• 제목/요약/키워드: Mask-making

검색결과 59건 처리시간 0.023초

처짐저감을 위한 OLED 증착 마스크-프레임 구조체

  • 문병민;정남희;조창상;김국원
    • 한국반도체및디스플레이장비학회:학술대회논문집
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    • 한국반도체및디스플레이장비학회 2007년도 춘계학술대회
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    • pp.164-168
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    • 2007
  • Deformation of a shadow mask is one of the problems encountered during the deposition of organic materials for manufacturing large size OLED. The larger the glass substrate, the larger the shadow mask becomes. But as the size of the shadow mask increases, its deformation becomes more severe, thereby making it difficult to deposit organic materials in a precise pattern on a substrate. In this paper, a new type mask-frame structure is proposed. The proposed mask-frame structure making a curved mask has the ability of reducing drooping of mask. The test frame is fabricated and evaluation experiments are performed.

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대면적 OLED 증착용 새도우 마스크 설계 (A Design of the Shadow Mask for Large Size OLED Vapor Deposition)

  • 김국원;엄태준;주영철;이상욱;권계시
    • 제어로봇시스템학회논문지
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    • 제14권4호
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    • pp.348-352
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    • 2008
  • Deformation of the shadow mask is one of the problems encountered during the deposition of organic materials for manufacturing large size organic light emitting diode (OLED). The larger the glass substrate, the larger the shadow mask becomes. As the size of the shadow mask increases, its deformation becomes more severe, thereby making it difficult to deposit organic materials in a precise pattern on a substrate. In this paper, a new method for reducing drooping of the shadow mask for large size OLED vapor depositions is proposed. The proposed shadow mask with cross stripe wires has higher stiffness than the pure shadow mask, which results in reducing drooping of the shadow mask. A commercial FEM program, ANSYS, is used for the evaluation of the proposed shadow mask. The analysis showed that the shadow mask with cross stripe wires have an effect on reducing drooping about 18.6% or more.

Attenuated Phase Shift Mask에 광 근접 효과 보정을 적용한 고립 패턴의 해상 한계 분석 (Resolution Limit Analysis of Isolated Patterns Using Optical Proximity Correction Method with Attenuated Phase Shift Mask)

  • 김종선;오용호;임성우;고춘수;이재철
    • 한국전기전자재료학회논문지
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    • 제13권11호
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    • pp.901-907
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    • 2000
  • As the minimum feature size for making ULSI approaches the wavelength of light source in optical lithography, the aerial image is so hardly distorted because of the optical proximity effect that the accurate mask image reconstruction on wafer surface is almost impossible. We applied the Optical Proximity Correction(OPC) on isolated patterns assuming Attenuated Phase Shift Mask(APSM) as well as binary mask, to correct the widening of isolated patterns. In this study, we found that applying OPC to APSM shows much better improvement not only in enhancing the resolution and fidelity of t도 images but also in enhancing the process margin than applying OPC to the binary mask. Also, we propose the OPC method of APSM for isolated patterns, the size of which is less than the wavelength of the ArF excimer laser. Finally, we predicted the resolution limit of optical lithography through the aerial image simulation.

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가면극 공연 의상 디자인 비교 연구 -한국 가면극과 이탈리아 코메디아 델 아르떼(Commedia dell'arte)를 중심으로- (A Comparative Study on Costume design of Mask Play -Focusing on Korean Mask Play and Italian 'Commedia dell'arte'-)

  • 임정미;소황옥
    • 복식
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    • 제64권8호
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    • pp.124-137
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    • 2014
  • The purpose of this study is to produce an essential guideline for making costumes for traditional Korean mask plays by doing a comparative analysis between traditional Korean mask plays and Italian 'Commedia dell'arte'. The results of this study are as follow. The costumes of Korea's mask plays were mainly used to show difference in social status. Analysis showed that costume features, such as color, fabric, and silhouette, were not important to the traits of the character. On the other hand, the costumes in the Italian 'Commedia dell'arte' were used to express the characters' traits. The colors, fabric and silhouettes were exaggerated compared to everyday wear. This enhanced the looks of the character, and it kept on developing with the demands of the culture consumer. This study was performed to support further development and success of traditional Korean mask plays.

치과에서의 마스크 및 손의 미생물 오염정도 비교 (A Study of the Mask and Hand Contamination in Dental Clinic)

  • 표은지;이경희
    • 대한통합의학회지
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    • 제7권3호
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    • pp.85-94
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    • 2019
  • Purpose: The purpose of this study was to observe the degree of mask contamination in dental hygienist for general and oral bacteria and to identify areas of mask contamination after treatment. Methods: Masks were collected with every fifty dental hygienists who currently working in the department of preventive dentistry, prosthodontics, and orthodontics in Busan. The mask bacteria were collected in specific upper and side parts of the mask. Hand germs were collected using sterile cotton swabs, and then placed in a sterile conical tube. These were transferred to the laboratory. Hand germs and mask bacteria were incubated with nutrient broth (NB) and brain heart infusion broth (BHI) for 24 hrs and each cultured with NB and BHI plate at $37^{\circ}C$ for 48 hrs. Collected data were analyzed using the SPSS Window 20. Results: The number of bacteria was observed in the order of the department of preventive dentistry ($10.1{\times}10^5CFU/ml$), prosthodontics ($14.7{\times}10^5CFU/ml$), and orthodontics ($23.3{\times}10^5CFU/ml$) in the hand. In general bacteria, the difference of contamination was seen by the parts of the mask, but there was no significant difference. However, the oral bacteria were observed highly contaminated upper part of the mask in preventive dentistry. The mask contamination according to the medical departments was observed. Especially, the contamination of mask in preventive dentistry was significantly higher than other departments in oral bacteria. Conclusion: This study suggested that correct mask replacement and recognition of contamination areas can contribute to the prevention of infectious disease. and it would be necessary to increase hand hygiene performance to prevent cross-infection with masks. Also, this study may give an idea for making guidelines for mask management and supporting to establish clear criteria for the education program of personal protective equipment.

종이 기반과 플라스틱 기반 보건마스크 패키징의 환경영향 비교 (Comparison of Environmental Evaluation for Paper and Plastic Based Mask Packaging)

  • 강동호;고유진;오상훈;추고현;장지수;이준혁;심진기
    • 한국포장학회지
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    • 제30권1호
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    • pp.73-83
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    • 2024
  • In this study, environmental evaluation of high barrier coated paper (coating layer/paper) packaging is conducted in comparison with conventional aluminum laminated (PET/VMPET/LLDPE) plastic packaging. The target product for this packaging is a KF94 mask, which requires a high barrier of water and oxygen to maintain the filtration ability of the mask filter. The functional unit of this study is 10,000 mask packaging materials based on a material capable of blocking oxygen (<1 g/m2day) and moisture (<3 g/m2day) for the preservation of KF94 masks. In order to understand the results easily, paper-based mask packaging system divided into 6 stages (pulp, pulping & paper making, calendaring & coating, printing, packing and waste management), while plastic-based mask packaging consists of 5 stages (material production, processing, printing, packing, waste management) In case of paper-based mask packaging, most contributing stage is calendaring & coating, resulting from heat and electricity production. On the other hand, plastic-based mask packaging is contributed more than 30% by material production, specifically due to linear low density polyethylene and purified terephthalic acid production. The comparison results show that global warming potential of paper-based mask packaging has 32% lower than that of plastic-based mask packaging. Most of other impact indicators revealed in similar trend.

Low-energy EPL 마스크 구현을 위한 특성 연구 (Characteristics for making the mask of low-energy EPL)

  • 김태근;함동은;신수범;김우삼;김치호;정용재;안진호
    • 한국마이크로전자및패키징학회:학술대회논문집
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    • 한국마이크로전자및패키징학회 2003년도 기술심포지움 논문집
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    • pp.191-194
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    • 2003
  • Low energy EPL용 마스크 구현을 위한 특성을 연구하였다. Monte Carlo 법을 이용하여 시뮬레이터를 제작하였고, pattern side wall의 slope와 membrane의 Thickness, 전자빔의 가속전압에 따른 전자빔의 거동을 확인함을 통하여 Low energy EPL용 마스크 제작을 위한 spec.을 도출하였다. 또한 실제 제작을 위한 기초단계로 Si etching을 수행하였으며, mask 제작법에 대한 가능성을 확인할 수 있었다.

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FPD용 노광 스테이지의 통합 제어시스템 구현 (Implementation of Exposure Stage Integrated Control System for FPD)

  • 김종원;서재용;조현찬;조태훈;강흥석
    • 반도체디스플레이기술학회지
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    • 제5권4호
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    • pp.11-15
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    • 2006
  • Expose equipment system that is used for manufacturing process of Flat Panel Display, is most important equipment in whole process. Expose equipment that is for making pattern of mask on substrate, consists of optical part, stage part and transport part. The stage is an important part that aligns mask and substrate for delivering pattern of mask to substrate exactly. In this paper, control system of expose stage that is able to use mask and substrate of diverse size, with PC controller using GUI interface instead of PLC control system. The existing PLC control system does not have the suitable structure for using mask of diverse size. GUI interface integration control system is based on PC. So it has the advantage of convenient use and active operation. We embodied PLC control system in integration control system based on PC, and verified utility possibility through the standard test course.

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사이키델릭의 미적특성을 응용한 아트마스크 디자인 연구 (A Study on Application of the Aesthetic Characteristics of Psychedelia in Art Mask Design)

  • 윤희
    • 한국엔터테인먼트산업학회논문지
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    • 제15권6호
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    • pp.15-22
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    • 2021
  • 본 연구는 사이키델릭의 미적 특성을 모티브로 한 아트마스크를 제작함으로써 감각적이고 창의적인 아트마스크 디자인 개발에 방향성을 제시하고자 한다. 선행연구와 전문서적, 예술작품 등을 중심으로 사이키 델릭의 개념 정의와 특성을 고찰하였다. 이론연구를 바탕으로 한 사이키델릭의 미적특성은 연구자의 작품 제작에 많이 사용되고 있는 착시성, 추상성, 유희성, 역동성으로 제한하여 살펴보았고, 이를 아트마스크 디자인에 접목하여 연구작품 4점을 제작하였다. 본 연구를 통해 형식이나 전통에 구애받지 않는 작품의 다양화를 시도함으로써 아트마스크의 무한한 창작을 가능하게 하고 현대적인 새로운 미로 승화 시킬 수 있었다. 또한 사이키델릭의 외적 특성과 함께 내적인 의미를 작품디자인에 표현함으로써 아트마스크에 대한 새로운 인식과 가치관의 성립을 가져오게 하였다. 향후 이와 같은 연구가 아트마스크 디자인 관련 후속 연구의 기초자료로 활용되기를 기대해 보며 아트마스크 디자인 개발에 도움이 되길 바란다.

미세입자 분사가공에서 SU-8 마스크의 특성 (Characteristics of SU-8 Mask for Abrasive Jet Machining)

  • 고태조;박동진;김희술
    • 한국정밀공학회지
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    • 제24권1호
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    • pp.71-78
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    • 2007
  • Abrasive jet machining (AJM) has been traditionally used for removing rusts or paints. Nowadays, this is promising technology for micro bulk machining where brittle substrate materials are used. In order to get accurate details, masks such as metal, polymer or elastomer is inevitable. Among them, photo polymer which is sensitive to the light has been attractive for it's high accuracy using photolithography. In this research, SU-8 as a photo polymer is used since it is adequate for making thick mask. So, this paper describes how to make AJM masks using SU-8 with a photolithography process, and investigates the characteristics of SU-8 masks during AJM process. Also, an example of fabrication using AJM was shown.