• Journal of Information Display
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• v.6 no.3
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• pp.18-21
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• 2005

A new technology for reducing photolithography process from a four step to a three step process in the fabrication of TFT LCD is introduced. The core technology for 3-mask-TFT processes is the lift-off process [1], by which the PAS and PXL layers can be formed simultaneously. A different method of the lift-off process was developed in order to enhance the performance of efficiency with conventional positive and not negative PR which is the generally used in other lift-off process. In addition, the removal capacity of the ITO/PR in lift-off process was evaluated. The evaluation results showed that the new process can be run in conventional TFT production condition. In order to apply this new process in existing TFT process, several tests were conducted to ensure stability of the TFT process. It was found that the outgases from PR on the substrate in ITO sputtering chamber do not raise any problem, and the deposited ITO film beside the PR has conventional ITO qualities. Furthemore, the particles that were produced due to the ITO chips in PR strip bath could be reduced by the existing filtering system of stripper. With the development of total process and design of the structure for TFT using this technology, 3-mask-panels were achieved in TN and IPS modes, which showed the same display performances as those with the conventional 4mask process. The applicability and usefulness of the 3-mask process has already verified in the mass production line and in fact it currently being used for the production of some products.

• 한국정보디스플레이학회:학술대회논문집
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• 2007.08b
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• pp.1330-1332
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• 2007

We have newly developed transflective LCDs with a specific sub-pixel and the single cell gap structure. In our structure, the overall transmittance and reflectance has become higher than typical transflective LCDs. Furthermore, it can simplify the fabrication process of the transflective LCDs.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.06a
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• pp.216-219
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• 2005

In recent, LCD becomes one of the main display devices and expected to have quite good market share during the next couple of years. The demand for low cost and high performance, however, is becoming severe as the competition among other display devices like PDP, OLED increases. To satisfy this demand from market, we need to optimize the parts or modules of the LCD, reduce the number of the assemble and enhance the process for the high brightness and uniformity of the LCD. The LCD consists mainly of LCD panel and Backlight unit(BLU). BLU, which takes big portion of the cost for LCD, consists of light source, light guide panel and many kinds of functional film. Recently light guide panel or film for BLU has micro patterns on its surface and consequently to reduce the number of parts and enhace the brightness and its uniformity. In this study, some methodologies for the fabrication of the master/stamper and molding the light quide panel are introduced for 50um pitch of prizm patterned substrate. Mechanical machining process is adapted and optimized to fabricate micro patterned stamper using the micro cutting tool. Injection molding technology is also developed to obtain uniformly replicated micro patterned products.

• 한국정보디스플레이학회:학술대회논문집
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• 2006.08a
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• pp.803-805
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• 2006

In the paper we have proposed a fabrication method for color reflective cholesteric LCD by an in-plane switching. By applying an in plane electric field, the cholesteric helix could be partially unwound, which lead to shift of selective reflection and exhibition of color change.

• 한국정보디스플레이학회:학술대회논문집
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• 2002.08a
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• pp.994-996
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• 2002

We present a novel fabrication method for a V-grooved mold of the light guide plat of TFT-LCD with MEMS technology. This method is performed by the inclined UV lithography and Ni electroplating unlike the previous mechanical processing technique. V-grooves with different dimension can be made simultaneously with single photomask.

• 한국정보디스플레이학회:학술대회논문집
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• 2000.01a
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• pp.39-40
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• 2000

STN LCDs on Plastic Film substrates for mobile communication devices have been researched and developed at KETI in KOREA. The Plastic Film substrate is so weak to heat and pressure that its fabrication process is limited to $110^{\circ}C(Tg)$. In order to maintain uniform pressure on Plastic Film substrate we used newly designed jig and fabrication process. Electro-optical characteristics are better than or equivalent to those of typical glass LCD though it is thinner, lighter-weight, and more robust than glass LCD.

• 한국정보디스플레이학회:학술대회논문집
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• 2005.07a
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• pp.15-20
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• 2005

We have achieved 180-degree angle of view performance using Super-PVA (S-PVA) technology first time in TFT-LCD industry. 82" full high definition ($1920{\times}1080$) TFT- LCD panel, the world's largest TFT-LCD, have been developed. In addition to the size breakthrough, this product achieves 600nits brightness, over 1200:1 contrast ratio, viewing angle free, 92% color gamut, and 8ms response time. Several key enabling technologies were developed to achieve these specifications, including two transistor direct driven independently controlled S-PVA subpixels, non even area ratio sub-pixels for optimal offaxis gamma, gate overlap driving for larger driving margin, new CCFL technology for higher color gamut, and advanced fabrication techniques including the use of Samsung's new $7^{th}$ generation line.

• 한국정보디스플레이학회:학술대회논문집
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• 2009.10a
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• pp.661-663
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• 2009

This paper describes a fabrication method for high transmittance panel using newly designed polarizer and liquid crystal with a high dielectric anisotropy (${\Delta}{\varepsilon}$). To enhance the transmittance of the panel without contrast ratio reduction, new polarizer with high transmittance and high ${\Delta}{\varepsilon}$ liquid crystal were used. The transmittance of the liquid crystal display (LCD) panel employed by a new polarizer was increased by 6% over that of the panel with a conventional polarizer and liquid crystal in LCD industry.

• Journal of Information Display
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• v.6 no.1
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• pp.8-11
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• 2005

A flexible reflective cholesteric liquid crystal display (ChLCD) is fabricated on plastic substrates by using the pixel isolation method. The polymer walls between pixels and the polymer layers in the pixels are formed by two-step UV irradiation. Electro-optical response of the ChLCD with polymer wall and layer is studied and compared with conventional bistable ChLCD cells.

• Journal of the Speleological Society of Korea
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• no.77
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• pp.21-30
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• 2007

Photo-lithography lies in the middle of the wafer fabrication process. It is often considered as the most critical step in the IC process. We use a mask in exposure steps of the photo-lithography. Typically, 20 to 25 different levels of masks are required to complete an IC device. That means, if a photo process can be developed with the use of only one photo mask, we can reduce more process cost. To satisfy this, we plan to develop an alternative photo mask. For this reason, we chose to use a LCD. We expect to develop a LCD panel that can be changed by electrical control. This is the main idea about the adjustive photo mask. The Photo mask made of LCD panel will replace the former one.