• 반도체디스플레이기술학회지
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• 제11권1호
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• pp.7-11
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• 2012

One dimensional and two dimensional nano patterns were fabricated on a 4-inch substrate by Laser Interference Lithography (LIL). Mach-Zehnder interferometer was setup to obtain the interference patterns and adjusted the pattern sizes with change of incident angle. We could obtain a periodic structure with a period of 440 nm using 266 nm laser, and demonstrated a pattern size with $293{\pm}25nm$ over a 4-inch substrate.

• 마이크로전자및패키징학회지
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• 제26권2호
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• pp.9-14
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• 2019

The newly discovered properties of periodic nanoscale patterns have increasingly sparked research interests in various fields. Along this direction, it is worth mentioning that there had been rare studies conducted on interference exposure, a method of creating periodic patterns. Additionally, these few studies seemed to validate the existence of only exact quadrangle shapes and dot patterns. This study asserted the formation of wavy patterns associated to using multiple exposures of the ratio of the first exposure intensity to the second exposure intensity. Such patterns were designed and constructed herein via overlapping of two Gaussian beams relative to certain rotation angles, and with a submicron structure fabricated based on a 360-nm continuous-wave laser. Results confirmed that the proposed double exposure laser interference lithography is able to create circular, elliptical and wavy patterns with no need for complex optical components.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2010년도 추계학술대회 논문집
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• pp.421-422
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• 2010

• 한국자기학회지
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• 제17권3호
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• pp.137-140
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• 2007

레이저 간섭 석판 장비(Laser Interference Lithography; LIL)를 이용하여, Anodic Aluminum Oxide(AAO) 나노기공의 배열을 향상 시켰다. 이후 진공에서 Fe와 Cu를 AAO/Si에 성장하고, AAO를 제거하여 Cu/Fe(20 nm) 나노구조를 제작하였다. AAO의 나노기공과 나노구조는 전처리 과정에서 제작된 PR(photoresist) 나노선을 따라 1차원으로 배열되었다. 자성 나노구조의 자기이력곡선으로부터 이들이 vortex 구조를 가지며, 쌍극자 상호작용이 지배적임을 확인하였다.

• 한국정밀공학회지
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• 제23권12호
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• pp.128-134
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• 2006

Two-dimensional nano-patterns are fabricated using immersion holographic lithography. The photoresist layer is exposed to an interference pattern generated by two incident laser beams($\lambda$=441.6 nm, He-Cd laser) of which the pitch size is less than 200 nm. Good surface profiles of the 2 dimensional patterns are achieved by trimming the lithography process parameters, such as, exposure time, developing time and refractive index of medium liquid.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2005년도 춘계학술대회 논문집
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• pp.676-679
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• 2005

Nano imprint Lithography (NIL) is regarded as one of the next-generation lithography technologies with EUV lithography, immersion lithography, Laser interference lithography. Because a Si wafer stamp and a quartz stamp, used to imprinting usually are very expensive and easily broken, it is suggested that master stamp is duplicated by PDMS and the PDMS stamp uses to imprint .For using the PDMS stamp, a thermally curable monomer resin was used for the imprinting process to lower pressure and temperature. As a result, NIL patterns were successfully fabricated.

• 한국광학회:학술대회논문집
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• 한국광학회 2008년도 동계학술발표회 논문집
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• pp.375-376
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• 2008

• 한국인쇄학회지
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• 제29권3호
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• pp.17-30
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• 2011

The polarizer is an important optical element used in a variety of applications. Nano-wire grid polarizers in the form of sub-wavelength metallic gratings are an attractive alternative to conventional polarizers, because they provide high extinction ratio. This study has been carried out to fabrication of the 17inch area size nano-wire grid polarizer(NWGP) The master for NWGPs with a pitch of 200nm and the area size $730mm{\times}450mm$ were fabricated using laser interference lithography and aluminum sputtering and wet etching. And The NWGP fabrication process was using by the Roll to-Roll UV imprinting and was applied to flexible PET film. The results were a transmission of light (Tp) 46.7%, reflectance (Rs) 40.1% and Extinction ratio of above 16 for the visible light range.

• Journal of Magnetics
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• 제10권2호
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• pp.58-62
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• 2005

Periodic magnetic nanodot arrays were successfully produced on glass substrates by interference laser lithography and electron beam lithography methods. Magnetic force microscopy (MFM) observation was carried out on fabricated nanodot arrays. MFM tip induced magnetization effects were clearly observed in ferromagnetic elliptical nanodots varying in material and aspect ratio. Fe-Cr dots with a high aspect ratio show reversible switching of the single domain magnetization state. At the same time, Co nanomagnets with a low aspect ratio exhibit tip induced transitions between the single domain and the vortex state of magnetization. The simple nanolithography is potentially an efficient method for fabrication of patterned magnetic arrays.

• 한국광학회지
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• 제19권1호
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• pp.20-24
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• 2008

본 논문에서는 광파장 이하의 주기를 갖는 다결정 실리콘1차원 격자 기반의 컬러필터를 제안하고 구현하였다. 이 소자는 레이저 간섭 리소그래피 방식을 도입하여 제작되었으며, 기존의 전자빔 리소그래피 방식에 비해 훨씬 큰 유효 면적을 얻을 수 있었다. 특히, 실리콘 격자 층 상부에 산화막을 도입하여 마스크 층으로 활용함으로써 실리콘의 식각 깊이를 용이하게 조절할 수 있었고, 또한 필터의 컷오프 특성을 개선할 수 있었다. 설계된 소자의 파라미터는 실리콘 박막 두께 100 nm, 산화막 두께 200 nm, 격자 주기 450 nm였다. 제작된 청색 컬러필터의 중심파장은 470 nm이고 투과율은 약 40%였다. 그리고 유효 면적 $3mm{\times}3mm$ 내에서 중심파장의 변화는 2 nm 이하, 상대적인 투과율 변화는 <10%였다. 그리고 빔의 입사각에 대한 상대적인 투과율 변화는 약 1.5%/degree였다.