• 제목/요약/키워드: Low Temperature Performance

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저온용 대체냉매의 성능 특성 연구 (Performance Characteristics Study on an Alternative Refrigerant in Low Temperature Applications)

  • 신정섭;김만회
    • 한국수소및신에너지학회논문집
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    • 제27권4호
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    • pp.462-469
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    • 2016
  • This paper presents the results of thermodynamic cycle analysis and performance tests of alternative mixtures in low temperature applications. Two near-azeotropic binary mixtures R-152a/R-1270 (35:65 by wt.%) and R-290/E170 (35:65 by wt.%) are considered in this study. They have zero ODP (Ozone Depletion Potential) and much lower GWP (Global Warming Potential) than R-404A which is an alternative of R-502. Refrigeration cycle characteristics such as cooling capacity, coefficient of performance, suction and discharge pressures and temperatures are compared to those for the baseline refrigerants (R-502 and R-404A) cycles. The performance tests are conducted at the evaporation and condensation temperatures of $5^{\circ}C$ and $45^{\circ}C$, subcooling and superheating temperatures of $5^{\circ}C$, respectively. Performance comparisons between baseline and alternative refrigerants are conducted on the same cooling capacity. The system performance of newly proposed refrigerant mixtures show promising results.

저온 중수소 어닐링을 활용한 Enclosed-Layout Transistors (ELTs) 소자의 제작 및 전기적 특성분석 (Fabrication of Enclosed-Layout Transistors (ELTs) Through Low-Temperature Deuterium Annealing and Their Electrical Characterizations)

  • 왕동현;김동호;길태현;연지영;김용식;박준영
    • 한국전기전자재료학회논문지
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    • 제37권1호
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    • pp.43-47
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    • 2024
  • The size of semiconductor devices has been scaled down to improve packing density and output performance. However, there is uncontrollable spreading of the dopants that comprise the well, punch-stop, and channel-stop when using high-temperature annealing processes, such as rapid thermal annealing (RTA). In this context, low-temperature deuterium annealing (LTDA) performed at a low temperature of 300℃ is proposed to reduce the thermal budget during CMOS fabrication. The LTDA effectively eliminates the interface trap in the gate dielectric layer, thereby improving the electrical characteristics of devices, such as threshold voltage (VTH), subthreshold swing (SS), on-state current (ION), and off-state current (IOFF). Moreover, the LTDA is perfectly compatible with CMOS processes.

50 kVA 주상용 몰드변압기의 설계 및 특성평가 (The Design and Performance Test of Mold Transformer for Outdoor Pole)

  • 조한구;이운용;황보국
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 춘계학술대회 논문집 유기절연재료 전자세라믹 방전플라즈마 일렉트렛트 및 응용기술
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    • pp.132-137
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    • 2002
  • The mold transformers have been widely used in underground substations in large building and have some advantages in comparison to oil-transformer, that is low fire risk, excellent environmental compatibility, compact size and high reliability. In addition, the application of mold transformer for outdoor is possible due to development of epoxy resin. The mold transformer generally has cooling duct between low voltage coil and high voltage coil. A mold transformer made by one body molding method has been developed for small size and low loss. The life of transformer is significantly dependent on the thermal behavior in windings. To analyse winding temperature rise, many transformer designer have calculated temperature distribution and hot spot point by finite element method(FEM). Recently, numerical analyses of transformer are studied for optimum design, that is electric field analysis, magnetic field, potential vibration, thermal distribution and thermal stress. In this paper, the temperature distribution of 50 kVA pole mold transformer for power distribution are investigated by FEM program and the temperature rise test of designed mold transformer carried out and test result is analyzed compare to simulation data. In this result, the designed mold transformer is satisfied to limit value of temperature and the other property is good such as voltage ratio, winding resistance, no-load loss, load loss, impedance voltage and percent regulation.

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Influence of Different Environmental Conditions on Cocoon Parameters and Their Effects on Reeling Performance of Bivoltine Hybrids of Silkworm, Bombyx mori. L.

  • Gowda B. Nanje;Reddy N. Mal
    • International Journal of Industrial Entomology and Biomaterials
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    • 제14권1호
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    • pp.15-21
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    • 2007
  • Three newly authorized bivoltine silkworm hybrids namely, $CSR2{\times}CSR4$ (productive single hybrid), $(CSR6{\times}CSR26){\times}(CSR2{\times}CSR27)$ (productive double hybrid) and $CSR18{\times}CSR19$ (robust single hybrid) were chosen for the present study. These hybrids were subjected to different temperature and humidity treatments i.e., $25{\pm}$1^{\circ}C and RH $65{\pm}5%$ (control), $30{\pm}1^{\circ}C$, with combinations of low relative humidity (RH $65{\pm}5%$) and high RH ($85{\pm}5%$) at different stages during rearing and spinning of silkworm larvae. The larvae of after 3rd moult were subjected to different thermal and humidity stress till the assessment of cocoon traits. The comparative rearing and reeling performance clearly indicated that the deleterious effect of high temperature and high RH was more pronounced for the majority of traits such as cocoon uniformity, cocoon weight, shell weight, shell percentage, reelability, filament length, raw silk percentage raw silk recovery denier and waste percentage on silk weight than other temperature and RH treatments and this effect was almost similar for all three silkworm hybrids studied. The present investigation clearly indicate that the deleterious effect of high temperature and high RH was more pronounced on rearing and spinning of silkworm larvae than other temperature and RH treatments and similar effect was noticed for all the three silkworm hybrids studied. The cocoon characters can be improved by providing ideal environmental conditions even during spinning stage of larvae affected with high temperature and RH. The study also suggest that high temperature and low humidity has greater effect during rearing stage than spinning stage.

초저이온 농도범위에서 혼합층 이온교환능과 온도의 영향 - 2. 온도의 영향 - (The Mixed-Bed Ion Exchange Performance and Temperature Effects at Ultra-Low Concentrations - 2.Temperature Effects -)

  • 윤태경;노병일;이창원;문병현;이강춘;조명찬
    • 공업화학
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    • 제10권2호
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    • pp.206-211
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    • 1999
  • 본 연구에서는 NaCl수용액의 초저이온 농도범위 ($1.0{\times}10^{-4}M$ 이하)에서 양이온 교환수지 대 음이온 교환수지의 비, 수지량, 계의 온도를 함수로 한 혼합층 이온교환의 거동을 실험적으로 연구하였다. 실험실 크기의 연속흐름 칼럼을 통하여 양이온 교환수지와 음이온 교환수지의 교환능이 소모될 때까지의 유출농도를 처리된 유량의 함수로 측정하여 파과곡선을 구하였다. 초기누출은 수지량이 적은 경우 양이온과 음이온의 파과곡선에 나타났으나, 선택도계수가 낮은 양이온의 파과곡선에 현격하게 크게 나타났다. 선택도계수는 파과곡선의 기울기에 영향을 미쳤으며, 계수값이 큰 음이온의 파과곡선의 기울기가 급격하였다. 온도변화는 파과곡선의 기울기에 영향을 미쳤으며, 온도가 증가할수록 이온교환속도가 증가하였다. 이 온도효과는 수지비에 관계없이 수지총량이 증가할수록 또는 이온교환수지의 교환능이 감소하여 파과곡선이 평형에 가까워질수록 감소하였다.

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고성능 흡수냉동 사이클의 특성 시뮬레이션 (Simulation of the Characteristics of High-Performance Absorption Cycles)

  • 윤정인;오후규;이용화
    • 대한기계학회논문집
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    • 제19권1호
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    • pp.231-239
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    • 1995
  • This paper describes a computer simulation of the triple effect, water-lithium bromide absorption cooling cycles. The performance of the absorption systems is investigated through cycle simulation to obtain the system characteristics with the cooling water inlet temperature, the working solution concentrations, the ratio of the amount of the weak solution to the high, middle and low temperature generators, and the temperature difference of each solution heat exchanger. The efficiency of different cycles has been studied and the simulation results show that higher coefficient of performance could be obtained for the parallel cycle of constant solution distribution rate. As a result of this analysis, the optimum designs and operating conditions were determined based on the operating conditions and coefficient of performance.

TFT Technology for Flexible Display Applications

  • Kim, Chang-Dong;Kang, In-Byeong;Chung, In-Jae
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권2호
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    • pp.1767-1770
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    • 2007
  • The key development issues in the flexible displays are TFT backplane technology for their various applications, which requires competitive device performance as well as its low temperature process. In this paper, with shortly reviewing recent flexible display development status, we describe technical trends of low-temperature a-Si TFTs. Our TFTs show good device characteristics enough to apply LCD and electrophoretic display.

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Excimer-Laser Annealing for Low-Temperature Poly-Si TFTs

  • Kim, Hyun-Jae
    • Journal of Information Display
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    • 제4권4호
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    • pp.1-3
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    • 2003
  • For excimer laser annealing (ELA), energy density, number of pulses, beam uniformity, and condition of initial amorphous Si (a-Si) films are significant factors contributing to the final microstructure and the performance of low-temperature polycrystalline Si (LTPS) TFTs. Although the process and equipment have been significantly improved, the environmental factors associated with initial amorphous Si (a-Si) films and process conditions are yet to be optimized.

Reliability Aging of Oxide Integrity on Low Temperature Polycrystalline Silicon TFTs

  • Chen, Chih-Chiang;Hung, Wen-Yu;Chen, Pi-Fu;Yeh, Yung-Hui
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2002년도 International Meeting on Information Display
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    • pp.515-518
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    • 2002
  • In this paper, we demonstrate the impact of oxide interface-state on low temperature poly-Si TFTs. The TFTs with interface-state exhibit poor performance and serious degradation under hot carrier and gate bias stress. Our results indicate that the worse oxide integrity cause initial characteristic shift and device instability.

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Excimer-Laser Crystallization for Low-Temperature Polycrystalline Si TFTs

  • Kim, Hyun-Jae
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2000년도 제1회 학술대회 논문집
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    • pp.151-152
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    • 2000
  • For excimer laser crystallization (ELC), energy density, number of pulses, beam uniformity, and condition of initial amorphous Si (a-Si) films are significant factors contributing the final microstructure and the performance of low-temperature polycrystalline Si TFTs. The process and equipment have been achieved a significant improvement, but still, environmental factors associated with initial amorphous Si (a-Si) films and process conditions need to be optimized.

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