• Honam Mathematical Journal
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• v.3 no.1
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• pp.13-18
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• 1981

• 해운
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• no.5 s.4
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• pp.2-17
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• 2004

• Bulletin of the Society of Naval Architects of Korea
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• v.37 no.4
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• pp.38-49
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• 2000

• Proceedings of the PSK Conference
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• 2005.11a
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• pp.255-255
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• 2005

• Journal of Microbiology and Biotechnology
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• v.10 no.3
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• pp.338-343
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• 2000

The growth capabilities of three $highly-CO_2-tolerant$ microalgae under high concentrations of $CO_2$ were compared for their tolerance to $SO_2$ and NO, the major inhibitory compounds present in flue gases. Although all strains showed good growth with 15% $CO_2$, Chlorella KR-1 exhibited the most desirable properties for $CO_2$ fixation among the strains compared. While Chlorella sp. HA-1 exhibited the best tolerance to NO among the other strains tested, Chlorella sp. KR-1 showed higher tolerance to $SO_2$ than the other two strains tested.

• Journal of the Optical Society of Korea
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• v.2 no.2
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• pp.50-53
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• 1998

We report on the spectroscopic investigation of optical-field ionized plasmas in the soft X-ray spectral region. The experiment was carried out by focusing pulses of the high-power Ti:Sapphire laser with an energy of ~ 40 mJ and time duration of ~30 fs into a gas jet of krypton, xenon, and argon from a pulsed nozzle. Strong soft X-ray emission on lines from ionic stages of $Kr^{7+} , Kr^{8+} , Xe^{7+} , Ar^{7+} , and Ar^{8+}$ is reported. The experimental result was found to be in good agreement with theoretical prediction.

• JSTS:Journal of Semiconductor Technology and Science
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• v.1 no.1
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• pp.20-30
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• 2001

A 1.8V $650{\;}\textrm{mm}^2$ 4Gb DRAM having $0.10{\;}\mu\textrm{m}^2$ cell size has been successfully developed using 0.11 $\mu\textrm{m}$DRAM technology. Considering manufactur-ability, we have focused on developing patterning technology using KrF lithography that makes $0.11{\;}\mu\textrm{m}$ DRAM technology possible. Furthermore, we developed novel DRAM technologies, which will have strong influence on the future DRAM integration. These are novel oxide gap-filling, W-bit line with stud contact for borderless metal contact, line-type storage node self-aligned contact (SAC), mechanically stable metal-insulator-silicon (MIS) capacitor and CVD Al process for metal inter-connections. In addition, 80 nm array transistor and sub-80 nm memory cell contact are also developed for high functional yield as well as chip performance. Many issues which large sized chip often faces are solved by novel design approaches such as skew minimizing technique, gain control pre-sensing scheme and bit line calibration scheme.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.18 no.8
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• pp.729-733
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• 2005

Al electrode for OLED was deposited by FTS (Facing Targets Sputtering) system which can deposit thin films with low substrate damage. The Al thin films were deposited on the cell (LiF/EML/HTL/Bottom electrode) as a function of working gas such as Ar or Ar+kr mixed gas. Also Al thin films were prepared with working gas pressure (1, 6 mTorr). The film thickness and I-V curve of Al/cell were measured and evaluated. In the results, when Al thin films were deposited using pure Ar gas, the turn-on voltage of Al/cell was about 11 V. And using the Ar:Kr($75\%:25\%$) mixed gas, the turn-on voltage of Al/cell decreased to about 7 V.

• Korean Journal of Optics and Photonics
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• v.4 no.2
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• pp.157-161
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• 1993

An optical autofocus system for a DUV KrF excimer laser wafer stepper was developed by using the PSD (Position Sensitive Detector) as the position sensor. The laser beam was incident on the surface of wafer and the reflected beam was magnified optically by a lens. And the beam was directed onto the surface of PSD by a mirror system. The spatial resolution of the autofocus system was found to be $0.03{\mu}m$.

• Communications of Mathematical Education
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• v.25 no.2
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• pp.309-321
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• 2011

In this paper, we introduce how we developed a dynamic Excel Grapher which can be used for mathematics education. Developed tools can be used in college mathematics as well as a secondary school mathematics education. It can be downloaded for your test or teaching. (http://maxtrix.skku.ac.kr/2010-ExcelGrapher/index.htm)