Proceedings of the Korean Society of Precision Engineering Conference (한국정밀공학회:학술대회논문집)

  • 2005.06a
  • /
  • Pages.676-679
  • /
  • 2005
  • /
  • 2005-8446(pISSN)
Korean Society for Precision Engineering (한국정밀공학회)
권호 표지

Sub 150nm Soft-Lithography using the monomer based thermally curable resin

Monomer based thermally curable resin을 이용한 150nm 급 Soft-Lithography

  • 양기연 (고려대 신소재공학과) ;
  • 홍성훈 (고려대 신소재공학과) ;
  • 이헌 (고려대 신소재공학과)
  • Published : 2005.06.01
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Abstract

Nano imprint Lithography (NIL) is regarded as one of the next-generation lithography technologies with EUV lithography, immersion lithography, Laser interference lithography. Because a Si wafer stamp and a quartz stamp, used to imprinting usually are very expensive and easily broken, it is suggested that master stamp is duplicated by PDMS and the PDMS stamp uses to imprint .For using the PDMS stamp, a thermally curable monomer resin was used for the imprinting process to lower pressure and temperature. As a result, NIL patterns were successfully fabricated.

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