• 제목/요약/키워드: MFC(Mass Flow Controller)

검색결과 29건 처리시간 0.023초

A MFC Control Algorithm Based on Intelligent Control

  • Lee, Seok-Ki;Lee, Seung-Ha;Lee, Yun-Jung
    • 제어로봇시스템학회:학술대회논문집
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    • 제어로봇시스템학회 2003년도 ICCAS
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    • pp.1295-1299
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    • 2003
  • The Mass Flow Controller(MFC) has become crucial in semiconductor manufacturing equipments. It is an important element because the quality and the yield of a semiconductor process are decided by the accurate flow control of gas. Therefore, the demand for the high speed and the highly accurate control of MFCs has been requested. It is hard to find an article of the control algorithm applied to MFCs. But, it is known that commercially available MFCs have PID control algorithms. Particularly, when the system detects the flow by way of heat transfer, MFC control problem contains the time delay and the nonlinearity. In this presentation, MFC control algorithm with the superior performance to the conventional PID algorithm is discussed and the superiority is demonstrated through the experiment. Fuzzy controller was utilized in order to compensate the nonlinearity and the time delay, and the performance is compared with that of a product currently available in the market. The control system, in this presentation, consists of a personal computer, the data acquisition board and the control algorithm carried out by LabWindows/CVI program on the PC. In addition, the method of estimating an actual flow from sensor output containing the time delay and the nonlinearity is presented. In conclusion, according to the result of the experiment, the proposed algorithm shows better accuracy and is faster than the conventional controller.

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MFC의 퍼지제어기 구현 (Implementation of Fuzzy Controller for MFC)

  • 이석기;이연정;이승하
    • 한국지능시스템학회논문지
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    • 제14권5호
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    • pp.648-654
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    • 2004
  • 반도체 제조 장비에서 가스의 질량 흐름 제어기(Mass Flow Controller: MFC)가 차지하는 비중은 매우 크다. 가스의 흐름 제어가 곧 반도체 소자의 품질 및 수율을 결정하는 중요한 요소이기 때문이다. 따라서 MFC의 고속, 고정밀 제어를 구현하기 위한 요구가 높아지고 있다. MFC의 제어 알고리즘에 관한 연구 선례는 찾아보기가 매우 힘들다. 그러나 일반적으로 PID 제어 알고리즘을 사용되는 것으로 알려지고 있다. MFC 제어의 어려움은 열에 의해 흐름을 감지하는 시스템일 경우 느린 응답 특성과 비선형성을 포함한다는 데 있다. 본 논문에서는 기존의 PID 알고리즘 보다 더 우수한 성능을 보이는 MFC 제어 알고리즘을 제시하고 실험을 통해 그 우수성을 보인다. 비선형성과 느린 응답 특성을 보상하기 위하여 퍼지제어 알고리즘을 적용하였으며 그 성능을 현재 상용화된 제품과 비교하였다. 본 논문에서 제안한 알고리즘은 PC와 PC에 장착된 데이터 획득 보드를 통하여 제어루프를 형성하였고, PC상에서 LabWindows/CVI 프로그램으로 제어알고리즘을 구현하였다. 또한, 느린 응답 특성이 존재하는 센서출력으로부터 실제의 흐름을 추정하는 하나의 방법도 제시하였다. 실험결과 본 논문에서 제안하는 알고리즘이 기존의 제품보다 더 빠르고, 더 정확한 제어성능을 보였다.

대기 중 오염물질의 시료채취시 관측오차 저감방법에 대한 연구 : 6구형 매니폴더를 장착한 MFC system의 개발과 평가 (Methodological Approaches to Reduce Uncertainties Associated with Air Sampling : Development and Assessment of a Six-port Manifold MFC System)

  • 김기현;오상인;최여진;김민영;최규훈
    • 한국대기환경학회지
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    • 제19권4호
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    • pp.377-386
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    • 2003
  • In order to develop a confident sampling technique, we designed and constructed a 6-port manifold MFC sampling system for collecting gaseous pollutants in air. Using this instrumentation, we tested the performance criteria of MFC system in terms of: (1) flow rate; (2) MFC-to-MFC variability; (3) tube-to-tube variability; and (4) time. It was interesting to find that the later two factors did not show any significant variations, while the former two show substantially large variations. However, as most of those variabilities are consistent enough to form systematic patterns, we were able to explain the occurrence patterns of all those MFC biases in terms of those four major variables. The overall results of our experiment suggest that one needs to use correction factor for each MFC unit under a given flow rate to maintain optimal accuracy and precision for sampling of those pollutants.

질량 유량계 센서관에서의 열전달 현상에 대한 수치적 해석 및 실험적 연구 (Experimental and Numerical Analysis of Heat Transfer Phenomena in a Sensor Tube of a Mass Flow Controller)

  • 장석필;김성진;최도형
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2000년도 춘계학술대회논문집B
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    • pp.154-161
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    • 2000
  • As a mass flow controller is widely used in many manufacturing processes for controlling a mass flow rate of gas with accuracy of 1%, several investigators have tried to describe the heat transfer phenomena in a sensor tube of an MFC. They suggested a few analytic solutions and numerical models based on simple assumptions, which are physically unrealistic. In the present work, the heat transfer phenomena in the sensor tube of the MFC are studied by using both experimental and numerical methods. The numerical model is introduced to estimate the temperature profile in the sensor tube as well as in the gas stream. In the numerical model, the conjugate heat transfer problem comprising the tube wall and the gas stream is analyzed to fully understand the heat transfer interaction between the sensor tube and the fluid stream using a single domain approach. This numerical model is further verified by experimental investigation. In order to describe the transport of heat energy in both the flow region and the sensor tube, the Nusselt number at the interface between the tube wall and the gas stream as well as heatlines is presented from the numerical solution.

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반도체 공정용 차압식 질량 유량 제어 장치의 개발 및 성능 평가 (Development and Evaluation of Differential Pressure Type Mass Flow Controller for Semiconductor Fabrication Processing)

  • 안진홍;강기태;안강호
    • 반도체디스플레이기술학회지
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    • 제7권3호
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    • pp.29-34
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    • 2008
  • This paper describes the fabrication and characterization of a differential pressure type integrated mass-flow controller made of stainless steel for reactive and corrosive gases. The fabricated mass-flow controller is composed of a normally closed valve and differential pressure sensor. A stacked solenoid actuator mounted on a base-block is utilized for precise and rapid control of gas flow. The differential pressure flow sensor consisting of four diaphragms can detect a flow rate by deflection of diaphragm. By a feedback control from the flow sensor to the valve actuator, it is possible to keep the flow rate constant. This device shows a fast response less than 0.3 sec. Also, this device shows accuracy less than 0.1% of full scale. It is confirmed that this device is not attacked by toxic gas, so the integrated mass-flow controller can be applied to advanced semiconductor processes which need fine mass-flow control corrosive gases with fast response.

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압전체로 구동되는 질량흐름 제어기에서 레이놀즈 방정식을 이용한 유량 특성 연구 (A Study of Flow Characteristics using Reynold's Equation on Mass Flow Controller Actuated by Piezoelectric Material)

  • 이상경;김영수
    • 동력기계공학회지
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    • 제7권3호
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    • pp.69-73
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    • 2003
  • In this paper, the relation between displacement of piezoelectric disk and electric field was proposed. From Navier-Stokes equation and Reynold's equation, the relation between flow and gap of plate was determined. This models were further verified by experiments. Based on theoretical study and experimental verification, the proposed model between flow rate and voltage can be used in the design of mass flow controller in gas supplying system.

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열전대 센서와 압전체 구동기가 부착된 유량제어기의 DC 이득과 시상수를 이용한 제어에 대한 연구 (A Study for Control using DC Gain and Time Constant of Flow Controller Operated by Piezoelectric Actuator and Thermocouple)

  • 이상경;김영수
    • 한국기계가공학회지
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    • 제3권1호
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    • pp.79-83
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    • 2004
  • This study was how to control the mass flow controller in gas supplying system. The flow controller consists of piezoelectric material and sensor with heating wire. It is difficult to obtain accurate model, because MFC was composed of many parts, and the relationship between input and output of controller is nonlinear. The model for control was obtained by time constant and DC gain Based on this model, PID controller was applied to flow controller using DSP board. Also, the results were compared to controller using system identification.

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임의의 공정 변화에 따른 진공펌프의 소음${\cdot}$진동 평가를 위한 MFC 컨트롤 시스템 개발 (Development of The MFC Control System for Evaluating Noise and Vibration of Vacuum Pump According to Arbitrary Process Change)

  • 류제담;정완섭;임종연;홍동표
    • 한국음향학회:학술대회논문집
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    • 한국음향학회 2004년도 추계학술발표대회논문집 제23권 2호
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    • pp.313-316
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    • 2004
  • 진공펌프의 상태를 미리 알고 대처하는 것은 수많은 진공펌프를 사용하는 반도체 회사에게는 경제적인 이익을 준다. 진공펌프의 상태를 파악하기 위해서는 실제 공정에서 많은 실험을 해야만 한다. 하지만 실제 공정에서 실험을 하기에는 많은 제약과 문제점들이 따른다. 이를 해결하기 위해 본 연구는 MFC(Mass Flow Controller)를 이용하여 실제 공정과 유사한 압력조건을 생성할 수 있는 시뮬레이션 시스템을 구축하였다.

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반도체 제조장비용 챔버 가스누출 방지를 위한 제어모듈 개발 (Controller for Gas Leakage Protection in Semiconductor Process Chamber)

  • 박성진;이의용;설용태
    • 한국산학기술학회논문지
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    • 제6권5호
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    • pp.373-377
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    • 2005
  • 본 논문에서는 반도체 제조장비의 챔버 내부 가스누출을 방지하기위한 보완모듈을 제시하였다. MFC(mass flow controller) 다음단의 최종밸브와 챔버 사이의 가스관에 압력센서를 부착시켜, 압력센서의 신호와 최종밸브의 동작신호를 디지털 회로를 이용하여 실시간으로 감지하고 가스누출을 방지하도록 하였다. LED 모듈을 이용하여 공정중에 발생하는 2차 소성물로 인한 가스의 흐름과 관련된 시스템 고장을 표시한다. 본 연구에서 개발한 모듈을 이용하면 챔버 내에서의 가스누출로 인한 장비의 손상과 안전사고 등을 예방하는 효과가 있다.

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