• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.05b
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• pp.30-33
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• 2001

Chemical mechanical polishing(CMP) process has been widely used to planarize dielectrics, which can apply to employed in integrated circuits for sub-micron technology. Despite the increased use of CMP process, it is difficult to accomplish the global planarization of free-defects in inter-level dielectrics (ILD). Especially, defects like micro-scratch lead to severe circuit failure, and affects yield. CMP slurries can contain particles exceeding $1{\mu}m$ size, which could cause micro-scratch on the wafer surface. The large particles in these slurries may be caused by particle agglomeration in slurry supply line. To reduce these defects, slurry filtration method has been recommended in oxide CMP. In this work, we have studied the effects of filtration and the defect trend as a function of polished wafer count using various filters in inter-metal dielectric(IMD)-CMP. The filter installation in CMP polisher could reduce defect after IMD-CMP. As a result of micro-scratches formation, it shows that slurry filter plays an important role in determining consumable pad lifetime.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.05b
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• pp.34-37
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• 2001

As the integrated circuit device shrinks to smaller dimensions, chemical mechanical polishing (CMP) process was required for the global planarization of inter-metal dielectric (IMD) layer with free-defect. However, as the inter-metal dielectrics (IMD) layer gets thinner, micro-scratches are becoming as major defects. Micro-scratches are generated by agglomerated slurry, solidified and attached slurry in pipe line of slurry supply system. To prevent agglomerated slurry particle from inflow, we installed 0.5${\mu}m$ POU (point of use) filter, which is depth-type filter and has 80% filtering efficiency for the $1.0{\mu}m$ size particle. In this paper, we studied the relationship between defect generation and pad count to understand the exact efficiency of the slurry filtration, and to find out the appropriate pad usage. Our preliminary results showed that it is impossible to prevent defect-causing particles perfectly through the depth-type filter. Thus, we suggest that it is necessary to optimize the flow rate of slurry to overcome depth type filters weak-point, and to install the high spray of de-ionized Water (DIW) with high pressure.

• Journal of Information Display
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• v.10 no.4
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• pp.202-205
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• 2009

An automated circuit repair system was developed for enhancing the yield of nondefective liquid crystal panels, focusing on the resist patterns on the circuit material layer of thin-film transistor (TFT) substrates prior to etching. The developed system has an advantage over the parallel conventional system: In the former, the repair conditions depend on the type of resist whereas in the latter, the repair parameters must be fine-tuned for each circuit material. The developed system consists of a resist pattern defect inspection system and a pattern repair system for short and open defects. The repair system performs fine corrections of abnormal areas of the resist pattern. The open-repair system is equipped with a syringe to dispense resist. To maintain a stable resist diameter, a thermal insulator was installed in the syringe system. As a result, the diameter of the dispensed resist became much more stable than when no thermal insulator was used. The resist diameter was kept within the target of $400{\pm}100{\mu}m$. Furthermore, a prototype system was constructed, and using a dummy pattern, it was confirmed that the system worked automatically and correctly.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.14 no.9
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• pp.707-713
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• 2001

As the integrated circuit device shrinks to smaller dimensions, chemical mechanical polishing (CMP) process was requirdfo the global planarization of inter-metal dielectric (IMD) layer with free-defect. However, as the IMD layer gest thinner, micro-scratches are becoming as major defects. However, as the IMD layer gets thinner, micro-scratches are becoming as major defects. Micro-scratches are generated by agglomerated slurry, solidified and attached slurry in pipe line of slurry supply system. To prevent agglomerated slurry particle from inflow, we installed 0.5${\mu}{\textrm}{m}$ point of use (POU) filter, which is depth-type filter and has 80% filtering efficiency for the 1.0${\mu}{\textrm}{m}$ size particle. In this paper, we studied the relationship between defect generation and polished wafer counts to understand the exact efficiency fo the slurry filteration, and to find out the appropriate pad usage. Our experimental results showed that it sis impossible to prevent defect-causing particles perfectly through the depth-type filter. Thus, we suggest that it is necessary to optimize the slurry flow rate, and to install the high spray bar of de-ionized water (DIW) with high pressure, to overcome the weak-point of depth type filter.

• Clinical Endoscopy
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• v.56 no.4
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• pp.409-422
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• 2023

Endoscopic resection (ER) is widely utilized as a minimally invasive treatment for upper gastrointestinal tumors; however, complications could occur during and after the procedure. Post-ER mucosal defect leads to delayed perforation and bleeding; therefore, endoscopic closure methods (endoscopic hand-suturing, the endoloop and endoclip closure method, and over-the-scope clip method) and tissue shielding methods (polyglycolic acid sheets and fibrin glue) are developed to prevent these complications. During duodenal ER, complete closure of the mucosal defect significantly reduces delayed bleeding and should be performed. An extensive mucosal defect that comprises three-quarters of the circumference in the esophagus, gastric antrum, or cardia is a significant risk factor for post-ER stricture. Steroid therapy is considered the first-line option for the prevention of esophageal stricture, but its efficacy for gastric stricture remains unclear. Methods for the prevention and management of ER-related complications in the esophagus, stomach, and duodenum differ according to the organ; therefore, endoscopists should be familiar with ways of preventing and managing organ-specific complications.

• Proceedings of the KIEE Conference
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• 2003.10a
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• pp.270-272
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• 2003

We have investigated the coupling characteristics of localized modes of line defect i.e., guided modes, in photonic crystals. The parity of the coupled guided modes is not conserved when the distance between the line defects changes. By comparing the coupling characteristics of localized modes without the oscillatory nature such as cavity modes of metallic Fabry-Parot cavities with those of localized modes in photonic crystals, we confirmed that this parity nonconservation is attributed to the oscillatory nature of the evanescent waves of localized modes in photonic crystals.

• Korean Journal of Computational Design and Engineering
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• v.2 no.3
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• pp.133-141
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• 1997

In the process of car body design, various surfaces are generated from the given boundary curves. Depending upon the method of the surface generation and the quality of the boundary curves provided, the resulting surfaces may have global or local irregularities in many cases. Thus it would be necessary for the designer to evaluate the surface quality and to modify the surface or to use the different generation method based on the evaluation results. This capability is very important because the defect of the surface quality detected in the production stage will require the rework of the dies and will cause a big loss in cost and time. A method of surface interrogation using reflection line is introduced. In this paper, We applied reflection mapping to generate reflection lines on the trimmed NURBS surface. Since reflection lines are obtained from reflection mapping that uses simple and physically acceptable mapping algorithm, they can be efficiently used to simulate the reflection test on the real part in the production line.

• Journal of Korean Society of Industrial and Systems Engineering
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• v.22 no.51
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• pp.189-197
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• 1999

Assembly line balancing problem is known as one of difficult combinatorial optimization problems. This problem has been solved with linear programming, dynamic programming approaches. but unfortunately these approaches do not lead to efficient algorithms. Recently, genetic algorithm has been recognized as an efficient procedure for solving hard combinatorial optimization problems, but has a defect that requires long-run time and computational complexties to find the solution. For this reason, we adapt a new method called the Critical Node Method that is intuitive, easy to understand, simple for implementation. Fuzzy set theory is frequently used to represent uncertainty of information. In this paper, to treat the data of real world problems we use a fuzzy number to represent the duration and Critical Node Method based heuristic procedure is developed for solving fuzzy assembly line balancing problem.

• Journal of the Korean Society for Nondestructive Testing
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• v.17 no.3
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• pp.162-173
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• 1997

Automatic on-line surface inspection systems have been applied for monitoring a quality of steel strip surfaces. One of the important issues in this application is the performance of on-line defect classifiers. Rule-based classification table methods which are conventionally used for this purpose have been suffered from their low performances. In this work, probabilistic neural networks and the enhanced classification tables which are newly proposed here are applied as alternative on-line classifiers to identify types of surface defects on cold rolled strips. Probabilistic neural networks have shown very excellent performance for classification of surface defects.

• Proceedings of the KIEE Conference
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• 2004.07c
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• pp.2043-2045
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• 2004

This thesis complemented the weak points that the existing theses did not represented a phase characteristic as the equivalent circuit by applying 4-port simulation to DGS (Defected Ground Structure) characteristic and an equivalent circuit, which are the transmission line structure that has the defect made in the ground surface. We used a distribute device and a lumped device, obtained the equivalent circuit by applying the structure of balun to a discontinuous part. An indicated DGS (Defected Ground structure) is a dumbbells-shaped single defect, we indicated satisfying a magnitude and phase characteristics by applying this equivalent circuit.