• 전력전자학회:학술대회논문집
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• 전력전자학회 1997년도 전력전자학술대회 논문집
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• pp.239-242
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• 1997

In this paper, the new filter that reduced output ripple to zero is proposed. This filter is composed of transformer and capacitor. The operating mode is verified with theoretical analysis of low ripple filter and computer simulation. DC-DC converter of input voltage DC 100[V], output 30[V]/30[A], switching frequency 20[KHz] is manufactured. In the result, computer simulation analysis is same to experimental result.

• 전력전자학회:학술대회논문집
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• 전력전자학회 2000년도 전력전자학술대회 논문집
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• pp.384-387
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• 2000

In this paper Power factor correction circuit of single-phase three-level boost converter is proposed. The advantage of the proposed control scheme for three-level boost converter are low blocking voltage of each power device low THD(Total Harmonic Distortion) and high power factor. The control scheme is based on the current comparator capacitor compensator and region detector, In simulations the proposed system is validated.

• 대한전자공학회:학술대회논문집
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• 대한전자공학회 1999년도 하계종합학술대회 논문집
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• pp.357-360
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• 1999

A 20 MHz CMOS continuous low-pass filter using simulated floating inductor consisted of two fully-differential transconductors and a capacitor is presented. The theory of operation is described and simulation results show close agreement between predicted behaviour and experimential performance. Simulation results show that the filter has ripple bandwidth of 22 MHz, pass-band ripple of 0.36 ㏈. and cutoff frequency of 26 MHz at supplay voltage of $\pm$3 V. The power dissipation is 19.2 ㎽.

• 한국생산제조학회지
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• 제24권1호
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• pp.124-129
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• 2015

The performance of a passenger vehicle has been greatly improved recently owing to the intensive use of electronic controllers. Many components of a vehicle, including the engine, are controlled by electronic systems installed in the vehicle. Therefore, the electrical power required for such electronics has increased significantly. However, the electrical power generated by the vehicle's alternator, operated by the engine, is limited, and when the vehicle is started, a large instantaneous current is required. The voltage of the vehicle electrical system fluctuates to a very low level, then, it is gradually recovered. This case is very severe and can even cause damage to electronic systems. In this study, a voltage-stabilizing module comprising electric double layer supercapacitors, which could alleviate the voltage variation, was developed and tested.

• Journal of Power Electronics
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• 제16권5호
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• pp.1861-1868
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• 2016

In this paper, a three-phase AC-DC high step-up converter is developed for application to microscale wind-power generation systems. Such an AC-DC boost converter prossessess the property of the single-switch high step-up DC-DC structure. For power factor correction, the advanced half-stage converter is operated under the discontinuous conduction mode (DCM). Simulatanously, to achieve a high step-up voltage gain, the back half-stage functions in the continuous conduction mode (CCM). A high voltage gain can be obtained by use of an output-capacitor mass and a coupled inductor. Compared to the output voltage, the voltage stress is decreased on the switch. To lessen the conducting losses, a low rated voltage and small conductive resistance MOSFETs are adopted. In addition, the coupled inductor retrieves the leakage-inductor energy. The operation principle and steady-state behavior are analyzed, and a prototype hardware circuit is realized to verify the performance of the proposed converter.

• 한국세라믹학회지
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• 제32권3호
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• pp.371-377
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• 1995

Silicon oxide films were grown on single-crystal silicon substrates at low temperatures (25~205$^{\circ}C$) in a low pressure electron cyclotron resonance (ECR) oxygen plasma. The growth rate of the silicon oxide film increased as the temperature increased or the pressure decreased. Also, the thickness of the silicon oxide film increased at negative bias voltage, but not changed at positive bias voltage. The growth law of the silicon oxide film was approximated to the parabolic form. Capacitance-voltage (C-V) and current density-electric field (J-E) characteristics were studied using Al/SiO2/p-Si MOS structures. For a 10.2 nm thick silicon oxide film, the leakage current density at the electric field of 1 MVcm-1 was less than 1.0$\times$10-8Acm-2 and the breakdown field was higher than 10 MVcm-1. The flat band voltage of Al/SiO2/p-Si MOS capacitor was varied in the range of -2~-3 V and the effective dielectric constant was 3.85. These results indicate that high quality oxide films with properties that are similar to those of thermal oxide film can be fastly grown at low temperature using the ECR oxygen plasma.

• Journal of electromagnetic engineering and science
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• 제14권4호
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• pp.376-381
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• 2014

We present a CMOS rail-to-rail class-AB amplifier using dynamic current biasing to improve the delay response of the error amplifier in a low-dropout (LDO) regulator, which is a building block for a wireless power transfer receiver. The response time of conventional error amplifiers deteriorates by slewing due to parasitic capacitance generated at the pass transistor of the LDO regulator. To enhance slewing, an error amplifier with dynamic current biasing was devised. The LDO regulator with the proposed error amplifier was fabricated in a $0.35-{\mu}m$ high-voltage BCDMOS process. We obtained an output voltage of 4 V with a range of input voltages between 4.7 V and 7 V and an output current of up to 212 mA. The settling time during line transient was measured as $9{\mu}s$ for an input variation of 4.7-6 V. In addition, an output capacitor of 100 pF was realized on chip integration.

• 전기전자학회논문지
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• 제18권4호
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• pp.447-455
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• 2014

본 연구에서는 4H-SiC MOSFET의 주요 문제점인 $SiC/SiO_2$ 계면의 특성을 향상시키기 위해 PECVD (plasma enhanced chemical vapor deposition) 공정을 이용하여 n-based 4H-SiC MOS Capacitor를 제작하였다. 건식 산화 공정의 낮은 성장속도, 높은 계면포획 밀도와 $SiO_2$의 낮은 항복전계 등의 문제를 극복하기 위하여 PECVD와 NO어닐링 공정을 사용하여 MOS Capacitor를 제작하였다. 제작이 끝난 후, MOS Capacitor의 계면특성을 hi-lo C-V 측정, I-V 측정 및 SIMS를 이용해 측정하고 평가하였다. 계면의 특성을 건식 산화의 경우와 비교한 결과 20% 감소한 평탄대 전압 변화, 25% 감소한 $SiO_2$ 유효 전하 밀도, 8MV/cm의 증가한 $SiO_2$ 항복전계 및 1.57eV의 유효 에너지 장벽 높이, 전도대 아래로 0.375~0.495eV만큼 떨어져 있는 에너지 영역에서 69.05% 감소한 계면 포획 농도를 확인함으로써 향상된 계면 및 산화막 특성을 얻을 수 있었다.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제51권8호
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• pp.340-346
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• 2002

Capacitor material utilized in the downsizing passive devices and integration of passive devices requires the physical and electrical properties at given area such as capacitor thickness reduction, relative dielectric constant increase, low leakage current and thermal stability. common capacitor materials, $Al_2O_3$, $SiO_2$, $Si_3N_4$, $SiO_2$/$Si_3N_4$, TaN and et al., used until recently have reached their physical limits in their application to integration of passive devices. $Ta_2O_{5}$ is known to be a good alternative to the existing materials for the capacitor application because of its high dielectric constant (25~35), low leakage current and high breakdown strength. Despite the numerous investigations of $Ta_2O_{5}$ material, there have little been established the clear understanding of the annealing effect on capacitance characteristic and conduction mechanism. This study presents the dielectric properties $Ta_2O_{5}$ MIM capacitor structure Processed by $O_2$ RTA oxidation. X-ray diffraction patterns showed the existence of amorphous phase in $600^{\circ}C$ annealing under the $O_2$ RTA and the formation of preferentially oriented-$Ta_2O_{5}$ in 650, $700^{\circ}C$ annealing and the AES depth profile showed $O_2$ RTA oxidation effect gives rise to the $O_2$ deficientd into the new layer. The leakage current density respectively, at 3~1l$\times$$10_{-2}$(kV/cm) were $10_{-3}$~$10_{-6}$(A/$\textrm{cm}^2$). In addition, behavior is stable irrespective of applied electric field. the frequency vs capacitance characteristic enhanced stability more then $Ta_2O_{5}$ thin films obtained by $O_2$ reactive sputtering. The capacitance vs voltage measurement that, Vfb(flat-band voltage) was increase dependance on the $O_2$ RTA oxidation temperature.

• 한국결정성장학회지
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• 제14권3호
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• pp.90-94
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• 2004

The variation of electrical properties of (Ba,Sr)$TiO_3$ [BST] thin films for Metal-Insulator-Semiconductor (MIS) capacitors was investigated. BST thin films were deposited on p-Si(100) substrates by the RF magnetron sputtering with temperature range of 500~$600^{\circ}C$. The dielectric properties of MIS capacitors consisting of AUBST/$SiO_2$/Si sandwich structure were measured for various conditions. We examined the characteristics of MIS capacitor with various oxygen pressure, substrate temperature and (Ba+Sr)/Ti ratio. It was found that the leakage current was reduced in MIS capacitor with high quality $SiO_2$ layer was grown on bare p-Si substrate by thermal oxidation. The BST MIS structure showed relatively high capacitance even though it is the combination of high-dielectric BST thin films and $SiO_2$ layer. The charge state densities of the MIS capacitors and Current-voltage characteristics of the MIS capacitor were investigated. By applying $SiO_2$ layer between BST thin films and Si substrate, low leakage current of $10^{-10}$ order was observed.