• Title/Summary/Keyword: Korean morphology

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Hierarchical transmission using morphology and vector quantization (모폴로지와 벡터 양자화를 사용한 영상의 계층적 전송)

  • 김신환;김성욱
    • The Journal of Korean Institute of Communications and Information Sciences
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    • v.22 no.6
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    • pp.1170-1177
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    • 1997
  • Morphology is a shape preseving filter. Several morphology filter can be made by the combination of morphological basic operation. If we use morphology filter in decimation process for a hierarchical encoder, there are some advantagesin reduction aliasing effects. In this paper, we propose a new hierarchical coder with morphological filtering and vector quantization. And then, firstly, we confirm that CO filtering is the best one among the 4 kinds of morphology filters to reduce aliasing effects in Laplacian pyramid transmission proposed by Burt. Secondly, the those two coders was compared. The results of our simulation show that our new coder surpasser the Laplacian pyramid especially in complex images.

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On the TFT-LCD Cell Defect Inspection Algorithm using Morphology (모폴로지(Morphology)를 이용한 TFT-LCD 셀 검사 알고리즘 연구)

  • Kim, Yong-Kwan;Yu, Sang-Hyun
    • Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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    • v.21 no.1
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    • pp.19-27
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    • 2007
  • In this paper, we develope and implement a TFT-LCD cell defects detection algorithm using morphology. To detect the bright line or dark line defects and the bright pixel or dark pixel defects of the TFT-LCD cells, we determine the shape of the morphology operators considering the shape characteristics of the TFT-LCD sub pixels. Using dilation, erosion, and the subtraction operators, we extract gray level defects information. Then, we apply the optimal threshold method which shows the best results in terms of several criteria. Finally, we determine the defects using labelling method. From various experiments using TFT-LCD panels, the proposed algorithm shows superior results.

Study on Surface Morphology and Transmittance of Copper Oxide Thin Films Prepared by an Oxidation Reaction (산화반응으로 형성된 구리산화물 박막의 표면형상 및 투과율 특성에 관한 연구)

  • Lee, Eun Kyu;Park, Daesoo;Yoon, Hoi Jin;Lee, Seung-Yun
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.30 no.10
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    • pp.651-655
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    • 2017
  • This work reports the surface morphology and transmittance of copper oxide thin films for semitransparent solar cell applications. We prepared the oxide specimens by subjecting copper thin films to an oxidation reaction at annealing temperatures ranging between $100^{\circ}C$ and $300^{\circ}C$. The color of the as-deposited specimen was red, but changed to purple at the annealing temperature of $300^{\circ}C$. The surface morphology and transmittance of the specimens were significantly dependent on the annealing temperature and thickness of the copper films. Copper oxide nanoparticles prepared from a 20-nm-thick copper film at an annealing temperature of $300^{\circ}C$ provided a maximum transmittance of 93%. The obtained optical characteristics and surface morphology suggest that copper oxide thin films prepared by an oxidation reaction can be potentially employed as color- and transmittance-adjusting layer in semitransparent thin solar cells.

Optical Property and Surface Morphology Control by Randomly Patterned Etching (불규칙 패턴 에칭에 의한 표면 형상 제어와 광학적 특성)

  • Kim, Sung Soo;Lee, Jeong Woo;Jeon, Bup Ju
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.30 no.12
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    • pp.800-805
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    • 2017
  • Randomly patterned and wet chemical etching processes were used to treat anti-glare of display cover glasses. The surface and optical properties of grain size and surface morphology controlled by randomly patterned etching and wet chemical solution etching were investigated. The surface morphology and roughness of the etched samples were examined using a spectrophotometer and a portable surface roughness (Ra) measuring instrument, respectively. The gloss caused by reflection from the glass surface was measured at $60^{\circ}$ using a gloss meter. The surface of the sample etched by the doctor-blade process was more uniform than that obtained from a screen pattern etching process at gel state etching process of the first step. The surface roughness obtained from the randomly patterned etching process depended greatly on the mesh size, which in turn affected the grain size and pattern formation. The surface morphology and gloss obtained by the etching process in the second step depended primarily on the mesh size of the gel state etching process of the first step. In our experimental range, the gloss increased on decreasing the grain size at a lower mesh size for the first step process and for longer reaction times for the second step process.

Characterization of Morphology Controlled Fluorine-doped SnO2 Thin Films

  • An, Ha-Rim;An, Hye-Lan;Ahn, Hyo-Jin
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.453.1-453.1
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    • 2014
  • Fluorine-doped tin oxide (FTO), which is commonly used in dye-sensitized solar cells (DSSCs), is a promising material of transparent conducting oxides (TCOs) because of advantages such as high chemical stability, high resistance, high optical transparency (>80% at 550nm), and low electrical resistivity (${\sim}10-4{\Omega}{\cdot}cm$). Especially, dye-sensitized solar cells (DSSCs) have been actively studied since Gratzel's research group required FTO substrate as a charge collector. When FTO substrates are used in DSSCs, photo-injected electrons may experience recombination at interface between dye-bonded semiconductor oxides ($TiO_2$) on FTO substrate and the electrolyte. To solve these problems, one is that because recombination at FTO substrate cannot be neglected, thin $TiO_2$ layer on FTO substrate as a blocking layer was introduced. The other is to control the morphology of surface on FTO substrate to reduce a loss of electrons. The structural, electrical, and optical characteristics of morphology controlled-FTO thin films as TCO materials were analyzed by X-Ray Diffraction (XRD), Scanning Electron Microscopy (SEM), Atomic Force Microscopy (AFM), Hall Effect Measurement, and UV spectrophotometer. The performance of DSSCs fabricated with morphology controlled FTO substrates was performed using Power Conversion Efficiency (PCE). We will discuss these results in detail in Conference.

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