• Journal of Korea Multimedia Society
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• v.20 no.11
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• pp.1803-1810
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• 2017

A large amount of processing time is required if the process of detecting the touch position on the touch screen and displaying it on the display panel is performed only by software. In this paper, we propose a method to output information touched on the screen using H/W method in order to improve the response speed delay. In the FPGA module designed for the HDMI signal output to the display module, the touch information is input to the serial data signal including touch coordinate information, point size, and color information. Then the module render the image using HDMI signal input to the module and the touch information. This method has a pipeline structure so it has effect of reducing the delay time that occurs in outputting the touch information compared with the conventional software processing method.

• 한국정보디스플레이학회:학술대회논문집
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• 2000.01a
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• pp.153-154
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• 2000

Large size poly-Si TFT-LCDs have been fabricated using p-channel thin film transistors for notebook PC application. We have designed and implemented the data sampling circuit and gate drivers that operate with low power consumption and high reliability. The gate driver has a redundant structure. We have realized the uniform and excellent display quality comparable to that of CMOS module. The reliability of panel is investigated and discussed by measuring the bias stability of transistors.

• Journal of the Semiconductor & Display Technology
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• v.21 no.1
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• pp.17-21
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• 2022

In the case of the manufacturing industry that produces high-tech components such as semiconductors and large flat panel displays, the manufacturing space is made into a cleanroom to increase product yield and reliability, and various environmental factors have been managed to maintain the environment. Among them, airborne particle is a representative management item enough to be the standard for actual cleanroom grade, and a sequential particle monitoring system is usually used as one parts of the FMS (Fab or Facility monitoring system). However, this method has a problem in that the measurement efficiency decreases as the length of the sampling tube increases. In this study, in order to solve this problem, a multiple regression model was created. This model can correct the measurement error due to the decrease in efficiency by sampling tube length.

• Journal of Institute of Control, Robotics and Systems
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• v.15 no.9
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• pp.909-915
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• 2009

This work is to develop a vision system for high precision alignment between upper and lower plates required at the imprinting process of the large LCD flat panel. We compose a gantry-stage that has highly repeated accuracy for high precision alignment and achieves analysis about thermal transformations of stage itself. Position error in the stage is corrected by feedback control from the analysis. This system can confirm alignment mark of upper and lower plates by using two cameras at a time for the alignment of two plates. Pattern matching that uses geometric feature is proposed to consider the recognition problem for alignment mark of two plates. It is algorithm to correct central point and angle for the alignment from the recognized mark of upper and lower plates based on the special characteristics. At the alignment process, revision for error position is performed through Look and Move techniques.

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.21 no.3
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• pp.100-109
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• 2022

In this study, calibration technology that increases the alignment accuracy in large flexible flat panels was studied. For precise of calibration, a systematization of the calibration algorithm was established, and a calibration correction technique was studied to revise calibration errors. A coordinate systems of camera and UVW stage was established to get the global position of the mark, and equations for translational and rotational calibration were systematically derived based on geometrical analysis. Correction process for the calibration data was carried, and alignment experiments were performed sequentially in cases of the presence or absence of calibration-correction. Alignment results of both calibration correction and non-calibration correction showed accuracy performance less than 1㎛. On the other hand, the standard deviation in calibration-correction is smaller than non-calibration correction. Therefore, calibration correction showed improvement of the alignment repeatability.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.08a
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• pp.148-148
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• 2011

Recently, there have been many research activities to develop the large-area plasma source, which is able to generate the high-density plasma with relatively good uniformity, for the plasma processing in the thin-film solar cell and display panel industries. The large-area CCP sources have been applied to the PECVD process as well as the etching. Especially, the PECVD processes for the depositions of various films such as a-Si:H, ${\mu}c$-Si:H, Si3N4, and SiO2 take a significant portion of processes. In order to achieve higher deposition rate (DR), good uniformity in large-area reactor, and good film quality (low defect density, high film strength, etc.), the application of VHF (>40 MHz) CCP is indispensible. However, the electromagnetic wave effect in the VHF CCP becomes an issue to resolve for the achievement of good uniformity of plasma and film. Here, we propose a new electrode as part of a method to resolve the standing wave effect in the large-area VHF CCP. The electrode is split up a series of strip-type electrodes and the strip-type electrodes and the ground ones are arranged by turns. The standing wave effect in the longitudinal direction of the strip-type electrode is reduced by using the multi-feeding method of VHF power and the uniformity in the transverse direction of the electrodes is achieved by controlling the gas flow and the gap length between the powered electrodes and the substrate. Also, we provide the process results for the growths of the a-Si:H and the ${\mu}c$-Si:H films. The high DR (2.4 nm/s for a-Si:H film and 1.5 nm/s for the ${\mu}c$-Si:H film), the controllable crystallinity (~70%) for the ${\mu}c$-Si:H film, and the relatively good uniformity (1% for a-Si:H film and 7% for the ${\mu}c$-Si:H film) can be obtained at the high frequency of 40 MHz in the large-area discharge (280 mm${\times}$540 mm). Finally, we will discuss the issues in expanding the multi-electrode to the 8G class large-area plasma processing (2.2 m${\times}$2.4 m) and in improving the process efficiency.

• Proceedings of the Korean Vacuum Society Conference
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• 2000.02a
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• pp.211-211
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• 2000

Carbon nanotubes (CNTs) have been spotlighted as one of promising field emission displays(FEDs). For the first time, to authors knowledge, we have developed the 9" color CNT-FEDs with the resolution of 240x576 lines. The 9" CNT-FEDs with diode-type and triode-type structures are presented. The well-dispersed CNT paste was squeezed onto the metal-patterned cathode glass. For the anode plate, the Y2O2S:Eu, ZnS:Ag,Cl low-voltage phosphors were printed for red, green, and blue colors, respectively. The vacuum-packaged panel maintained the vacuum level of 1x10-7 Torr. The uniform moving images vacuum-packaged panel maintained the vacuum level of 1x10-7 Torr. The uniform moving images were demonstrated at 2 V/um. High brightness of 800, 200, and 150cd/m2 was observed on the green, red, and blue phosphors at V/um, respectively. Field emission characteristics of a triode-type CNT-FED were simulated using a finite element method. the resultant field strength on the cathode was modulated by gate bias and emitted electrons were focused on the anode. A relatively uniform emission image was experimentally achieved at the 800V anode. A relatively uniform emission image was experimentally achieved at the 800V anode and the 50-180 V gate biases. Energy distribution of electrons emitted from CNTs was measured using an energy analyzer. The maximum peak of energy curve corresponded to the Fermi energy level of CNTs. The whole fabrication processed of CNT-FEDs were fully scalable and reproducible. Our CNT-FEDs has demonstrated the high potential of large-area and full-color applications with very low cost fabrication and low power consumption.

• 한국정보디스플레이학회:학술대회논문집
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• 2006.08a
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• pp.529-529
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• 2006

Several laboratories worldwide have demonstrated the feasibility of producing amorphous silicon thin film transistor (TFT) arrays at temperatures that are sufficiently low to be compatible with flexible foils such as stainless steel or high temperature polyester. These arrays can be used to fabricate flexible high information content display prototypes using a variety of different display technologies. However, several questions must be addressed before this technology can be used for the economic commercial production of displays. These include process optimization and scale-up to address intrinsic electrical instabilities exhibited by these kinds of transistor device, and the development of appropriate techniques for the handling of flexible substrate materials with large coefficients of thermal expansion. The Flexible Display Center at Arizona State University was established in 2004 as a collaboration among industry, a number of Universities, and US Government research laboratories to focus on these issues. The goal of the FDC is to investigate the manufacturing of flexible TFT technology in order to accelerate the commercialization of flexible displays. This presentation will give a brief outline of the FDC's organization and capabilities, and review the status of efforts to fabricate amorphous silicon TFT arrays on flexible foils using a low temperature process. Together with industrial partners, these arrays are being integrated with cholesteric liquid crystal panels, electrophoretic inks, or organic electroluminescent devices to make flexible display prototypes. In addition to an overview of device stability issues, the presentation will include a discussion of challenges peculiar to the use of flexible substrates. A technique has been developed for temporarily bonding flexible substrates to rigid carrier plates so that they may be processed using conventional flat panel display manufacturing equipment. In addition, custom photolithographic equipment has been developed which permits the dynamic compensation of substrate distortions which accumulate at various process steps.

• The Transactions of the Korean Institute of Power Electronics
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• v.10 no.6
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• pp.578-586
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• 2005

Recently, due to the launch of digital broadcasting service, the demand of Flat Panel Display (FPD) is sharply rising. Among them, the PDP is expected to be one of the most promising digital displays of next generation because of its large screen size, high resolution, thinness and board field of view. Meanwhile, the PDP uses ADS (Address Display-period Separation) scheme which divide one subfield into address and sustaining period to express the grey scale of images. Since the output of sustaining power module Is mostly used for sustaining period, the load of the sustaining power module can be considered as a pulsating load. Due to this particular load condition, if the wide ZVS range of the power switches is not guaranteed, the hard switching causes large amount of switching loss and serious thermal problem in power module. In this paper, a high efficiency power conversion circuit for 60' PDP sustaining power module which achieves wide ZVS range with the help of additional ZVS tank is proposed. According to the various gating methods, the different operations of the proposed converter are presented. And, to confirm the properties of the proposed converter, an experimental prototype of 900W power converter is constructed md tested. As a result, more than $92\%$ of high efficiency is obtained at $10\%$ load condition, and the ZVS operation is achieved from full load to $10\%$ load condition.

• Proceedings of the Korean Society of Laser Processing Conference
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• 2005.11a
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• pp.37-41
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• 2005

When screen size of the Flat Panel Display (FPD) becomes larger, the traditional photo-lithography using photomasks and UV lamps might not be possible to make patterns on Photo Resist (PR) material due to limitation of the mask size. Though the maskless photo-lithography using UV lasers and scanners had been developed to implement large screen display, it was very slow to apply the process for mass-production systems. The laser exposure system using 405 nm semi-conductor lasers and Digital Micromirror Devices (DMD) has been developed to overcome above-mentioned problems and make more than 100 inches FPD devices. It makes very fine patterns for full HD display and exposes them very fast. The optical engines which contain DMD, Micro Lens Array (MLA) and projection lenses are designed for 10 to 50 ${\mu}m$ bitmap pattern resolutions. The test patterns for LCD and PDP displays are exposed on PR and Dry Film Resists (DFR) which are coated or laminated on some specific substrates and developed. The fabricated edges of the sample patterns are well-defined and the results are satisfied with tight manufacturing requirements.