ width and 7.4 ${\mu}{\textrm}{m}$ height.

Laser-Direct Patterning for Plasma Display Panel (플라즈마 디스플레이 패널을 위한 레이저 직접 패터닝)

  • Ahn, Min-Young;Lee, Kyoung-Cheol;Lee, Hong-Kyu;Lee, Cheon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1999.05a
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    • pp.99-102
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    • 1999
  • A mixture which was made from organic gel, glass powder and ceramic powder was masklessly etched for fabrication of barrier rib of PDP(Plasma Display Panel) by focused Ar$^{+}$ laser( λ =514 nm) and Nd:YAG(λ =532, 266 nm) laser irradiation at the atmosphere. The depth of the etched grooves increases with increasing a laser fluence and decreasing a scan speed. Using second harmonic of Nd:YAG laser, the threshold laser fluence was 6.5 mJ/$\textrm{cm}^2$ for the sample of PDP barrier rib softened at 12$0^{\circ}C$. The thickness of 130 ${\mu}{\textrm}{m}$ of the sample on the glass was clearly removed without any damage on the glass substrate by fluence of 19.5 J/$\textrm{cm}^2$....

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Roll-to-Roll (R2R) Fabrication of Micro Pillar Array for Biomimetic Functionalization of Surface

  • Jeon, Deok-Jin;Lee, Jun-Young;Yeo, Jong-Souk
    • Applied Science and Convergence Technology
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    • v.23 no.1
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    • pp.54-59
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    • 2014
  • The roll-to-roll (R2R) fabrication method to make micro-scale pillar arrays for biomimetic functionalization of surfaces is presented. Inspired by the micro-structure of plants in nature, a surface with a synthetic micro-scale pillar array is fabricated via maskless photolithography. After the surface is SAM (self-assembled monolayer) coated with trichlorosilane in a vacuum desiccator, it displays a hydrophobic property even in R2R replicas of original substrate, whose properties are further characterized using various pitches and diameters. In order to perform a comparison between the original micro-pattern and its replicas, surface morphology was analyzed using scanning electron microscopy and wetting characteristics were measured via a contact angle measurement tool with a $10{\mu}L$ water droplet. Efficient roll-to-roll imprinting for a biomimetic functionalized surface has the potential for use in many fields ranging from water repelling and self-cleaning to microfluidic chips.

Laser-Induced Thermochemical Wet Etching of Mn-Zn Ferrite (Mn-Zn 페라이트의 레이저 유도 열화학 습식식각)

  • Lee, Kyoung-Cheoul;Lee, Cheon
    • Electrical & Electronic Materials
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    • v.10 no.7
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    • pp.668-673
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    • 1997
  • A Single-crystalline Mn-Zn Ferrite (110 orientation) was masklessly etched by focused Ar laser irradiation in an H$_3$PO$_4$ solution. The depth of the etched grooves increases with increasing a laser power, decreasing a scan speed, and increasing the H$_3$PO$_4$concentration. The width of the etched grooves increases with a increasing laser power, but was relatively insensitive to the scan speed and H$_3$PO$_4$concentration. High etching rate of up to 714 ${\mu}{\textrm}{m}$/s and an aspect ratio of 6 for vertical slab structure have been obtained by the light-guiding effect of the laser bean in the H$_3$PO$_4$ solution.

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