Study of Selective Etching of GaAs-based Semiconductors using High Density Planar Inductively Coupled $BCl_3/CF_4$ Plasmas
(고밀도 평판형 유도결합 $BCl_3/CF_4$ 플라즈마에 의한 GaAs 계열반도체의 선택적 식각에 관한 연구)
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- Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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- 2005.07a
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- pp.46-47
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- 2005